$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Method for constant concentration evaporation and a device using the same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/448
  • C23C-016/44
  • C23C-016/455
  • F22B-005/00
  • C23C-016/06
  • C23C-016/22
출원번호 US-0687288 (2010-01-14)
등록번호 US-8555809 (2013-10-15)
발명자 / 주소
  • Woelk, Egbert
  • DiCarlo, Jr., Ronald L.
출원인 / 주소
  • Rohm and Haas Electronic Materials, LLC
대리인 / 주소
    Cantor Colburn LLP
인용정보 피인용 횟수 : 2  인용 특허 : 39

초록

Disclosed herein is a device comprising an evaporator; and a heat exchanger; the heat exchanger being in fluid communication with evaporator; evaporator comprising an outer casing; and an inner casing that is disposed within the outer casing; the inner casing contacting a plate; wherein the inner ca

대표청구항

1. A device comprising: an evaporator; anda heat exchanger; the heat exchanger being in fluid communication with the evaporator; the evaporator comprising: an outer casing; andan inner casing that is disposed within the outer casing; the inner casing contacting a plate; wherein the inner casing encl

이 특허에 인용된 특허 (39)

  1. Choi, Kenric T.; Narwankar, Pravin K.; Kher, Shreyas S.; Nguyen, Son T.; Deaton, Paul; Ngo, Khai; Chhabra, Paul; Ouye, Alan H.; Wu, Dien-Yeh (Daniel), Ampoule for liquid draw and vapor draw with a continuous level sensor.
  2. Grabowski Norman A. (Pawcatuck CT), Ampoule rupture detection system.
  3. Lee, Wei Ti; Chiao, Steve H., Ampoule splash guard apparatus.
  4. Lee,Wei Ti; Chiao,Steve H., Ampoule splash guard apparatus.
  5. Gijsbers Josephus Cornelis Wilhelmus Franciscus (Eindhoven NL) Uhlemann Hans Heinrich Otto Oskar Hermann (Augsburg DT), Apparatus for evaporating liquids.
  6. Sielaff Gnter (Bensheim DEX) Joseph Frank (Gernsheim DEX) Harder Norbert (Aschaffenburg DEX), Apparatus for producing a gas mixture by the saturation method.
  7. Arnold Manfred (Aschaffenburg DEX) Gegenwart Rainer (Rdermark DEX) Noll Sonja (Frankfurt DEX) Ritter Jochen (Laubach DEX) Stoll Helmut (Sulzbach DEX), Apparatus for the evaporation of liquids.
  8. Noah, Craig M.; Gregg, John N.; Jackson, Robert M.; Esser, Craig, Bulk chemical delivery system.
  9. Asaba Tetsuo,JPX ; Kawasumi Yasushi,JPX ; Ohmi Kazuaki,JPX ; Sekine Yasuhiro,JPX ; Hayakawa Yukihiro,JPX, Chemical vapor deposition apparatus.
  10. Nurmi Douglas B., Continuous gas saturation system and method.
  11. Nurmi Douglas B., Continuous gas saturation system and method.
  12. Morton Clyde M. (11525 S. Ramona Hawthorn CA 90250), Converter vaporizer.
  13. Ciais Andr (Mornant FRX) Variot Gilles (Villeurbanne FRX), Device and installations for the distillation by thin layer evaporation particularly of hydrocarbons, and process for op.
  14. Onoe Atsushi,JPX ; Yoshida Ayako,JPX ; Chikuma Kiyofumi,JPX, Device for feeding raw material for chemical vapor phase deposition and method therefor.
  15. Ravenda, Francois; Kirwan, John E., Electrically-heated metal vaporizer for fuel/air preparation in a hydrocarbon reformer assembly.
  16. Nagashima Naoki,JPX ; Takahashi Natsuki,JPX ; Negishi Toshio,JPX ; Kashiwabara Izumi,JPX, Evaporation apparatus, organic material evaporation source, and method of manufacturing thin organic film.
  17. Yi, Kyung-Soo, Evaporation source for evaporating an organic.
  18. Feres Vaclav (Haid-und neu-Strasse 14 D-7500 Karlsruhel DEX), Evaporator.
  19. Feres, Vaclav, Film evaporators.
  20. Feres Vaclav (3002 Buena Vida Cir. Las Cruces 88001 NM), Film-type evaporator.
  21. Drube, Paul; Sjogren, Paul, Gas dispensing system for cryogenic liquid vessels.
  22. Ruzek Wolfgang (Neftenbach CHX), Heat exchanger for a process gas.
  23. Matthew R. Witzman ; Richard A. Bradley, Jr. ; Christopher W. Lantman ; Eric R. Cox, Linear aperture deposition apparatus and coating process.
  24. Witzman Matthew R. ; Bradley ; Jr. Richard A. ; Lantman Christopher W. ; Cox Eric R., Linear aperture deposition apparatus and coating process.
  25. Horie Kuniaki,JPX ; Suzuki Hidenao,JPX ; Nakada Tsutomu,JPX ; Kuriyama Fumio,JPX ; Murakami Takeshi,JPX ; Abe Masahito,JPX ; Araki Yuji,JPX ; Ueyama Hiroyuki,JPX, Liquid feed vaporization system and gas injection device.
  26. Horie Kuniaki,JPX ; Suzuki Hidenao,JPX ; Nakada Tsutomu,JPX ; Kuriyama Fumio,JPX ; Murakami Takeshi,JPX ; Abe Masahito,JPX ; Araki Yuji,JPX ; Ueyama Hiroyuki,JPX, Liquid feed vaporization system and gas injection device.
  27. Horie Kuniaki,JPX ; Suzuki Hidenao,JPX ; Nakada Tsutomu,JPX ; Murakami Takeshi,JPX ; Abe Masahito,JPX ; Araki Yuji,JPX ; Ueyama Hiroyuki,JPX, Liquid feed vaporization system and gas injection device.
  28. Curran,William J., Liquid vapor delivery system and method of maintaining a constant level of fluid therein.
  29. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  30. Tuominen, Marko; Shero, Eric; Verghese, Mohith, Method for controlling the sublimation of reactants.
  31. Curran,William J., Method for maintaining a constant level of fluid in a liquid vapor delivery system.
  32. Lynch Brian (Norcross GA) Narasimham Pundi L. (Norcross GA) Partus Fred P. (Marietta GA), Methods of and apparatus for vapor delivery control in optical preform manufacture.
  33. Zeng, Larry Q.; Lou, Victor L.; Ahlgren, Frederic F.; Duggal, Anil Raj, Optical fiber deposition tube fused in deuterium atmosphere for attenuation improvement.
  34. Ginatta Marco Vincenzo,ITX, Process for the electrolytic production of metals.
  35. Miyajiri, Tetsuo; Habasaki, Toshimi; Yokota, Hiroshi; Tsurita, Tamio; Nakahara, Motohiro, Raw material supply device.
  36. Tuominen, Marko; Shero, Eric; Verghese, Mohith, System for controlling the sublimation of reactants.
  37. Goldstein Mark K. (La Jolla CA) LaBar Jeffrey R. (Escondido CA) Bass John C. (La Jolla CA) Conklin Boyd S. (Carlsbad CA), Thermally amplified and stimulated emission radiator fiber matrix burner.
  38. Horie Kuniaki,JPX ; Ogure Naoaki,JPX ; Fukunaga Yukio,JPX ; Hongo Akihisa,JPX, Vaporizer apparatus.
  39. Horie Kuniaki,JPX ; Suzuki Hidenao,JPX ; Nakada Tsutomu,JPX ; Kuriyama Fumio,JPX ; Murakami Takeshi,JPX ; Abe Masahito,JPX ; Araki Yuji,JPX, Vaporizer apparatus and film deposition apparatus therewith.

이 특허를 인용한 특허 (2)

  1. Woelk, Egbert; DiCarlo, Ronald L.; Shenai-Khatkhate, Deodatta Vinayak, Delivery device, methods of manufacture thereof and articles comprising the same.
  2. Itonaga, Masashi; Watanabe, Masanobu, Processing gas generating apparatus, processing gas generating method, substrate processing method, and storage medium.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로