Inline monitoring of pad loading for CuCMP and developing an endpoint technique for cleaning
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C23F-001/00
H01L-021/306
출원번호
US-0842363
(2004-05-10)
등록번호
US-8557132
(2013-10-15)
발명자
/ 주소
Chopra, Dinesh
Meikle, Scott
출원인 / 주소
Micron Technology, Inc.
대리인 / 주소
Knobbe, Martens, Olson & Bear, LLP
인용정보
피인용 횟수 :
0인용 특허 :
12
초록▼
A system of cleaning a CMP pad used for removing copper from a substrate, the system comprising an abrasive cleaning pad, a cleaning solution delivery system that delivers a cleaning solution, an analyzing system that monitors the characteristics of the cleaning solution optically and chemically, an
A system of cleaning a CMP pad used for removing copper from a substrate, the system comprising an abrasive cleaning pad, a cleaning solution delivery system that delivers a cleaning solution, an analyzing system that monitors the characteristics of the cleaning solution optically and chemically, and a carriage that allows the analyzing system to monitor the cleaning solution at a plurality of locations on the CMP pad. The use of the abrasive cleaning pad and the cleaning solution removes contaminants from the CMP pad, and the contaminants are dissolved in the cleaning solution. By measuring the concentration of contaminants in the cleaning solution, the condition of the CMP pad can be monitored. To measure the concentration of the contaminants, changes in the refractive index and absorption of light in the cleaning solution are measured, wherein the refractive index and absorption depend on the concentration of the contaminants. The concentration of the contaminants in the cleaning solution is also measured chemically. Knowing the actual condition of the CMP pad during the cleaning process allows for improved condition of the CMP pad.
대표청구항▼
1. A method of cleaning a CMP pad, the method comprising: providing a CMP pad that has been used in a CMP process;(i) moving a cleaning pad relative the CMP pad so as to clean the CMP pad;(ii) providing a cleaning fluid to an interface between the cleaning pad and the CMP pad wherein the fluid is se
1. A method of cleaning a CMP pad, the method comprising: providing a CMP pad that has been used in a CMP process;(i) moving a cleaning pad relative the CMP pad so as to clean the CMP pad;(ii) providing a cleaning fluid to an interface between the cleaning pad and the CMP pad wherein the fluid is selected so as to facilitate cleaning of the CMP pad;(iii) evaluating, substantially parallel to the surface of the cleaning pad, an optical characteristic of the cleaning fluid in the interface during the relative motion of the cleaning pad and the CMP pad and during cleaning of the CMP pad after the cleaning fluid has been provided to the interface to determine a fluid characteristic value that is indicative of the condition of the CMP pad to thereby evaluate the cleanliness of pad, wherein evaluating the optical characteristic comprises projecting a beam of light from a side of the cleaning pad and through the cleaning fluid along the surface of the cleaning pad and detecting from a side of the cleaning pad the beam of light to directly measure a change in refraction of the beam of light due to a change in concentration of contaminants in the cleaning fluid;(iv) repeating (i), (ii), (iii) until the fluid characteristic value corresponds to at least one preselected endpoint values for the cleanliness of the pad to thereby obtain a desired level of cleanliness of the pad; and(v) halting the cleaning pad motion relative to the CMP pad when the at least one preselected endpoint value has been detected. 2. The method of claim 1, wherein moving the cleaning pad relative the CMP pad comprises grinding the CMP pad with the cleaning pad. 3. The method of claim 2, wherein the cleaning pad comprising a diamond disk. 4. The method of claim 1, wherein providing the fluid comprises providing a fluid that reacts with contaminants in the CMP pad. 5. The method of claim 4, wherein the fluid comprises an ammonium citrate solution. 6. The method of claim 5, wherein the fluid comprises an approximately 5% ammonium citrate solution. 7. The method of claim 5, wherein the fluid contains nitric acid by an amount in a range of 0.001% to 0.5% by weight. 8. The method of claim 1, wherein evaluating the optical characteristic further comprises measuring a change in absorption of a light in the cleaning fluid due to a change in concentration of contaminants in the cleaning fluid. 9. The method of claim 1, wherein evaluating the fluid comprises measuring a chemical composition of the fluid. 10. The method of claim 9, wherein measuring the chemical composition of the fluid comprises measuring the concentration of at least some of the contaminants in the fluid. 11. The method of claim 1, wherein the beam of light is substantially parallel to the surface of the cleaning pad. 12. A method of cleaning a CMP pad, the method comprising: providing a CMP pad that has been used in a CMP process;(i) moving a cleaning pad relative the CMP pad so as to clean the CMP pad;(ii) providing a cleaning fluid to an interface between the cleaning pad and the CMP pad wherein the fluid is selected so as to facilitate cleaning of the CMP pad;(iii) evaluating an optical characteristic of the cleaning fluid in the interface during the relative motion of the cleaning pad and the CMP pad and during cleaning of the CMP pad after the cleaning fluid has been provided to the interface to determine a fluid characteristic value that is indicative of the condition of the CMP pad to thereby evaluate the cleanliness of the pad, wherein evaluating the optical characteristic comprises projecting a beam of light from a side of the cleaning pad and through the cleaning fluid along the surface of the cleaning pad and detecting from a side of the cleaning pad the beam of light to directly measure a change in refraction of the beam of light due to a change in concentration of contaminants in the cleaning fluid;(iv) repeating (i), (ii), (iii) until the fluid characteristic value corresponds to at least one preselected endpoint values for the cleanliness of the pad to thereby obtain a desired level of cleanliness of the pad; and(v) halting the movement of the cleaning pad relative to the CMP pad when the at least one preselected endpoint value has been detected. 13. The method of claim 12, wherein moving the cleaning pad relative the CMP pad comprises grinding the CMP pad with the cleaning pad. 14. The method of claim 13, wherein the cleaning pad comprising a diamond disk. 15. The method of claim 12, wherein providing the fluid comprises providing a fluid that reacts with contaminants in the CMP pad. 16. The method of claim 15, wherein the fluid comprises an ammonium citrate solution. 17. The method of claim 16, wherein the fluid comprises an approximately 5% ammonium citrate solution. 18. The method of claim 16, wherein the fluid contains nitric acid by an amount in a range of 0.001% to 0.5% by weight. 19. The method of claim 12, wherein evaluating the optical characteristic further comprises measuring a change in absorption of a light in the cleaning fluid due to a change in concentration of contaminants in the cleaning fluid. 20. The method of claim 12, wherein evaluating the fluid comprises measuring a chemical composition of the fluid. 21. The method of claim 20, wherein measuring the chemical composition of the fluid comprises measuring the concentration of at least some of the contaminants in the fluid. 22. The method of claim 12, wherein the beam of light is substantially parallel to the surface of the cleaning pad.
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