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Substrate processing apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/677
출원번호 US-0542588 (2009-08-17)
등록번호 US-8602706 (2013-12-10)
발명자 / 주소
  • Hofmeister, Christopher
  • Caveney, Robert T.
출원인 / 주소
  • Brooks Automation, Inc.
대리인 / 주소
    Perman & Green, LLP
인용정보 피인용 횟수 : 4  인용 특허 : 108

초록

A semiconductor workpiece processing apparatus having a first chamber, a transport vehicle, and another chamber. The first chamber is capable of being isolated from an outside atmosphere. The transport vehicle is located in the first chamber and is movably supported from the first chamber for moving

대표청구항

1. A substrate processing apparatus comprising: a transport chamber capable of holding a sealed atmosphere sealed off from atmosphere exterior to the transport chamber;at least one substrate holding module for holding a substrate, the at least one holding module being communicably connected to the t

이 특허에 인용된 특허 (108)

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  1. Fukasawa, Takayuki; Moon, Yeon-Keon; Sohn, Sang-woo; Kishimoto, Katsushi; Shin, Sang-Won, Apparatus for transferring substrate.
  2. Chang, Seok-Rak; Nam, Myeng-Woo; Kang, Hee-Cheol; Kim, Jong-Heon; Hong, Jong-Won; Chang, Uno, Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same.
  3. Lee, Kyoo Hwan; Moon, Deck Won; Jang, Jae Hwan, Substrate processing system and substrate transferring method.
  4. Hosek, Martin, Wafer transport system.
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