Melting furnace including wire-discharge ion plasma electron emitter
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B23K-031/00
C22B-009/04
C22B-009/22
출원번호
US-0055415
(2008-03-26)
등록번호
US-8642916
(2014-02-04)
발명자
/ 주소
Forbes Jones, Robin M.
Kennedy, Richard L.
출원인 / 주소
ATI Properties, Inc.
대리인 / 주소
K&L Gates LLP
인용정보
피인용 횟수 :
2인용 특허 :
149
초록▼
An apparatus for melting an electrically conductive metallic material includes a vacuum chamber and a hearth disposed in the vacuum chamber. At least one wire-discharge ion plasma electron emitter is disposed in or adjacent the vacuum chamber and is positioned to direct a wide-area field of electron
An apparatus for melting an electrically conductive metallic material includes a vacuum chamber and a hearth disposed in the vacuum chamber. At least one wire-discharge ion plasma electron emitter is disposed in or adjacent the vacuum chamber and is positioned to direct a wide-area field of electrons into the vacuum chamber, wherein the wide-area electron field has sufficient energy to heat the electrically conductive metallic material to its melting temperature. The apparatus may further include at least one of a mold and an atomizing apparatus which is in communication with the vacuum chamber and is positioned to receive molten material from the hearth.
대표청구항▼
1. A method of processing a material, the method comprising: introducing a material comprising at least one of a metal and a metallic alloy into a furnace chamber maintained at a low pressure relative to atmospheric pressure, wherein the material comprises at least one electrically conductive materi
1. A method of processing a material, the method comprising: introducing a material comprising at least one of a metal and a metallic alloy into a furnace chamber maintained at a low pressure relative to atmospheric pressure, wherein the material comprises at least one electrically conductive material selected from the group consisting of titanium, titanium alloys, tungsten, niobium, tantalum, platinum, palladium, zirconium, iridium, nickel, nickel base alloys, iron, iron base alloys, cobalt, and cobalt base alloys;subjecting the material to a wide-area electron field within the furnace chamber to heat the material to a temperature above a melting temperature of the material, wherein the wide-area electron field is generated by a wire-discharge ion plasma electron emitter;optionally adding at least one alloying additive to the material; andforming a casting or a powder from the material subsequent to or simultaneous with subjecting the material to the wide-area electron field. 2. The method of claim 1, wherein a pressure within the wire-discharge ion plasma electron emitter is substantially the same as or less than a pressure within the furnace chamber. 3. The method of claim 1, wherein a pressure within the furnace chamber is maintained at greater than 40 μm Hg. 4. The method of claim 3, wherein maintaining the pressure within the furnace chamber at greater than 40 μm Hg decreases or eliminates undesirable evaporation of volatile elements from the material during heating of the material in the furnace chamber. 5. The method of claim 1, wherein a pressure within the furnace chamber is maintained at greater than 300 μm Hg. 6. The method of claim 5, wherein maintaining the pressure within the furnace chamber at greater than 300 μm Hg decreases or eliminates undesirable evaporation of volatile elements from the material during heating of the material in the furnace chamber. 7. A method of processing a material, the method comprising: introducing a material comprising at least one of a metal and a metallic alloy into a furnace chamber maintained at a low pressure relative to atmospheric pressure;subjecting the material to a wide-area electron field within the furnace chamber to heat the material to a temperature above a melting temperature of the material, wherein the wide-area electron field is generated by a wire-discharge ion plasma electron emitter; andwherein a pressure within the wire-discharge ion plasma electron emitter is substantially the same as or less than a pressure within the furnace chamber. 8. The method of claim 7, wherein the material comprises at least one of titanium, titanium alloys, tungsten, niobium, tantalum, platinum, palladium, zirconium, iridium, nickel, nickel base alloys, iron, iron base alloys, cobalt, and cobalt base alloys. 9. The method of claim 7, further comprising: forming a casting or a powder from the material subsequent to or simultaneous with subjecting the material to the wide-area electron field. 10. The method of claim 7, wherein a pressure within the furnace chamber is maintained at greater than 40 μm Hg, thereby decreasing or eliminating undesirable evaporation of volatile elements from the material during heating of the material in the furnace chamber. 11. The method of claim 7, wherein a pressure within the furnace chamber is maintained at greater than 300 μm Hg, thereby decreasing or eliminating undesirable evaporation of volatile elements from the material during heating of the material in the furnace chamber. 12. A method for decreasing or eliminating undesirable evaporation of volatile elements from a molten material to be processed during heating of the material in a vacuum chamber of an electron beam melting furnace to produce a processed material for casting or atomization to a powder, the method comprising: introducing the material to be processed into the vacuum chamber of the electron beam melting furnace, wherein the material to be processed comprises at least one of a metal and a metallic alloy;subjecting the material to be processed to an electron field to heat the material to be processed to a temperature above a melting temperature of the processed material; andmaintaining pressure within the vacuum chamber at greater than 300 μm Hg during the heating of the material to be processed above the melting temperature of the processed material. 13. The method of claim 12, wherein the processed material is selected from titanium, titanium alloys, tungsten, niobium, tantalum, platinum, palladium, zirconium, iridium, nickel, nickel base alloys, iron, iron base alloys, cobalt, and cobalt base alloys. 14. A method of processing a material, the method comprising: introducing a material comprising at least one of a metal and a metallic alloy into a furnace chamber maintained at a low pressure relative to atmospheric pressure;subjecting the material to a wide-area electron field within the furnace chamber to heat the material to a temperature above a melting temperature of the material, wherein the wide-area electron field is generated by a wire-discharge ion plasma electron emitter; andwherein a pressure within the furnace chamber is maintained at greater than 40 μm Hg. 15. The method of claim 14, wherein maintaining the pressure within the furnace chamber at greater than 40 μm Hg decreases or eliminates undesirable evaporation of volatile elements from the material during heating of the material in the furnace chamber. 16. The method of claim 14, wherein the pressure within the furnace chamber is maintained at greater than 300 μm Hg. 17. The method of claim 16, wherein maintaining the pressure within the furnace chamber at greater than 300 μm Hg decreases or eliminates undesirable evaporation of volatile elements from the material during heating of the material in the furnace chamber. 18. The method of claim 16, wherein the material comprises at least one electrically conductive material selected from the group consisting of titanium, titanium alloys, tungsten, niobium, tantalum, platinum, palladium, zirconium, iridium, nickel, nickel base alloys, iron, iron base alloys, cobalt, and cobalt base alloys.
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