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This invention relates to an improved chlorine dioxide solution or liquid mixture containing a phosphate and, as well, as to a composition for forming the chlorine dioxide and phosphate liquid mixture. This improved chlorine dioxide solution is used to clean and/or sanitize without causing corrosion

This invention relates to an improved chlorine dioxide solution or liquid mixture containing a phosphate and, as well, as to a composition for forming the chlorine dioxide and phosphate liquid mixture. This improved chlorine dioxide solution is used to clean and/or sanitize without causing corrosion. The corrosion nature of the chlorine dioxide solution is lessened due to the addition of phosphate to the composition.

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1. A solid chlorine dioxide forming mixture used to produce a chlorine dioxide liquid mixture, the forming mixture comprising a mixture of particulate ingredients in the form of a solid body, the ingredients comprising: (a) a solid metal chlorite;(b) a solid acid source other than an acid phosphate,

1. A solid chlorine dioxide forming mixture used to produce a chlorine dioxide liquid mixture, the forming mixture comprising a mixture of particulate ingredients in the form of a solid body, the ingredients comprising: (a) a solid metal chlorite;(b) a solid acid source other than an acid phosphate, said metal chlorite and said acid source reacting to form 0.5 to 1,000 ppm chlorine dioxide in water and form said chlorine dioxide liquid mixture;(c) an effective amount of solid phosphate source to provide 0.1 ppm to 1,000 ppm phosphate in said liquid mixture and reduce the corrosivity of said chlorine dioxide liquid mixture, and wherein a weight ratio of phosphate to chlorine species in said chlorine dioxide liquid mixture is above 0.4;and (d) an anionic surfactant wherein the anionic surfactant is present at up to 1000 ppm. 2. The forming mixture of claim 1, wherein the acid source is sodium acid sulfate. 3. The forming mixture of claim 1, wherein the metal chlorite is technical grade sodium chlorite. 4. The forming mixture of claim 1 further comprising a free halogen source. 5. The forming mixture of claim 4, wherein the free halogen source is sodium salt of dichloroisocyanuric acid and/or the dihydrate thereof. 6. The forming mixture of claim 1 wherein said anionic surfactant is sodium dodecyl sulfate. 7. The forming mixture of claim 1, wherein said metal chlorite and said acid source react to form from about 85 to about 1,000 ppm chlorine dioxide. 8. The forming mixture of claim 1, wherein the phosphate source is present at an amount of about 10-60 wt. %. 9. A chlorine dioxide liquid mixture comprising water comprising 0.5 to 1,000 ppm chlorine dioxide, 1 to 1,000 ppm phosphate to reduce the corrosivity of the liquid mixture, an anionic surfactant, and optionally a free halogen source, wherein the anionic surfactant is present at up to 1000 ppm and wherein a weight ratio of phosphate to chlorine species in said chlorine dioxide liquid mixture is above 0.4. 10. The forming mixture of claim 1, wherein the phosphate source comprises sodium dihydrogen phosphate. 11. The forming mixture of claim 10, wherein the metal chlorite is technical grade sodium chlorite and the solid acid source is sodium acid sulfate, and wherein the forming mixture further comprises a free halogen source, said source being sodium salt of dichloroisocyanuric acid and/or the dihydrate thereof; andmagnesium sulfate. 12. The liquid mixture of claim 9, wherein the anionic surfactant is selected from the group consisting of sodium dodecyl sulfate, sodium oleate, and an alkyl sulfate salt. 13. The liquid mixture of claim 9, having a pH above 2.5 and below 12.5. 14. The liquid mixture of claim 9, having a pH above 3.5 and below 12.5. 15. The liquid mixture of claim 9, wherein said chlorine dioxide is at a concentration of from about 85 to 1,000 ppm. 16. A device for producing a chlorine dioxide liquid mixture, the device comprising an enclosure that is comprised at least in part by a membrane and the solid chlorine dioxide forming mixture for claim 1, wherein the forming mixture is within the enclosure. 17. A method of cleaning and sanitizing metal objects comprising: mixing the solid chlorine dioxide forming mixture of claim 1 and water, thereby producing a chlorine dioxide liquid mixture comprising 0.5 to 1,000 ppm chlorine dioxide and 0.1 ppm to 1,000 ppm phosphate, wherein a weight ratio of phosphate to chlorine species in the chlorine dioxide liquid mixture is above 0.4; andcontacting said metal object with the liquid mixture. 18. The method of claim 17, wherein the anionic surfactant is sodium dodecyl sulfate. 19. The method of claim 17, wherein the mixing step comprises contacting a device with the water, the device comprising an enclosure that is comprised at least in part by a membrane, wherein the forming mixture is in said enclosure.