초록 ▼

An image sensor includes a substrate with a front side and a back side, the substrate having a sensor array region and a peripheral region defined thereon, a plurality of sensor device disposed in the sensor array region, a first metal layer disposed on the front sides within the peripheral region,

An image sensor includes a substrate with a front side and a back side, the substrate having a sensor array region and a peripheral region defined thereon, a plurality of sensor device disposed in the sensor array region, a first metal layer disposed on the front sides within the peripheral region, a bonding pad disposed on the backside within the peripheral region, and at least a connecting element penetrating the substrate and substantially connect to the first metal layer and the bonding pad, wherein parts of the substrate is between the bonding pad and the first metal layer.

대표청구항 ▼

1. An image sensor, comprising: a substrate with a front side and a back side, wherein the substrate has a sensor array region and a peripheral region defined thereon;a plurality of image sensor devices disposed in the sensor array region;a first metal layer disposed on the front side within the per

1. An image sensor, comprising: a substrate with a front side and a back side, wherein the substrate has a sensor array region and a peripheral region defined thereon;a plurality of image sensor devices disposed in the sensor array region;a first metal layer disposed on the front side within the peripheral region;a bonding pad disposed on the back side within the peripheral region;at least one connecting element penetrating the substrate and substantially contacting to the first metal layer and the bonding pad, wherein parts of the substrate are between the first metal layer and the bonding pad;at least one deep trench isolation (DTI) disposed in the substrate surrounding the bonding pad, wherein the DTI does not contact the connecting element physically. 2. The image sensor of claim 1, wherein the DTI includes insulating materials or conductive materials and the DTI is electrically isolated from the bonding pad. 3. The image sensor of claim 1, further comprising an inter layer dielectric (ILD) disposed on the front side, wherein the first metal layer is disposed on the ILD, and the connecting element penetrates the substrate and the ILD to contact the first metal layer directly, and parts of the substrate and the ILD are between the first metal layer and the bonding pad. 4. The image sensor of claim 1, further comprising a cap layer disposed on the back side of the substrate. 5. The image sensor of claim 1, wherein the connecting element includes a pole-shaped structure or a ring-shaped structure. 6. The image sensor of claim 1, wherein each of the connecting elements penetrates the substrate and directly contacts the first metal layer and the bonding pad, arranged in a ring shape. 7. The image sensor of claim 1, wherein the connecting element and the bonding pad are monolithically formed, the connecting element and the bonding pad include Al, AlCu alloy or AlSiCu alloy. 8. The image sensor of claim 1, wherein the connecting element contacts the substrate directly. 9. The image sensor of claim 1, further comprising a planarizing layer disposed on the back side within the sensor array region, a plurality of color filters disposed in the planarizing layer and a plurality of micro lenses disposed on the planarizing layer. 10. The image sensor of claim 1, wherein the image sensor device includes a plurality of photodiodes disposed in the substrate within the sensor array region. 11. A manufacturing method of an image sensor, comprising: providing a substrate with a front side and a back side, wherein the substrate has a sensor array region and a peripheral region defined thereon;forming a first metal layer disposed on the front side within the peripheral region;forming an opening penetrating the substrate from the back side;forming at least one deep trench isolation (DTI) disposed in the substrate;forming a conductive layer on the back side and in the opening, wherein a connecting element is formed by the conductive layer in the opening, and the DTI does not contact the connecting element physically; andforming a bonding pad through patterning the conductive layer, wherein the DTI surrounds the bonding pad. 12. The manufacturing method of an image sensor of claim 11, wherein the connecting element substantially contacts the substrate. 13. The manufacturing method of an image sensor of claim 11, wherein the DTI includes insulating materials or conductive materials and the DTI is electrically isolated from the bonding pad. 14. The manufacturing method of an image sensor of claim 11, wherein the DTI is formed from the front side before the first metal layer is formed. 15. The manufacturing method of an image sensor of claim 11, wherein the DTI is formed through the back side after the first metal layer is formed. 16. The manufacturing method of an image sensor of claim 11, further comprising forming an inter layer dielectric (ILD) disposed on the front side, wherein the first metal layer is disposed on the ILD, and the connecting element penetrates the substrate and the ILD to contacts the first metal layer directly, and parts of the substrate and the ILD is between the first metal layer and the bonding pad. 17. The manufacturing method of an image sensor of claim 11, wherein each of the connecting elements is arranged in a ring shape. 18. The manufacturing method of an image sensor of claim 11, further comprising forming a plurality of photodiodes disposed in the substrate within the sensor array region, forming a plurality of color filters on the back side within the sensor array region, forming a planarizing layer disposed on the color filter; and forming a plurality of micro lenses disposed on the planarizing layer.