Plasma discharge self-cleaning filtration system
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01D-024/46
B01D-025/32
B01D-024/00
출원번호
US-0672005
(2008-08-07)
등록번호
US-8784657
(2014-07-22)
국제출원번호
PCT/US2008/072502
(2008-08-07)
§371/§102 date
20100518
(20100518)
국제공개번호
WO2009/048682
(2009-04-16)
발명자
/ 주소
Cho, Young I.
Fridman, Alexander
Gutsol, Alexander F.
Yang, Yong
출원인 / 주소
Drexel University
대리인 / 주소
Baker & Hostetler LLP
인용정보
피인용 횟수 :
2인용 특허 :
6
초록▼
The present invention is directed to a novel method for cleaning a filter surface using a plasma discharge self-cleaning filtration system. The method involves utilizing plasma discharges to induce short electric pulses of nanoseconds duration at high voltages. These electrical pulses generate stron
The present invention is directed to a novel method for cleaning a filter surface using a plasma discharge self-cleaning filtration system. The method involves utilizing plasma discharges to induce short electric pulses of nanoseconds duration at high voltages. These electrical pulses generate strong Shockwaves that disintegrate and dislodge particulate matter located on the surface of the filter.
대표청구항▼
1. A method of cleaning a filter having filtered particulate thereon, said filter positioned within a liquid, said method comprising: applying an electric potential to a first electrode positioned within the liquid,so as to generate a pulsed plasma dischargesaid pulsed plasma discharge creating an e
1. A method of cleaning a filter having filtered particulate thereon, said filter positioned within a liquid, said method comprising: applying an electric potential to a first electrode positioned within the liquid,so as to generate a pulsed plasma dischargesaid pulsed plasma discharge creating an electrical pulsevaporizing at least a portion of the liquid to cause a shockwave within the liquid, wherein the shockwave travels to the filter to impart a force upon the filter;said force disintegrating or dislodging the filtered particulate. 2. The method of claim 1, wherein the electrical potential is applied for a duration of 1 to 500 nanoseconds. 3. The method of claim 2, wherein the electrical potential is applied for a duration of 10 to 200 nanoseconds. 4. The method of claim 3, wherein the electrical potential is applied for a duration of 50 to 150 nanoseconds. 5. The method of claim 1, wherein the electrical potential is within a voltage range of about 10 kV to 40 kV. 6. The method of claim 5, wherein the electrical potential is within a voltage range of about 30 kV to 40 kV. 7. The method of claim 1, wherein a frequency of the electrical potential is in the range of approximately 0.1 Hz to 500 Hz. 8. The method of claim 7, wherein the frequency of the electrical potential is in the range of approximately 1 Hz to 100 Hz. 9. The method of claim 1, wherein the electrode is stainless steel. 10. The method of claim 1, wherein the electrical potential is applied to a plurality of second electrodes. 11. The method of claim 1, wherein the filter is a metal, a carbon-containing material, or a non-metallic medium. 12. The method of claim 11, wherein the filter is stainless steel. 13. The method of claim 11, wherein the filter comprise a ceramic. 14. The method of claim 13, wherein the filter further comprises a metallic coating. 15. A self-cleaning filter apparatus comprising: a chamber containing liquid, said chamber having a defined volume;a liquid inlet for inletting unfiltered liquid into the chamber, wherein the unfiltered liquid comprises particulate;a filter mesh for filtering at least a portion of the particulate in the unfiltered liquid to convert the unfiltered liquid into filtered liquid; anda first electrode positioned in the volume within the liquid, located proximate to the filter mesh;said electrode in electrical communication with a power supply, wherein the power supply is configured to cause a suitable electrical potential to form a pulsed plasma discharge at the electrode, thereby vaporizing at least a portion of the liquid, causing a shockwave within the liquid, wherein the shockwave travels to the filter to impart a force upon the filter; said force disintegrating or dislodging the filtered particulate. 16. The apparatus of claim 15, wherein the plasma discharge is a corona discharge plasma or a spark discharge plasma. 17. The apparatus of claim 16, wherein the plasma discharge is controlled by the distance between two electrodes in a spark gap, wherein the spark gap is configured to act as a fast high current switch. 18. The apparatus of claim 15, wherein the chamber is a cartridge filter. 19. The apparatus of claim 15, wherein the chamber is a sand filtration system. 20. The apparatus of claim 15, further comprising a first outlet for the filtered liquid and a second outlet for the particulate. 21. A system, comprising: a first filter chamber containing liquid, said chamber having a defined volume;a first filter positioned within the liquid of the first filter chamber;at least one first electrode positioned within the liquid of the first filter chamber at a location proximate to the first filter; anda power supply in electrical communication with the at least one first electrode, wherein the power supply is configured to provide an electrical potential to the at least one first electrode sufficient to generate pulsed plasma discharge, the plasma discharge being sufficient to create an electrical pulse from the plasma discharge within the liquid which vaporizes at least a portion of the liquid to cause a shockwave within the liquid, wherein the shockwave travels to the first filter to impart a force upon the at least one first filter and disintegrate or dislodge a filtered particulate on the first filter. 22. The system of claim 21, wherein the filter chamber comprises an inlet to allow unfiltered liquid into the defined volume, a first outlet to allow at least filtered liquid to exit the defined volume, and a second outlet to allow at least the filtered particulate to exit the defined volume. 23. The system of claim 21, wherein the chamber is a cartridge filter. 24. The system of claim 21, wherein the chamber is a sand filtration system. 25. The system of claim 21, further comprising: a second filter chamber containing liquid, said chamber having a second defined volume;a second filter positioned within the liquid of the second filter chamber; andat least one second electrode positioned within the liquid of the second filter chamber at a location proximate to the second filter, wherein the power supply is in electrical communication with the second electrode.
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이 특허에 인용된 특허 (6)
Taylor,Robert W.; Sedman,Charles B., Apparatus and method for the removal of particulate matter in a filtration system.
Cho, Young I.; Fridman, Alexander; Cho, Daniel J.; Rabinovich, Alexander, System and method for disinfection and fouling prevention in the treatment of water.
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