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특허 상세정보

Apparatus and method for in-situ endpoint detection for semiconductor processing operations

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B24B-049/12   
미국특허분류(USC) 451/006; 451/533
출원번호 US-0745691 (2013-01-18)
등록번호 US-8795029 (2014-08-05)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Fish & Richardson P.C.
인용정보 피인용 횟수 : 0  인용 특허 : 84
초록

An endpoint detection method includes processing an outer surface of a substrate, directing an incident light beam through a window in an opaque metal body onto the surface being processed, receiving at a detector a reflected light beam from the substrate and generating a signal from the detector, and generating a signal based on the reflected light beam received at the detector, and detecting a processing endpoint. The signal is a time-varying cyclic signal that varies as the thickness of the layer varies over time, and detecting the processing endpoint...

대표
청구항

1. An endpoint detection method, comprising: processing an outer surface of a substrate, the processing changing a thickness of a layer at the outer surface over time;during processing, directing an incident light beam through a window in an opaque metal body onto the surface being processed;receiving at a detector of a monitoring system a reflected light beam from the substrate through the window and generating a signal from the detector, the reflected light beam being a combination of at least a reflection from the outer surface and a reflection from a...

이 특허에 인용된 특허 (84)

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