[미국특허]
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G03B-027/58
G03F-007/20
G03B-027/52
출원번호
US-0812925
(2007-06-22)
등록번호
US-8848168
(2014-09-30)
발명자
/ 주소
Binnard, Michael
출원인 / 주소
Nikon Corporation
대리인 / 주소
Oliff PLC
인용정보
피인용 횟수 :
0인용 특허 :
159
초록▼
An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table th
An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.
대표청구항▼
1. A lithographic immersion exposure apparatus which exposes a substrate with a patterned beam of radiation via a projection system and a liquid, the apparatus comprising: a first table connected to a first table drive system that drives the first table in a direction to displace the first table int
1. A lithographic immersion exposure apparatus which exposes a substrate with a patterned beam of radiation via a projection system and a liquid, the apparatus comprising: a first table connected to a first table drive system that drives the first table in a direction to displace the first table into and out of a path of the patterned beam of radiation, the first table having a substrate holder to hold the substrate; anda second table connected to a second table drive system that drives the second table to displace the second table into the path of the patterned beam of radiation when the first table is displaced out of the path of the patterned beam of radiation, the second table not being configured to hold any substrate, the first and second tables are movable relative to each other in the direction, the second table drive system positioning the second table adjacent to the first table, the first and second table drive systems causing the adjacent first and second tables to be moved together relative to the projection system in the direction so that the liquid is relatively moved from the first table to the second table and so as to place the second table into the path of the patterned beam of radiation while the first table is being displaced out of the path of the patterned beam of radiation. 2. The apparatus according to claim 1, further comprising a controller connected to the first and second table drive systems and configured to control the respective table drive systems to position the second table into the path of the patterned beam of radiation in synchronism with displacement of the first table out of the path of the patterned beam of radiation. 3. The apparatus according to claim 1, wherein the second table drive system comprises first and second motors that move the second table in first and second orthogonal directions. 4. The apparatus according to claim 1, wherein the liquid is substantially maintained at directly below the projection system during a replacement of the first table with the second table disposed in the path of the patterned beam of radiation by the movement of the first and the second tables. 5. The apparatus according to claim 4, wherein the substrate is exposed via the projection system and the liquid, and wherein, in the exposure, the substrate is moved relative to the projection system by the first table. 6. The apparatus according to claim 5, wherein, while the second table is disposed in the path of the patterned beam of radiation, the exposed substrate held by the first table is exchanged for another substrate. 7. The apparatus according to claim 6, wherein, while the second table is disposed in the path of the patterned beam of radiation, an alignment of the another substrate held by the first table is performed. 8. The apparatus according to claim 5, further comprising: an alignment system that is disposed away from the projection system, an alignment being performed by the alignment system;wherein the alignment is performed while the second table is disposed in the path of the patterned beam of radiation. 9. The apparatus according to claim 8, wherein, while the first table is disposed in the path of the patterned beam of radiation, the second table is disposed at a side opposite the alignment system in relation to the projection system. 10. The apparatus according to claim 1, wherein the second table drive system positions the second table adjacent to the first table so that upper surfaces of the first and second tables are substantially coplanar while the first and second tables are being moved to place the second table into the path of the patterned beam of radiation while the first table is being displaced out of the path of the patterned beam of radiation. 11. The apparatus according to claim 1, further comprising: a liquid supply system configured to supply the liquid to a space between the projection system and the substrate, and wherein the second table provides a surface to at least partly bound the space when the first table is displaced out of the path of the patterned beam of radiation. 12. A lithographic immersion exposure method of exposing a substrate with a patterned beam of radiation via a projection system and a liquid, the method comprising: holding a substrate by a first table connected to a first table drive system that drives the first table in a direction to displace the first table into and out of a path of the patterned beam of radiation;exposing the substrate with the patterned beam of radiation via the projection system;positioning a second table adjacent to the first table, the second table not being configured to hold any substrate and being connected to a second table drive system that drives the second table to displace the second table into the path of the patterned beam of radiation when the first table is displaced out of the path of the patterned beam of radiation, the first and second tables are movable relative to each other in the direction; andmoving the adjacent first and second tables together relative to the projection system in the direction so that the liquid is relatively moved from the first table to the second table and so as to place the second table into the path of the patterned beam of radiation while the first table is being displaced out of the path of the patterned beam of radiation;wherein the second table provides a surface to at least partly bound a space below the projection system when the first table is displaced out of the path of the patterned beam of radiation. 13. The method according to claim 12, wherein the first and second table drive systems are controlled to position the second table into the path of the patterned beam of radiation in synchronism with displacement of the first table out of the path of the patterned beam of radiation. 14. The method according to claim 12, wherein the liquid is substantially maintained at directly below the projection system during a replacement of the first table with the second table disposed in the path of the patterned beam of radiation by the movement of the first and the second tables. 15. The method according to claim 14, wherein the substrate is exposed via the projection system and the liquid, and wherein, in the exposure, the substrate is moved relative to the projection system by the first table. 16. The method according to claim 15, wherein, while the second table is disposed in the path of the patterned beam of radiation, the exposed substrate held by the first table is exchanged for another substrate. 17. The method according to claim 16, wherein, while the second table is disposed in the path of the patterned beam of radiation, an alignment of the another substrate held by the first table is performed. 18. The method according to claim 17, wherein the alignment is performed while the second table is disposed in the path of the patterned beam of radiation by use of an alignment system, the alignment system being disposed away from the projection system. 19. The method according to claim 18, wherein, while the first table is disposed in the path of the patterned beam of radiation, the second table is disposed at a side opposite the alignment system in relation to the projection system. 20. The method according to claim 12, wherein the second table is positioned adjacent to the first table so that upper surfaces of the first and second tables are substantially coplanar. 21. The method according to claim 12, wherein the substrate is exposed with the patterned beam of radiation via the projection system and the liquid supplied to a space between the projection system and the substrate.
Binnard,Michael, Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
Binnard,Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
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