초록 ▼

The present invention is a wafer transfer system that transports individual wafers between chambers within an isolated environment. In one embodiment, a wafer is transported by a wafer shuttle that travel within a transport enclosure. The interior of the transport enclosure is isolated from the atmo

The present invention is a wafer transfer system that transports individual wafers between chambers within an isolated environment. In one embodiment, a wafer is transported by a wafer shuttle that travel within a transport enclosure. The interior of the transport enclosure is isolated from the atmospheric conditions of the surrounding wafer fabrication facility. Thus, an individual wafer may be transported throughout the wafer fabrication facility without having to maintain a clean room environment for the entire facility. The wafer shuttle may be propelled by various technologies, such as, but not limited to, magnetic levitation or air bearings. The wafer shuttle may also transport more than one wafer simultaneously. The interior of the transport enclosure may also be under vacuum, gas-filled, or subject to filtered air.

대표청구항 ▼

1. A system for transporting a wafer, comprising: a wafer transport enclosure, the wafer transport enclosure defined by a tube having a substantially rectangular cross section, the tube having a top side, a bottom side, and side walls, each side wall having at least two openings for connecting to at

1. A system for transporting a wafer, comprising: a wafer transport enclosure, the wafer transport enclosure defined by a tube having a substantially rectangular cross section, the tube having a top side, a bottom side, and side walls, each side wall having at least two openings for connecting to at least two processing chambers, the wafer transport enclosure defining a linear path for wafer transport, the linear path facilitating transport of a wafer between the processing chambers;at least one end effector disposed within the wafer transport enclosure and configured for linear travel along the linear path defined by the wafer transport enclosure, the end effector configured to deliver wafers to and from the processing chambers;wherein the end effector delivers wafers to and from the processing chambers by using a combination of linear and rotational motion so as to effect movement of the wafers to and from the processing chambers;wherein the movement of the wafers to and from the processing chambers is linear, defining secondary linear paths between each of the processing chambers and the linear path defined by the wafer transport enclosure. 2. The system of claim 1, further comprising a linear track disposed within the wafer transport enclosure; wherein the end effector travels along the linear track. 3. The system of claim 1, wherein a first end of the wafer transport enclosure is configured for connection to a load lock. 4. The system of claim 1, wherein the wafer transport enclosure defines a controlled environment for wafer transport. 5. The system of claim 1, wherein the wafer transport enclosure defines a controlled environment for wafer transport, the controlled environment defined by a condition selected from the group consisting of a vacuum condition, an inert gas, or filtered air. 6. A system for processing a wafer, comprising: a wafer transfer chamber defined by a tube having a substantially rectangular cross section, the tube having a first end for connecting to a load lock, the tube having a plurality of openings on a side wall for connecting to a plurality of process chambers, the wafer transfer chamber defining a controlled environment for wafer transport;a linear track disposed inside the wafer transfer chamber, the linear track defining a linear path for wafer transport, the wafer transport to be facilitated by an end effector that can be defined to move along the linear track;a second linear track disposed inside the wafer transfer chamber, the second linear track defining a second linear path for wafer transport;a second end effector for transporting wafers along the second linear path, the second end effector traveling along the second linear track; andwherein the wafer transfer chamber has a second end for connecting to a second load lock. 7. The system of claim 6, wherein the end effector moves wafers between the wafer transfer chamber and the processing chambers by applying a combination of linear and rotational motion so as to effect movement of the end effector into and out of the processing chambers. 8. The system of claim 6, wherein the controlled environment is defined by a vacuum condition. 9. The system of claim 6, wherein the wafer transfer chamber is defined by one or more segments, each of the plurality of openings being defined on one segment or more than one segment, each segment coupled one after another along the linear path. 10. The system of claim 6, wherein the wafer transfer chamber defines a controlled environment for wafer transport, the controlled environment defined by a condition selected from the group consisting of a vacuum condition, an inert gas, or filtered air.