A semiconductor handling system including a vacuum workpiece handling system having a vacuum environment therein, the vacuum workpiece handling system including at least two workpiece handling robotic facilities, a mid-entry station positioned between the at least two workpiece handling robotic faci
A semiconductor handling system including a vacuum workpiece handling system having a vacuum environment therein, the vacuum workpiece handling system including at least two workpiece handling robotic facilities, a mid-entry station positioned between the at least two workpiece handling robotic facilities, the mid-entry station including vertically stacked load locks, where the at least two workpiece handling robotic facilities are configured to transfer workpieces between the vertically stacked load locks, at least one workpiece loading station connected to the vacuum handling system, and a workpiece delivery system having an internal environment different from the vacuum environment, the workpiece delivery system being configured to transport the workpieces between each of the vertically stacked load locks of the mid-entry station and the at least one workpiece loading station.
대표청구항▼
1. A semiconductor handling system comprising: a vacuum workpiece handling system having a vacuum environment therein, the vacuum workpiece handling system including at least two workpiece handling robotic facilities;a mid-entry station positioned between the at least two workpiece handling robotic
1. A semiconductor handling system comprising: a vacuum workpiece handling system having a vacuum environment therein, the vacuum workpiece handling system including at least two workpiece handling robotic facilities;a mid-entry station positioned between the at least two workpiece handling robotic facilities, the mid-entry station including vertically stacked load locks, where the at least two workpiece handling robotic facilities are configured to transfer workpieces between the vertically stacked load locks;at least one workpiece loading station connected to the vacuum handling system; anda workpiece delivery system having an internal environment different from the vacuum environment, the workpiece delivery system being configured to transport the workpieces between each of the vertically stacked load locks of the mid-entry station and the at least one workpiece loading station. 2. The semiconductor handling system of claim 1, wherein the at least two workpiece handling robotic facilities of the vacuum workpiece handling system are serially coupled to form a linearly elongated transport chamber having a first end and a second end. 3. The semiconductor handling system of claim 2, wherein the at least one workpiece loading station is located at one of the first end and second end. 4. The semiconductor handling system of claim 2, wherein the at least one workpiece loading station comprises two workpiece loading stations, where one of the two workpiece loading stations is connected to the first end and another of the two workpiece loading stations is connected to the second end. 5. The semiconductor handling system of claim 1, wherein the workpieces enter the vacuum environment at the mid-entry station. 6. The semiconductor handling system of claim 1, wherein the workpieces exit the vacuum environment at the mid-entry station. 7. The semiconductor handling system of claim 1, further comprising a second mid-entry station positioned between the at least two workpiece handling robotic facilities where the workpiece delivery system is configured to move the workpieces to the mid-entry station and retrieve the workpieces from the second mid-entry station. 8. The semiconductor handling system of claim 7, wherein the second mid-entry station includes a pair of vertically stacked load locks. 9. The semiconductor handling system of claim 1, wherein each of the workpiece handling robotic facilities includes one or more robotic arms configured to handle the workpieces. 10. The semiconductor handling system of claim 9, wherein the one or more robotic arms comprise SCARA arms. 11. A system comprising: a vacuum environment including a plurality of robotic handling facilities, each robotic handling facility including ports configured to couple to a processing module;at least two end loading stations connected to ends of the vacuum environment, each end loading station including vertically stacked load locks configured to effect transfer of workpieces to and from the vacuum environment;a mid-entry station coupled to the vacuum environment and separating the vacuum environment into separate interior volumes, the mid-entry station being configured to at least one of add the workpieces to the vacuum environment and remove the workpieces from the vacuum environment; anda workpiece delivery system having an internal environment different from the vacuum environment, the workpiece delivery system being configured to transport the workpieces between each of the vertically stacked load locks of the at least two end loading stations and the mid-entry station. 12. The system of claim 11, wherein the mid-entry station includes vertically stacked load locks. 13. The system of claim 11, wherein the workpieces enter the vacuum environment at the mid-entry station. 14. The system of claim 11, wherein the workpieces exit the vacuum environment at the mid-entry station. 15. The system of claim 11, further comprising a plurality of mid-entry stations, where each mid-entry station is disposed between the at least two end loading stations. 16. The system of claim 15, wherein the workpiece delivery system is configured to move the workpieces to a first one of the plurality of mid-entry stations and retrieve the workpieces from a second one of the plurality of mid-entry stations. 17. The system of claim 15, wherein one or more of the plurality of mid-entry stations includes vertically stacked load locks. 18. The system of claim 11, wherein the plurality of robotic handling facilities are arranged for sequential processing of the workpieces from a first processing module to a last processing module. 19. The system of claim 11, wherein at least one of a semiconductor processing module and a robotic handling facility can be added to the vacuum environment without reconfiguring existing components of the vacuum environment.
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