[미국특허]
Immersion catadioptric projection objective having two intermediate images
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G02B-017/08
G03F-007/20
G02B-021/02
G02B-021/33
G02B-013/22
출원번호
US-0143060
(2013-12-30)
등록번호
US-8908269
(2014-12-09)
발명자
/ 주소
Shafer, David R.
Ulrich, Wilhelm
Dodoc, Aurelian
von Buenau, Rudolf M.
Mann, Hans-Juergen
Epple, Alexander
Beder, Susanne
Singer, Wolfgang
출원인 / 주소
Carl Zeiss SMT GmbH
대리인 / 주소
Fish & Richardson P.C.
인용정보
피인용 횟수 :
0인용 특허 :
225
초록▼
A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second obje
A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP110 holds.
대표청구항▼
1. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part to image the pattern provided in the object plane to a first intermediate image, wherein all of the
1. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part to image the pattern provided in the object plane to a first intermediate image, wherein all of the elements in the first objective part having optical power to image the pattern provided in the object plane to the first intermediate image are refractive elements;a second objective part that comprises at least one concave mirror to image the first intermediate image to a second intermediate image; anda third objective part to image the second intermediate image to the image plane, wherein all of the elements in the third objective part having optical power to image the second intermediate image to the image plane are refractive elements;wherein the third objective part comprises at least two negative lenses,wherein two of the negative lenses each have a concave surface facing the image plane,wherein an aperture stop is positioned in the third objective part,wherein there are no more than four lenses in the third objective part between the aperture stop and the image plane, andwherein the projection objective has an image-side numerical aperture NA of at least 1.2 when water is used as an immersion fluid between the third objective part and the image plane. 2. The catadioptric projection objective of claim 1, wherein all of the lenses in the third objective part between the aperture stop and the image plane are positive lenses. 3. The catadioptric projection objective of claim 1, wherein the two negative lenses each having the concave surface facing the image plane are adjacent one another. 4. The catadioptric projection objective of claim 1, wherein the third objective part comprises three negative lenses. 5. The catadioptric projection objective of claim 1, wherein there are no more than three lenses between the aperture stop and the image plane. 6. The catadioptric projection objective of claim 1, wherein the projection objective is configured for use at 193 nm. 7. The catadioptric projection objective of claim 1, wherein the third objective part comprises a double asphere formed by adjacent aspheric surfaces on consecutive lenses in the third objective part. 8. The catadioptric projection objective of claim 1, wherein the projection objective has an image-side numerical aperture NA of at least 1.3 when water is used as an immersion fluid between the third objective part and the image plane. 9. The catadioptric projection objective of claim 1, wherein the second objective part comprises two concave mirrors. 10. A catadioptric projection exposure system for microlithography comprising an illumination system and the projection objective as claimed in claim 1. 11. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part to image the pattern provided in the object plane to a first intermediate image, wherein all of the elements in the first objective part having optical power to image the pattern provided in the object plane to the first intermediate image are refractive elements;a second objective part that comprises at least one concave mirror to image the first intermediate image to a second intermediate image, wherein each concave mirror has a continuous surface positioned for imaging the first intermediate image to the second intermediate image without a pupil obscuration; anda third objective part to image the second intermediate image to the image plane, wherein all of the elements in the third objective part having optical power to image the second intermediate image to the image plane are refractive elements;wherein the catadioptric projection objective comprises a double asphere formed by adjacent aspheric surfaces on consecutive lenses, and wherein the projection objective has an image-side numerical aperture NA of at least 1.2 when water is used as an immersion fluid between the third objective part and the image plane. 12. The catadioptric projection objective according to claim 11, wherein an axial distance between the adjacent aspheric surfaces is smaller than an axial thickness of a thinner of the two consecutive lenses forming the double asphere. 13. The catadioptric projection objective according to claim 11, wherein the double asphere is in the third objective part. 14. The catadioptric projection objective of claim 13, wherein the double asphere is positioned optically between the second intermediate image and the pupil surface of the third objective part. 15. The catadioptric projection objective of claim 11, wherein the double asphere is in the first objective part. 16. The catadioptric projection objective of claim 11, further comprising a second double asphere formed by adjacent aspheric surfaces on another pair of consecutive lenses. 17. The catadioptric projection objective of claim 16, wherein the first double asphere is in the third objective part and the second double asphere is in the first objective part. 18. The catadioptric projection objective of claim 11, wherein the projection objective has an image-side numerical aperture NA of at least 1.3 when water is used as an immersion fluid between the third objective part and the image plane. 19. A catadioptric projection exposure system for microlithography comprising an illumination system and the projection objective as claimed in claim 11. 20. The catadioptric projection objective of claim 1, wherein the first and third objectives share a common optical axis. 21. The catadioptric projection objective of claim 20, wherein the concave mirror has a continuous surface positioned on one side of the common optical axis. 22. A catadioptric projection objective of claim 1, wherein each concave mirror has a continuous surface positioned for imaging the first intermediate image to the second intermediate image without a pupil obscuration. 23. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising: a first objective part to image the pattern provided in the object plane to a first intermediate image, wherein all of the elements in the first objective part having optical power to image the pattern provided in the object plane to the first intermediate image are refractive elements;a second objective part that comprises at least one concave mirror to image the first intermediate image to a second intermediate image; anda third objective part to image the second intermediate image to the image plane, wherein all of the elements in the third objective part having optical power to image the second intermediate image to the image plane are refractive elements;wherein the third objective part comprises at least three negative lenses, and wherein two of the negative lenses in the third objective part are adjacent one another, andwherein the projection objective has an image-side numerical aperture NA of at least 1.2 when water is used as an immersion fluid between the third objective part and the image plane. 24. The catadioptric projection objective of claim 23, wherein the two negative lenses that are adjacent one another each have a concave surface facing the image plane. 25. The catadioptric projection objective of claim 24, wherein an aperture stop is positioned in the third objective part, and wherein there are no more than four lenses in third objective part between the aperture stop and the image plane. 26. The catadioptric projection objective of claim 25, wherein all of the lenses in the third objective part between the aperture stop and the image plane are positive lenses. 27. The catadioptric projection objective of claim 26, wherein the projection objective is configured for use at 193 nm and has an image-side numerical aperture NA of at least 1.3 at 193 nm when water is used as an immersion fluid between the third objective part and the image plane. 28. A catadioptric projection objective of claim 27, wherein each concave mirror has a continuous surface positioned for imaging the first intermediate image to the second intermediate image without a pupil obscuration. 29. The catadioptric projection objective of claim 28, wherein the first and third objectives share a common optical axis, wherein the continuous surface of each concave mirror is positioned on one side of the common optical axis for imaging the first intermediate image to the second intermediate image without a pupil obscuration. 30. A catadioptric projection exposure system for microlithography comprising an illumination system and the projection objective as claimed in claim 29.
David R. Shafer ; Helmut Beierl DE; Gerhard Furter DE; Karl-Heinz Schuster DE; Wilhelm Ulrich DE, Catadioptric optical system and exposure apparatus having the same.
Kleemann, Bernd; Rostalski, Hans-Jürgen; Ulrich, Willi, Diffractive optical element and also optical arrangement comprising a diffractive optical element.
Shima, Shinichi, Exposure apparatus, method of manufacturing semiconductor devices, semiconductor manufacturing plant, method of maintaining exposure apparatus, and position detector.
Piwonka-Corle Timothy R. (Portland OR) Scoffone Karen F. (Redwood City CA) Chen Xing (San Jose CA) Lacomb ; Jr. Lloyd J. (Santa Clara CA) Stehle Jean-Louis (Colombes FRX) Zahorski Dorian (Vanves FRX), Focused beam spectroscopic ellipsometry method and system.
Bruning John H. (Pittsford NY) Phillips ; Jr. Anthony R. (Fairport NY) Shafer David R. (Fairfield CT) White Alan D. (Berkeley Heights NJ), Lens system for X-ray projection lithography camera.
Ainsworth ; Jr. Thomas (Ossining NY) Chiu George (Cross River NY) Singh Rama N. (Bethel CT) Wilczynski Janusz S. (Ossining NY), Lens system for scanning laser apparatus.
Kamenov,Vladimir; Kraehmer,Daniel; Totzeck,Michael; Gruner,Toralf; Dodoc,Aurelian, Method of determining lens materials for a projection exposure apparatus.
Wagner,Cristian; Gerhard,Michael; Richter,Gerald, Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same.
Braat Josephus J. M.,NLX, Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system.
Braat Josephus J. M.,NLX, Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system.
Josephus J. M. Braat NL, Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system.
Shafer,David R.; Beder,Susanne; Schuster,Karl Heinz; Singer,Wolfgang, Objectives as a microlithography projection objective with at least one liquid lens.
Shafer,David R.; Beder,Susanne; Schuster,Karl Heinz; Singer,Wolfgang, Objectives as a microlithography projection objective with at least one liquid lens.
Goodman Douglas S. (Yorktown Heights NY) Rosenbluth Alan E. (Yorktown Heights NY) Tibbetts Raymond E. (Cape Coral FL) Wilczynski Janusz S. (Ossining NY), Optical projection system.
Singh Rama N. (Bethel CT) Wilczynski Janusz S. (Ossining NY), Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations.
Tabarelli Werner (Schlossstr. 5 Vaduz LIX FL-9490) Lbach Ernst W. (Tonagass 374 Eschen LIX FL-9492), Photolithographic method for the manufacture of integrated circuits.
von Bünau, Rudolf; Hembd-Söllner, Christian; Holderer, Hubert, Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography.
Epple,Alexander; Graeupner,Paul; Kaiser,Winfried; Garreis,Reiner; Ulrich,Wilhelm, Projection objective, especially for microlithography, and method for adjusting a projection objective.
Koyama Motoo,JPX ; Ichihara Yutaka,JPX, Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection.
Matsuzawa Hitoshi,JPX ; Kobayashi Misako,JPX ; Endo Kazumasa,JPX ; Suenaga Yutaka,JPX, Projection optical system and exposure apparatus using the same.
Omura,Yasuhiro; Ikezawa,Hironori; Williamson,David M, Projection optical system and method for photolithography and exposure apparatus and method using same.
Omura, Yasuhiro, Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus.
Bruning John H. (Pittsford NY) Phillips ; Jr. Anthony R. (Fairport NY) Shafer David R. (Fairfield CT) White Alan D. (Berkeley Heights NJ), X-ray projection lithography camera.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.