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Recess ceiling fan bezel 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • 23-04
출원번호 US-0448101 (2013-03-08)
등록번호 US-D723153 (2015-02-24)
발명자 / 주소
  • Borkholder, Olen
출원인 / 주소
  • Borkholder, Olen
대리인 / 주소
    QuickPatents
인용정보 피인용 횟수 : 51  인용 특허 : 24

초록

초록이 없습니다.

대표청구항

I claim the ornamental design for a recess ceiling fan bezel, as shown and described.

이 특허에 인용된 특허 (24)

  1. Nishizawa Keisuke, Air duct.
  2. Nishizawa, Keisuke, Air vent.
  3. Winkler, Wolfgang Arno, Axial fan.
  4. McVey John (4255 Bayridge Ct. Spring Hill FL 33526), Combined ceiling fan and recessed lighting fixture.
  5. Isom,Carol, Combined toy bunny and hat.
  6. Suk Eugene J. (Pittsburgh PA), Cover for electrical floor boxes.
  7. Yabe, Mitsuo; Ikeda, Masahiro; Watanabe, Tomoya, Fan shroud for construction machinery.
  8. Dinh,Cong Thanh, Floor box cover assembly.
  9. Pan, Peter, Hanger assembly for a ceiling fan.
  10. Parker Jacqueline ; Parker Samuel, Heat deflector.
  11. Esjunin, Evgeniy E.; DeForte, Robert L., Kiln shoe.
  12. Rashidi, Hamid, LED retrofit recessed light with lens.
  13. Campagna, Cary J., Light fixture base.
  14. Kelsall Jeffrey C. (Roselle IL), Mounting system for recessed light fixture.
  15. Yu, Steven, Non-curved rim of fan.
  16. Gautney, James Cameron, Outdoor fan system.
  17. Benghozi, Simon-Victor, Recessed light fixture.
  18. Chan Kingsley (Guttenburg NJ) Russo Neil (Howell NJ) Newman Albert L. (West Orange NJ) Chin Cristina C. (Cranford NJ), Recessed lighting fixture.
  19. Cece Dennis F., Recessed pivoting light.
  20. Patterson, Rick, Trap hat.
  21. Lecluze Michel (1009 ; rue du Parc Industriel St-Jean Chrysostome ; Quebec CAX G6Z 1C5 ), Trim for embedded light fixture.
  22. Lecluze Michel,CAX ITX G6Z 1C5, Trim for recessed light fixture.
  23. Lecluze Michel (1009 rue du Parc Industriel St-Jean-Chrysostome ; Qubec CAX), Trim ring for recessed lighting fixture.
  24. Flohre John Gerhard, Universal, light fixture/ceiling fan recessed mounting device.

이 특허를 인용한 특허 (51)

  1. Ootsuka, Fumio, 3D stacked multilayer semiconductor memory using doped select transistor channel.
  2. Oosterlaken, Theodorus; de Ridder, Chris; Jdira, Lucian, Apparatus and method for manufacturing a semiconductor device.
  3. Kamiya, Tatsuo, Apparatus and method for transporting wafers between wafer carrier and process tool under vacuum.
  4. den Hartog Besselink, Edwin; Garssen, Adriaan; Dirkmaat, Marco, Cassette holder assembly for a substrate cassette and holding member for use in such assembly.
  5. Deluca, Domenico F.; Knoll, Mark, Combined bottle light and helmet shade.
  6. Zaitsu, Masaru; Fukazawa, Atsuki; Fukuda, Hideaki, Continuous process incorporating atomic layer etching.
  7. Raisanen, Petri; Shero, Eric; Haukka, Suvi; Milligan, Robert Brennan; Givens, Michael Eugene, Deposition of metal borides.
  8. Zhu, Chiyu; Shrestha, Kiran; Haukka, Suvi, Deposition of metal borides.
  9. Pyshos, Steven; Sahaye, Nivay, Dimpled trim for a recessed luminaire.
  10. Benghozi, Simon; Allen, Sebastien, Fire proof recessed light fixture.
  11. Benghozi, Simon; Allen, Sebastien, Fire proof recessed light fixture.
  12. Milligan, Robert Brennan, Formation of boron-doped titanium metal films with high work function.
  13. Kawamura, Khotaro; Kashiwagi, Makoto; Ikeda, Hiroshi, Inner cylinder for exhaust gas treatment apparatus.
  14. Campagna, Cary J., Light fixture base.
  15. Serwacki, Megan; Zaderej, Victor; Picini, Michael; Kuchuris, Gregory; Mcgowan, Daniel; Canzano, Timothy, Lighting assembly.
  16. Serwacki, Megan; Zaderej, Victor; Picini, Michael; Kuchuris, Gregory; Mcgowan, Daniel; Canzano, Timothy, Lighting assembly.
  17. Pore, Viljami, Method and apparatus for filling a gap.
  18. Pore, Viljami; Knaepen, Werner; Jongbloed, Bert; Pierreux, Dieter; Van Aerde, Steven R. A.; Haukka, Suvi; Fukuzawa, Atsuki; Fukuda, Hideaki, Method and apparatus for filling a gap.
  19. Pore, Viljami; Knaepen, Werner; Jongbloed, Bert; Pierreux, Dieter; Van Der Star, Gido; Suzuki, Toshiya, Method and apparatus for filling a gap.
  20. Suemori, Hidemi, Method for depositing dielectric film in trenches by PEALD.
  21. Kang, DongSeok, Method for depositing thin film.
  22. Takamure, Noboru; Okabe, Tatsuhiro, Method for forming Ti-containing film by PEALD using TDMAT or TDEAT.
  23. Shiba, Eiichiro, Method for forming aluminum nitride-based film by PEALD.
  24. Fukazawa, Atsuki, Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition.
  25. Fukazawa, Atsuki; Fukuda, Hideaki; Takamure, Noboru; Zaitsu, Masaru, Method for forming dielectric film in trenches by PEALD using H-containing gas.
  26. Kimura, Yosuke; de Roest, David, Method for forming film having low resistance and shallow junction depth.
  27. Ishikawa, Dai; Fukazawa, Atsuki, Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches.
  28. Namba, Kunitoshi, Method for forming silicon oxide cap layer for solid state diffusion process.
  29. Shiba, Eiichiro, Method for performing uniform processing in gas system-sharing multiple reaction chambers.
  30. Yamagishi, Takayuki; Suwada, Masaei; Tanaka, Hiroyuki, Method for positioning wafers in multiple wafer transport.
  31. Kato, Richika; Nakano, Ryu, Method for protecting layer by forming hydrocarbon-based extremely thin film.
  32. Kato, Richika; Okuro, Seiji; Namba, Kunitoshi; Nonaka, Yuya; Nakano, Akinori, Method for protecting layer by forming hydrocarbon-based extremely thin film.
  33. Zaitsu, Masaru, Method of atomic layer etching using functional group-containing fluorocarbon.
  34. Zaitsu, Masaru; Kobayashi, Nobuyoshi; Kobayashi, Akiko; Hori, Masaru; Kondo, Hiroki; Tsutsumi, Takayoshi, Method of cyclic dry etching using etchant film.
  35. Knaepen, Werner; Maes, Jan Willem; Jongbloed, Bert; Kachel, Krzysztof Kamil; Pierreux, Dieter; De Roest, David Kurt, Method of forming a structure on a substrate.
  36. Lee, Choong Man; Yoo, Yong Min; Kim, Young Jae; Chun, Seung Ju; Kim, Sun Ja, Method of forming metal interconnection and method of fabricating semiconductor apparatus using the method.
  37. Chun, Seung Ju; Yoo, Yong Min; Choi, Jong Wan; Kim, Young Jae; Kim, Sun Ja; Lim, Wan Gyu; Min, Yoon Ki; Lee, Hae Jin; Yoo, Tae Hee, Method of processing a substrate and a device manufactured by using the method.
  38. Kohen, David; Profijt, Harald Benjamin, Methods for depositing a doped germanium tin semiconductor and related semiconductor device structures.
  39. Raisanen, Petri; Givens, Michael Eugene, Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures.
  40. Zhu, Chiyu; Asikainen, Timo; Milligan, Robert Brennan, NbMC layers.
  41. Margetis, Joe; Tolle, John; Bartlett, Gregory; Bhargava, Nupur, Process for forming a film on a substrate using multi-port injection assemblies.
  42. Alokozai, Fred; Milligan, Robert Brennan, Process gas management for an inductively-coupled plasma deposition reactor.
  43. Fujisawa, Shinichi, Recessed ceiling light.
  44. Vidal, Guillaume, Recessed light fixture.
  45. Zhu, Chiyu, Selective film deposition method to form air gaps.
  46. Kim, Young Jae; Choi, Seung Woo; Yoo, Yong Min, Semiconductor device and manufacturing method thereof.
  47. Arai, Izumi, Single-and dual-chamber module-attachable wafer-handling chamber.
  48. Xie, Qi; de Roest, David; Woodruff, Jacob; Givens, Michael Eugene; Maes, Jan Willem; Blanquart, Timothee, Source/drain performance through conformal solid state doping.
  49. Tolle, John, Structures and devices including germanium-tin films and methods of forming same.
  50. Jeong, Sang Jin; Han, Jeung Hoon; Choi, Young Seok; Park, Ju Hyuk, Susceptor for semiconductor substrate processing apparatus.
  51. Yamagishi, Takayuki; Sato, Kazuo; Tsuji, Naoto, Top plate.
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