A self-contained water polishing system includes at least a first containment basin that has an inlet for inflow of water from a collection source and contains calcium carbonate for treatment of water flowing through the system; at least a first polishing basin in communication with the containment
A self-contained water polishing system includes at least a first containment basin that has an inlet for inflow of water from a collection source and contains calcium carbonate for treatment of water flowing through the system; at least a first polishing basin in communication with the containment basin and that contains at least a first pollutant collection substrate for treatment of water flowing through the system; and a vacuum pumping system in fluid communication with the containment and polishing basins that draws water through the polishing system.
대표청구항▼
1. A self-contained water polishing system, comprising: at least a first containment basin, said containment basin having an inlet for inflow of water from a collection source and containing calcium carbonate for treatment of water flowing through said polishing system;at least a first polishing bas
1. A self-contained water polishing system, comprising: at least a first containment basin, said containment basin having an inlet for inflow of water from a collection source and containing calcium carbonate for treatment of water flowing through said polishing system;at least a first polishing basin, said polishing basin containing at least a first pollutant collection substrate for treatment of water flowing through said polishing system, said polishing basin being in fluid communication with said containment basin;a vacuum pumping system in fluid communication with said polishing basin and said containment basin and operable to draw water through said polishing system; andan exterior calcium carbonate surface positioned outside of said first containment basin and said first polishing basin and over which said water is directed prior to discharge from said polishing system. 2. A self-contained water polishing system, comprising: at least a first containment basin, said containment basin having an inlet for inflow of water from a collection source and containing calcium carbonate for treatment of water flowing through said polishing system;at least a first polishing basin, said polishing basin containing at least a first pollutant collection substrate for treatment of water flowing through said polishing system, said polishing basin being in fluid communication with said containment basin;a vacuum pumping system in fluid communication with said polishing basin and said containment basin and operable to draw water through said polishing system; anda mechanical contaminant separation device surrounding and controlling access to an outlet of at least one of said first containment basin and said first polishing basin. 3. The self-contained water polishing system as set forth in claim 2, wherein said mechanical contaminant separation device further comprises a housing, said housing surrounding said outlet and extending below a water line within said first containment basin or said first polishing basin; a vent in said housing; and an anti-microbial skirt surrounding at least a lower portion of said housing. 4. A self-contained water polishing system, comprising: a run-off water polishing system, said run-off water polishing system further comprising: at least one collection container;a first containment basin, said first containment basin being in fluid communication with said collection container via an inlet and said first containment basin being lined with calcium carbonate for treatment of water flowing through said run-off water polishing system;a first polishing basin, said first polishing basin being in fluid communication with said first containment basin and said first polishing basin containing at least a first pollutant collection substrate for treatment of water flowing through said run-off water polishing system; anda first vacuum pumping system in fluid communication with said first polishing basin and said first containment basin and operable to draw water through said run-off water polishing system;a flowing water polishing system, said flowing water polishing system further comprising: a collection chamber arranged in the path of flowing water;a second containment basin, said second containment basin being in fluid communication with said collection chamber via an inlet and said second containment basin being lined with calcium carbonate for treatment of water flowing through said flowing water polishing system;a second polishing basin, said second polishing basin being in fluid communication with said second containment basin and said second polishing basin containing a second pollutant collection substrate for treatment of water flowing through said flowing water polishing system; anda second vacuum pumping system in fluid communication with said second polishing basin and said second containment basin and operable to draw water through said flowing water polishing system. 5. The self-contained water polishing system as set forth in claim 4, wherein said calcium carbonate in said first and second containment basins is provided in the form of limestone rock. 6. The self-contained water polishing system as set forth in claim 4, wherein said first and second polishing basins are also lined with calcium carbonate. 7. The self-contained water polishing system as set forth in claim 4, wherein said first and second containment basins further contain first and second pumps, respectively, for directing water from said first containment basin to one of the group consisting of: a third containment basin and said first polishing basin; and from said second containment basin to one of the group consisting of: a fourth containment basin and said second polishing basin. 8. The self-contained water polishing system as set forth in claim 4, wherein said first containment basin is provided with a vertical baffle wall separating an interior of said first containment basin into first and second compartments, said vertical baffle wall defining at least one opening therein to allow for movement of water from said first compartment to said second compartment. 9. The self-contained water polishing system as set forth in claim 4, wherein said second containment basin is provided with a vertical baffle wall separating an interior of said second containment basin into first and second compartments, said vertical baffle wall defining at least one opening therein to allow for movement of water from said first compartment to said second compartment. 10. The self-contained water polishing system as set forth in claim 4, wherein said first polishing basin is provided with a vertical baffle wall separating an interior of said first polishing basin into first and second compartments, said vertical baffle wall defining at least one opening therein to allow for movement of water from said first compartment to said second compartment. 11. The self-contained water polishing system as set forth in claim 10, wherein said first pollutant collection substrate is positioned in said first compartment. 12. The self-contained water polishing system as set forth in claim 10, wherein said first polishing basin further comprises at least one plumbing conduit traversing said interior of said first polishing basin to direct water flowing through said first polishing basin through said first compartment, through said opening in said vertical baffle wall, and through said second compartment. 13. The self-contained water polishing system as set forth in claim 4, wherein said second polishing basin is provided with a vertical baffle wall separating an interior of said second polishing basin into first and second compartments, said vertical baffle wall defining at least one opening therein to allow for movement of water from said first compartment to said second compartment. 14. The self-contained water polishing system as set forth in claim 13, wherein said second pollutant collection substrate is positioned in said first compartment. 15. The self-contained water polishing system as set forth in claim 13, wherein said second polishing basin further comprises at least one plumbing conduit traversing said interior of said second polishing basin to direct water flowing through said first polishing basin through said first compartment, through said opening in said vertical baffle wall, and through said second compartment. 16. The self-contained water polishing system as set forth in claim 4, wherein said water travels through said first polishing basin under at least a partial vacuum created by said first vacuum pumping system. 17. The self-contained water polishing system as set forth in claim 4, wherein said water travels through said second polishing basin under at least a partial vacuum created by said second vacuum pumping system. 18. The self-contained water polishing system as set forth in claim 4, further comprising an exterior calcium carbonate surface positioned outside of said first containment basin and said first polishing basin and over which said water is directed prior to discharge from said run-off water polishing system. 19. The self-contained water polishing system as set forth in claim 4, further comprising a mechanical contaminant separation device surrounding and controlling access to an outlet of at least one of said first containment basin, said second containment basin, said first polishing basin, and said second polishing basin. 20. The self-contained water polishing system as set forth in claim 4, wherein said mechanical contaminant separation device further comprises a housing, said housing surrounding said outlet and extending below a water line within said first containment basin or said first polishing basin; a vent in said housing; and an anti-microbial skirt surrounding at least a lower portion of said housing.
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이 특허에 인용된 특허 (16)
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Vandervelde Don M. (5409 Huntwick Dr. NW. Gig Harbor WA 98335) Helm Glenn J. (1616 Dawn Rd. Bremerton WA 98310), Method for treating sewage and other liquids.
Vandervelde Don M. (5409 Huntwick Dr. NW. Gig Harbor WA 98335) Helm Glenn J. (1616 NE. Dawn Rd. Bremerton WA 98310), Process and apparatus for a biological reactor to purify water.
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