[특허]Atomizing method for producing synthetic quartz glass

Atomizing method for producing synthetic quartz glass 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C03B-037/018 C03B-020/00 C03B-037/01 C03B-037/014 C03B-019/14
출원번호	US-0684394 (2012-11-23)
등록번호	US-8984911 (2015-03-24)
우선권정보	DE-10 2011 119 339 (2011-11-25)
발명자 / 주소	Fabian, Heinz Roeper, Juergen
출원인 / 주소	Heraeus Quarzglas GmbH & Co. KG
대리인 / 주소	Tiajoloff and Kelly LLP
인용정보	피인용 횟수 : 0 인용 특허 : 67

초록 ▼

The present invention relates to a method for producing synthetic quartz glass, comprising the steps of: providing a liquid SiO2 feedstock material (105), which comprises more than 70% by wt. of the octamethylcyclotetrasiloxane D4, vaporizing the SiO2 feedstock material (105) into a gaseous SiO2 feedstock vapor (107), converting the SiO2 feedstock vapor (107) into SiO2 particles, depositing the SiO2 particles on a deposition surface (160) while forming a SiO2 soot body (200), vitrifying the SiO2 soot body (200) while forming the synthetic quartz glass. According to the invention it is provided that vaporizing the heated SiO2 feedstock material (105) comprises an injection phase in an expansion chamber (125) in which the heated SiO2 feedstock material (105) is atomized into droplets, the droplets having a mean diameter of less than 5 pm, preferably less than 2 μm.

대표청구항 ▼

1. A method for producing synthetic quartz glass, said method comprising: (A) providing a liquid SiO2 feedstock material, which comprises more than 70% by wt. of octamethylcyclotetrasiloxane (D4) and an additional component hexamethylcyclotrisiloxane (D3) and/or an additional component decamethylcyclopentasiloxane (D5), whereby the sum of the weight fractions of D3 and D5 is in the range between 0.5% by wt. and 3% by wt. of a total weight of the liquid SiO2 feedstock material,(B) vaporizing the liquid SiO2 feedstock material into a gaseous SiO2 feedstock vapor,(C) converting the gaseous SiO2 feedstock vapor into SiO2 particles,(D) depositing the SiO2 particles on a deposition surface so as to form SiO2 soot body with an outer diameter of more than 300 mm, and(E) vitrifying the SiO2 soot body so as to form the synthetic quartz glass, wherein said vaporizing of the liquid SiO2 feedstock material comprises: heating the SiO2 feedstock material, andan injection phase during which said heated SiO2 feedstock material is injected into an expansion chamber in which the heated SiO2 feedstock material is atomized into droplets, the droplets having a mean diameter of less than 5 μm, said heated SiO2 feedstock material being introduced into the expansion chamber so that at least a first part of the heated SiO2 feedstock material vaporizes due to a pressure drop in a range between 1.8 and 5 bar. 2. The method according to claim 1, wherein the liquid SiO2 feedstock material comprises more than 95% by wt. of D4. 3. The method according to claim 1, wherein vaporizing further comprises mixing the heated SiO2 feedstock material with a heated diluent, so that at least a second part of the heated SiO2 feedstock material vaporizes due to a decrease in the dew point. 4. The method according to claim 3, wherein the heated SiO2 feedstock material is converted due to the reduction of the partial pressure at at least 99.995% by wt. into the gaseous SiO2 feedstock vapor. 5. The method according to claim 3, wherein the heated SiO2 feedstock material is converted due to the reduction of the partial pressure at at least 99.9995% by wt. into the gaseous SiO2 feedstock vapor. 6. The method according to claim 1, wherein the heated SiO2 feedstock material is converted due to the pressure drop at at least 99.995% by wt. into the gaseous SiO2 feedstock vapor. 7. The method according co claim 1; and further comprising producing an optical fiber from said synthetic quartz glass. 8. The method according to claim 1, wherein the mean diameter of the droplets is less than 2 μm. 9. The method according to claim 1, wherein the liquid SiO2 feedstock material comprises more than 99.5% by wt., of D4. 10. The method according to claim 1, wherein the heated SiO2 feedstock material is converted due to the pressure drop at at least 99.995% by wt. into the gaseous SiO2 feedstock vapor.

이 특허에 인용된 특허 (67)

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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Atomizing method for producing synthetic quartz glass 원문보기

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Atomizing method for producing synthetic quartz glass 원문보기

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