Disclosed is a laser peening apparatus, including: a liquid holding head to shape and hold liquid to trap plasma on a local surface of a workpiece; and a laser irradiation head to irradiate the surface with laser through the liquid held in the liquid holding head.
대표청구항▼
1. A laser peening apparatus, comprising: a liquid holding head including: a liquid holding chamber to shape and hold a liquid in a direct contact with a local surface of a workpiece; andan incident window located on an edge of the liquid holding chamber, the liquid extending from a surface of the i
1. A laser peening apparatus, comprising: a liquid holding head including: a liquid holding chamber to shape and hold a liquid in a direct contact with a local surface of a workpiece; andan incident window located on an edge of the liquid holding chamber, the liquid extending from a surface of the incident window to the local surface;a laser irradiation head to irradiate the local surface with a laser beam through the liquid held in the liquid holding chamber; anda moving device configured so as to move the workpiece in a direction toward the liquid holding head so as to press the local surface of the workpiece against the liquid holding head and configured to move the workpiece in a direction orthogonal to the direction toward the liquid holding head,wherein the liquid is adapted for trapping a plasma generated by the laser irradiation,wherein the liquid is in a sealed contact with a surface of the workpiece around the local surface,wherein the liquid holding head is configured such that the liquid flowingly contacts the surface of the workpiece around the local surface, andwherein the liquid holding head is configured such that, if the workpiece is moved in the direction orthogonal to the direction toward the liquid holding head, the liquid holding head holds the liquid in a constant shape. 2. The laser peening apparatus according to claim 1, wherein the liquid holding head holds the liquid in a stationary state. 3. The laser peening apparatus according to claim 1, wherein the liquid holding head holds the liquid in one of a stationary state and a flowing state. 4. The laser peening apparatus according to claim 1, wherein the liquid holding head holds the liquid in a certain shape while the liquid holding head is stationary, and wherein the moving device is configured so as to move the workpiece while the liquid holding head holds the liquid in the certain shape. 5. The laser peening apparatus according to claim 1, further comprising a condenser lens disposed between the laser irradiation head and the liquid holding head. 6. A laser peening apparatus, comprising: a laser irradiation head; anda liquid holding head,wherein the liquid holding head comprises: a liquid holding chamber to shape and hold a liquid to trap a plasma when the liquid is charged into the liquid holding chamber;an incident window located on an edge of the liquid holding chamber, which is hermetically sealed with a transparent member through which the liquid holding chamber is irradiated with laser from the laser irradiation head;an objective window of the liquid holding chamber to bring a local surface of the workpiece into direct contact with the liquid held by the liquid holding chamber, the objective window being disposed in a path of the laser incident in the liquid holding chamber;an objective end surface which is provided around the objective window to seal a gap between the objective window and a surface around the local surface of the workpiece, so as to prevent the liquid from leaking; andan introducing opening to introduce the liquid into the liquid holding chamber while the objective end surface and the surface of the workpiece are hermetically in contact with each other; anda moving device configured so as to move the workpiece in a direction toward the liquid holding head so as to press the surface around the local surface of the workpiece against the liquid holding head and configured to move the workpiece in a direction orthogonal to the direction toward the liquid holding head,wherein the laser irradiation head irradiates the local surface with a laser beam through the liquid held in the liquid holding chamber,wherein the liquid holding head is configured such that the liquid flowingly contacts the surface of the workpiece around the local surface,wherein the liquid holding head is configured such that, if the workpiece is moved in the direction orthogonal to the direction toward the liquid holding head, the liquid holding head holds the liquid in a constant shape, andwherein the liquid extends from a surface of the incident window to the local surface. 7. The laser peening apparatus according to claim 6, wherein the liquid holding head further comprises a discharge opening to discharge the liquid from the liquid holding chamber while the gap between the objective end surface and the surface of the workpiece is sealed, the discharge opening being different from the introducing opening. 8. The laser peening apparatus according to claim 6, wherein the moving device is configured so as to move the workpiece in the direction orthogonal to the direction toward the liquid holding head while the gap between the objective end surface and the surface of the workpiece is sealed. 9. The laser peening apparatus according to claim 6, further comprising a condenser lens disposed between the laser irradiation head and the incident window. 10. A laser peening method, comprising: fixing a workpiece to a moving base;moving the workpiece in a direction toward a liquid holding chamber so as to press the workpiece against an objective end surface of the liquid holding chamber, so that the objective end surface and the workpiece hermetically contact each other;introducing a liquid into the liquid holding chamber, to bring a surface of the workpiece into direct contact with the liquid;irradiating the liquid introduced into the liquid holding chamber with a laser;applying a shockwave pressure to the workpiece; andmoving the workpiece in a direction orthogonal to the direction toward the liquid holding chamber such that the liquid holding chamber holds the liquid in a constant shape,wherein the liquid holding chamber is configured such that the liquid flowingly contacts the surface of the workpiece, andwherein the liquid extends from a surface of an incident window located on an edge of the liquid holding chamber to the surface of the workpiece. 11. The laser peening method according to claim 10, further comprising emptying the liquid from the liquid holding chamber, after the shockwave pressure has been applied to the workpiece. 12. The laser peening apparatus according to claim 1, wherein the incident window is hermetically sealed with a transparent member through which the liquid holding chamber is irradiated with laser from the laser irradiation head, wherein the liquid holding head further comprises an objective window located on an opposite end of the liquid holding chamber,wherein the objective window brings a surface of the workpiece into direct contact with the liquid held by the liquid holding chamber, andwherein the incident window and the objective window are located on an axial path of the laser incident in the liquid holding chamber. 13. The laser peening apparatus according to claim 1, further comprising: an introducing opening to introduce the liquid into the liquid holding chamber;a discharging opening to discharge the liquid from the liquid holding chamber; anda valve to close the discharging opening. 14. The laser peening apparatus according to claim 1, further comprising: an introducing opening to introduce the liquid into the liquid holding chamber; anda discharging opening to discharge the liquid from the liquid holding chamber,wherein the liquid discharged from the liquid holding chamber through the discharging opening is circulated into the liquid holding chamber through the introducing opening. 15. The laser peening apparatus according to claim 6, the liquid holding head further comprising: a discharging opening to discharge liquid from the liquid holding chamber, and the laser peening apparatus further comprising:a valve to close the discharging opening. 16. The laser peening apparatus according to claim 6, the liquid holding head further comprising: a discharging opening to discharge the liquid from the liquid holding chamber,wherein the liquid discharged from the liquid holding chamber through the discharging opening is circulated into the liquid holding chamber through the introducing opening. 17. The laser peening method according to claim 10, wherein the liquid holding chamber is filled with the liquid when the liquid is introduced. 18. The laser peening apparatus according to claim 1, wherein the liquid holding head further comprises a metal sidewall in which the liquid holding chamber is formed. 19. The laser peening method according to claim 10, wherein the gap between the objective end surface and the surface of the workpiece is sealed during the moving the workpiece in the direction orthogonal to the direction toward the liquid holding chamber. 20. The laser peening apparatus according to claim 1, wherein the liquid comprises a single liquid, in the direction that the workpiece moves toward the liquid holding head, the single liquid extending from the surface of the incident window to the local surface.
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이 특허에 인용된 특허 (11)
Eloy Jean-Fran.cedilla.ois,FRX, Apparatus for treating a material having a miniaturized photoionic head.
Ortiz ; Jr. Angel L. (Scotia NY) Penney Carl M. (Saratoga Springs NY) Jones Marshall G. (Scotia NY) Erikson Carl E. (Schenectady NY), Laser peening system and method.
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