IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0285278
(2011-10-31)
|
등록번호 |
US-9054141
(2015-06-09)
|
우선권정보 |
JP-2006-266543 (2006-09-29) |
발명자
/ 주소 |
- Eguchi, Shingo
- Monma, Yohei
- Tani, Atsuhiro
- Hirosue, Misako
- Hashimoto, Kenichi
- Hosaka, Yasuharu
|
출원인 / 주소 |
- Semiconductor Energy Laboratory Co., Ltd.
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
10 인용 특허 :
70 |
초록
▼
An object is to suppress discharge due to static electricity generated by peeling, when an element formation layer including a semiconductor element is peeled from a substrate. Over the substrate, the release layer and the element formation layer are formed. The support base material which can be pe
An object is to suppress discharge due to static electricity generated by peeling, when an element formation layer including a semiconductor element is peeled from a substrate. Over the substrate, the release layer and the element formation layer are formed. The support base material which can be peeled later is fixed to the upper surface of the element formation layer. The element formation layer is transformed through the support base material, and peeling is generated at an interface between the element formation layer and the release layer. Peeling is performed while the liquid is being supplied so that the element formation layer and the release layer which appear sequentially by peeling are wetted with the liquid such as pure water. Electric charge generated on the surfaces of the element formation layer and the release layer can be diffused by the liquid, and discharge by peeling electrification can be eliminated.
대표청구항
▼
1. A method for manufacturing a display module, comprising: forming a release layer over a substrate;forming an element formation layer including a pixel portion over the release layer wherein the pixel portion includes thin film transistors;generating peeling so that the element formation layer is
1. A method for manufacturing a display module, comprising: forming a release layer over a substrate;forming an element formation layer including a pixel portion over the release layer wherein the pixel portion includes thin film transistors;generating peeling so that the element formation layer is separated from the substrate;supplying liquid to a portion where the peeling is generated;after the supplying step, separating the element formation layer from the substrate wherein the separation proceeds while the liquid spreads to a tip portion of peeling;fixing a first flexible substrate to the element formation layer, after the separating step; andfixing a second flexible substrate to the first flexible substrate with the element formation layer interposed therebetween with a sealant. 2. The method for manufacturing a display module according to claim 1, wherein the liquid is pure water. 3. The method for manufacturing a display module according to claim 1, wherein the first flexible substrate is fixed to the element formation layer by using a thermoplastic resin. 4. The method for manufacturing a display module according to claim 1, wherein the display module is a liquid crystal module. 5. The method for manufacturing a display module according to claim 1, wherein the display module is an EL module. 6. The method for manufacturing a display module according to claim 1, wherein the liquid spreads due to a capillary phenomenon. 7. The method for manufacturing a semiconductor device according to claim 1, wherein the liquid is supplied by spraying in an atomized form. 8. The method for manufacturing a semiconductor device according to claim 1, wherein the liquid is supplied by spraying in a vaporized form. 9. A method for manufacturing a semiconductor device, comprising: forming a metal layer over a substrate;forming a silicon oxide film on the metal layer wherein a surface of the metal layer is oxidized as a result of forming the silicon oxide film;forming an element formation layer including a semiconductor element over the silicon oxide film;generating peeling so that a portion of the element formation layer is separated from the substrate;supplying liquid to a portion where the peeling is generated;after the supplying step, separating the element formation layer from the substrate wherein the separation proceeds while the liquid spreads to a tip portion where separation occurs; andfixing a flexible substrate to the element formation layer, after the separating step. 10. The method for manufacturing a semiconductor device according to claim 9, wherein the liquid spreads due to a capillary phenomenon. 11. The method for manufacturing a semiconductor device according to claim 9, wherein the element formation layer is separated from the substrate at an interface between the metal layer and the silicon oxide film. 12. The method for manufacturing a semiconductor device according to claim 9, wherein the semiconductor device is a display device. 13. The method for manufacturing a semiconductor device according to claim 9, wherein the liquid is supplied in an atomized form. 14. The method for manufacturing a semiconductor device according to claim 9, wherein the liquid is supplied in a vaporized form. 15. The method for manufacturing a semiconductor device according to claim 9, wherein the metal layer comprises a metal selected from the group consisting of tungsten, molybdenum, titanium, tantalum, niobium, nickel, cobalt, zirconium, zinc, ruthenium, rhodium, palladium, osmium, iridium, or an alloy thereof.
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