[미국특허]
Rectangular parallelepiped fluid storage and dispensing vessel
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01D-053/04
F17C-011/00
출원번호
US-0966091
(2013-08-13)
등록번호
US-9062829
(2015-06-23)
발명자
/ 주소
Brestovansky, Dennis
Wodjenski, Michael J.
Arno, Jose I.
Carruthers, J. Donald
Moroco, Philip A.
출원인 / 주소
ENTEGRIS, INC.
대리인 / 주소
Hultquist, PLLC
인용정보
피인용 횟수 :
1인용 특허 :
126
초록▼
A fluid storage and dispensing apparatus including a fluid storage and dispensing vessel having a rectangular parallelepiped shape, and an integrated gas cabinet assembly including such fluid storage and dispensing apparatus and/or a point-of-use ventilation gas scrubber in the vented gas cabinet. B
A fluid storage and dispensing apparatus including a fluid storage and dispensing vessel having a rectangular parallelepiped shape, and an integrated gas cabinet assembly including such fluid storage and dispensing apparatus and/or a point-of-use ventilation gas scrubber in the vented gas cabinet. By the use of physical adsorbent and chemical sorbent media, the gas cabinet can be enhanced in safety of operation, e.g., where the process gas supplied from the gas cabinet is of a toxic or otherwise hazardous character.
대표청구항▼
1. A method of reducing flow of sweep gas through an interior volume of a ventilated gas cabinet arranged to contain a gas supply system including gas supply vessel(s), said method comprising using physical adsorbent-based gas storage and dispensing vessel(s) as said gas supply vessel(s), and reduci
1. A method of reducing flow of sweep gas through an interior volume of a ventilated gas cabinet arranged to contain a gas supply system including gas supply vessel(s), said method comprising using physical adsorbent-based gas storage and dispensing vessel(s) as said gas supply vessel(s), and reducing flow of sweep gas through said interior volume, in relation to flow of sweep gas through said interior volume when the gas cabinet contains gas supply vessel(s) that are not physical adsorbent-based. 2. The method of claim 1, wherein said gas supply vessel(s) contain a sorbate gas at subatmospheric pressure. 3. The method of claim 1, wherein said gas supply vessel(s) contain a sorbate gas selected from the group consisting of arsine, phosphine, hydrogen selenide, hydrogen telluride, nitrogen trifluoride, boron trifluoride, boron trichloride, diborane, trimethylsilane, tetramethylsilane, disilane, silane, germane, and organometallic gaseous reagents. 4. A gas cabinet assembly comprising an enclosure with an interior volume that contains physical adsorbent-based gas supply vessel(s), and arranged to be ventilated by flow of sweep gas through the interior volume from a source of said sweep gas exterior to the enclosure, and discharge thereof from the enclosure, wherein the gas cabinet assembly is arranged so that it flows said sweep gas through the enclosure at a reduced rate of flow in relation to a corresponding gas cabinet assembly containing gas supply vessel(s) lacking said physical adsorbent. 5. The gas cabinet assembly of claim 4, wherein the enclosure is a component part of a semiconductor process tool. 6. The gas cabinet assembly of claim 4, wherein the enclosure comprises a gas box in an ion implantation system. 7. The gas cabinet assembly of claim 4, wherein the enclosure is equipped with flow circuitry. 8. The gas cabinet assembly of claim 7, wherein the flow circuitry includes at least one component selected from the group consisting of piping, manifolding, valving, mass flow controllers, pressure and temperature monitoring devices. 9. The gas cabinet assembly of claim 7, wherein the flow circuitry is adapted to be coupled with an array of gas supply vessels of the physical adsorbent-based gas storage and dispensing system, and the flow circuitry is switched, upon depletion of gas from a currently on-stream vessel, to a back-up vessel in the enclosure. 10. The gas cabinet assembly of claim 4, wherein the enclosure contains monitoring and control componentry. 11. The gas cabinet assembly of claim 4, wherein the at least one gas supply vessel contains a sorbate gas selected from the group consisting of arsine, phosphine, hydrogen selenide, hydrogen telluride, nitrogen trifluoride, boron trifluoride, boron trichloride, diborane, trimethylsilane, tetramethylsilane, disilane, silane, germane, and organometallic gaseous reagents. 12. The gas cabinet assembly of claim 4, wherein the sweep gas discharged from the enclosure is discharged to a house exhaust system of a facility in which the enclosure is deployed. 13. The gas cabinet assembly of claim 4, comprising flow circuitry in which the sweep gas is discharged from the enclosure for treatment and recirculated through the enclosure as a recycled sweep gas.
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