Scratch-resistant articles with retained optical properties
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G02B-001/10
C03C-017/245
C03C-017/34
C23C-014/34
출원번호
US-0267516
(2014-05-01)
등록번호
US-9110230
(2015-08-18)
발명자
/ 주소
Koch, III, Karl William
Paulson, Charles Andrew
출원인 / 주소
Corning Incorporated
대리인 / 주소
Patel, Payal A.
인용정보
피인용 횟수 :
7인용 특허 :
90
초록▼
One or more aspects of the disclosure pertain to an article including an optical film structure disposed on an inorganic oxide substrate, which may include a strengthened or non-strengthened substrate that may be amorphous or crystalline, such that the article exhibits scratch resistance and retains
One or more aspects of the disclosure pertain to an article including an optical film structure disposed on an inorganic oxide substrate, which may include a strengthened or non-strengthened substrate that may be amorphous or crystalline, such that the article exhibits scratch resistance and retains the same or improved optical properties as the inorganic oxide substrate, without the optical film structure disposed thereon. In one or more embodiments, the article exhibits an average transmittance of 85% or more, over the visible spectrum (e.g., 380 nm-780 nm). Embodiments of the optical film structure include aluminum-containing oxides, aluminum-containing oxy-nitrides, aluminum-containing nitrides (e.g., AlN) and combinations thereof. The optical film structures disclosed herein also include a transparent dielectric including oxides such as silicon oxide, germanium oxide, aluminum oxide and a combination thereof. Methods of forming such articles are also provided.
대표청구항▼
1. An article comprising: an inorganic oxide substrate having opposing major surfaces; andan optical film structure disposed on a first major surface of the inorganic oxide substrate,wherein the optical film structure exhibits a scratch resistance, and wherein the article exhibits an average transmi
1. An article comprising: an inorganic oxide substrate having opposing major surfaces; andan optical film structure disposed on a first major surface of the inorganic oxide substrate,wherein the optical film structure exhibits a scratch resistance, and wherein the article exhibits an average transmittance of 85% or more, over the visible spectrum,wherein optical film structure comprises a hardness of about 16 GPa or greater as measured by a diamond Berkovitch indenter test,wherein the article exhibits one or more of:a color transmittance in the (L, a*, b*) colorimetry system having transmittance color coordinates when viewed at normal incidence, such that the distance between the transmittance color coordinates and a reference point is less than about 2, anda color reflectance in the (L, a*, b*) colorimetry system having reflectance color coordinates when viewed at normal incidence, such that the distance between the reflectance color coordinates and a reference point is less than about 2, andwherein the reference point comprises at least one of the color coordinates (a*=0, b*=0) and the color coordinates of the substrate, andwherein, when the reference point is the color coordinates of the substrate, the distance equals √((a*article−a*substrate)2+(b*article−b*substrate)2), andwherein, when the reference point is the color coordinates (a*=0, b*=0), the distance equals √((a*article)2+(b*article)2). 2. The article of claim 1, wherein the article has a total reflectivity that is the same or less than a total reflectivity of the inorganic oxide substrate without the optical film structure disposed thereon. 3. The article of claim 1, wherein the optical film structure comprises one of a silicon-containing oxide, a silicon-containing oxy-nitride, silicon nitride, aluminum nitride, an aluminum-containing oxy-nitride, an aluminum-containing oxide, silicon aluminum oxy-nitride or a combination thereof. 4. The article of claim 1, wherein the optical film structure comprises at least two layers, wherein a first layer is disposed between the inorganic oxide substrate and a second layer. 5. The article of claim 4, wherein the first layer comprises at least one of silicon-containing oxide, a silicon-containing oxy-nitride, silicon nitride, aluminum nitride, an aluminum-containing oxy-nitride, an aluminum-containing oxide, and silicon aluminum oxy-nitride, and wherein the second layer comprises at least one of SiO2, GeO2, and Al2O3. 6. The article of claim 4, wherein the first layer comprises Al2O3, AlN, AlOxNy or combinations thereof. 7. The article of claim 4, wherein the first layer comprises a first sub-layer comprising Al2O3 and a second sub-layer comprising AlN and, wherein the first sub-layer is disposed between the inorganic oxide substrate and the second sub-layer. 8. The article of claim 4, wherein the first layer comprises a first sub-layer comprising AlOxNy and a second sub-layer comprising AlN and, wherein the first sub-layer is disposed between the inorganic oxide substrate and the second sub-layer. 9. The article of claim 4, wherein the first layer further comprises SiO2. 10. The article of claim 1, wherein the optical film structure comprises a first layer and a second layer, wherein the first layer has a thickness greater than the thickness of the second layer. 11. The article of claim 10, wherein the optical film structure has a thickness of 2 μm or greater. 12. The article of claim 1, wherein the optical film structure comprises AlN, and wherein the AlN is doped with a modifier comprising one or more of BN, Ag, Cr, Mg and Ca. 13. The article of claim 1, wherein the inorganic oxide substrate comprises a crystalline substrate or an amorphous substrate. 14. The article of claim 1, further comprising an interlayer disposed between the optical film structure and the inorganic oxide substrate. 15. An article comprising: an inorganic oxide substrate having opposing major surfaces;an optical film structure disposed on a first major surface of the inorganic oxide substrate, the optical film structure comprising a first layer comprising an aluminum-containing nitride, an aluminum-containing oxy-nitride, an aluminum-containing oxide or a combination thereof, and a second layer disposed on the first layer,wherein the optical film structure exhibits a hardness of 16 GPa or greater, as measured by a diamond Berkovitch indenter test,wherein the article exhibits an average transmittance of 85% or more over the visible spectrum, and one or more of a color transmittance in the (L, a*, b*) colorimetry system having transmittance color coordinates when viewed at normal incidence, such that the distance between the transmittance color coordinates and a reference point is less than about 2, anda color reflectance in the (L, a*, b*) colorimetry system having reflectance color coordinates when viewed at normal incidence, such that the distance between the reflectance color coordinates and a reference point is less than about 2,wherein the reference point comprising at least one of the color coordinates (a*=0, b*=0) and the color coordinates of the substrate, andwherein, when the reference point is the color coordinates of the substrate, the distance equals √((a*article−a*substrate)2+(b*article−b*substrate)2), andwherein, when the reference point is the color coordinates (a*=0, b*=0), the distance equals √((a*article)2+(b*article)2). 16. The article of claim 15, wherein the first layer comprises a first sub-layer, a second sub-layer and a third sub-layer, wherein the second sub-layer is disposed between the first sub-layer and the third sub-layer, and wherein the first and third sub-layers comprise AlN and the second sub-layer comprises SiO2. 17. The article of claim 15, wherein the second layer comprises SiO2, GeO2, Al2O3, and a combination thereof. 18. The article of claim 15, wherein the optical film structure further comprises a modifier selected from BN, Ag, Cr and combinations thereof. 19. The article of claim 18, wherein the optical film structure exhibits a coefficient of friction of less than 0.3, when measured against a silicon carbide sphere counter surface.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (90)
Kimock Fred M. (Macungie PA) Knapp Bradley J. (Allentown PA) Finke Steven J. (Kutztown PA) Galdieri John V. (New Tripoli PA), Abrasion wear resistant coated substrate product.
Kimock Fred M. (Macungie PA) Knapp Bradley J. (Allentown PA) Finke Steven J. (Kutztown PA) Galdieri John V. (New Tripoli PA), Abrasion wear resistant coated substrate product.
Shelestak, Larry J.; Goodwin, George B.; Mishra, Amarendra; Baldauff, James M., Aircraft transparency having chemically tempered lithia-alumina-silica containing glass and method of making the chemically tempered glass.
Ando Eiichi,JPX ; Mitsui Akira,JPX ; Ebisawa Junichi,JPX ; Suzuki Koichi,JPX ; Matsumoto Kiyoshi,JPX ; Oyama Takuji,JPX, Film comprising silicon dioxide as the main component and method for its productiion.
Schultz, Niko; Henn, Christian; Gabel, Falk; Hahn, Andreas, Glass or glass-ceramic substrate with scratch-resistant coating and method for the production thereof.
Coustet,Val?rie; Nadaud,Nicolas; Barrieres,Fr?d?ric; Brochot,Jean Pierre, Glazing provided with a stack of thin layers for solar protection and/or heat insulation.
Tustison Randal W. (Lexington MA) Montanari Dennis (West Townsend MA) Varitimos Thomas (Norwood MA) diBenedetto Bernard (Wayland MA), Impact resistant and tempered optical elements.
Krzyzak,Marta; Helsch,Gundula; Heide,Gerhard; Frischat,Guenther Heinz, Method of making a glass body with a phosphorous-and porous SiO-containing coating, glass body made thereby and solution for making same.
Sol, Jean-Marc, Method of making heat treated coated article using diamond-like carbon (DLC) coating and protective film including removal of protective film via blasting.
Fletcher James C. Administrator of the National Aeronautics and Space Administration ; with respect to an invention of ( Sunnyvale CA) Wydeven ; Jr. Theodore J. (Sunnyvale CA) Hollahan John R. (San F, Oxygen post-treatment of plastic surfaces coated with plasma polymerized silicon-containing monomers.
Thies, Jens Christoph; Currie, Edwin; Meijers, Guido Jozefina Wilhelmus, Preparation of a mechanically durable single layer coating with anti-reflective properties.
Kimock Fred M. (Macungie PA) Knapp Bradley J. (Allentown PA) Finke Steven J. (Kutztown PA), Process of making abrasion wear resistant coated substrate product.
Katayama, Yoshihito; Kimura, Yukio; Maekawa, Mikako; Shidoji, Eiji; Noda, Kazuyoshi, Substrate provided with antireflection films and its production method.
Hattori, Naohito; Yoshioka, Kensuke, Transparent conductive laminate film, touch panel having this transparent conductive laminate film, and production method for this transparent conductive laminate film.
Joret Laurent,FRX, Transparent substrate provided with at least one thin layer based on silicone nitride or oxynitride and the process for obtaining it.
Bellman, Robert Alan; Hart, Shandon Dee; Koch, III, Karl William; Paulson, Charles Andrew; Price, James Joseph, Low-color scratch-resistant articles with a multilayer optical film.
Bellman, Robert Alan; Hart, Shandon Dee; Koch, III, Karl William; Paulson, Charles Andrew; Price, James Joseph, Low-color scratch-resistant articles with a multilayer optical film.
Adib, Kaveh; Hart, Shandon Dee; Koch, III, Karl William; Paulson, Charles Andrew; Price, James Joseph; Sachenik, Paul Arthur, Scratch-resistant articles with a gradient layer.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.