[미국특허]
Treatment fluids containing a boron trifluoride complex and methods for use thereof
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
E21B-043/27
C09K-008/60
C09K-008/524
C09K-008/68
C09K-008/78
C09K-008/84
C09K-008/86
E21B-043/25
출원번호
US-0354461
(2012-01-20)
등록번호
US-9127194
(2015-09-08)
발명자
/ 주소
Reyes, Enrique A.
출원인 / 주소
Halliburton Energy Services, Inc.
대리인 / 주소
McDermott Will & Emery LLP
인용정보
피인용 횟수 :
1인용 특허 :
71
초록▼
Treatment fluids for use in subterranean formations, particularly sandstone and other siliceous formations, may contain a source of fluoride ions to aid in mineral dissolution. In some cases, it may be desirable to generate the fluoride ions from a fluoride ion precursor, particularly a hydrofluoric
Treatment fluids for use in subterranean formations, particularly sandstone and other siliceous formations, may contain a source of fluoride ions to aid in mineral dissolution. In some cases, it may be desirable to generate the fluoride ions from a fluoride ion precursor, particularly a hydrofluoric acid precursor, such as a boron trifluoride complex. Methods for treating a subterranean formation can comprise providing a treatment fluid that comprises an aqueous base fluid, a boron trifluoride complex, and a chelating agent composition, and introducing the treatment fluid into a subterranean formation.
대표청구항▼
1. A method comprising: combining an aqueous base fluid,a boron trifluoride complex comprising at least one complex selected from the group consisting of boron trifluoride acetonitrile complex, boron trifluoride acetic acid complex, boron trifluoride dimethyl ether complex, boron trifluoride diethyl
1. A method comprising: combining an aqueous base fluid,a boron trifluoride complex comprising at least one complex selected from the group consisting of boron trifluoride acetonitrile complex, boron trifluoride acetic acid complex, boron trifluoride dimethyl ether complex, boron trifluoride diethyl ether complex, boron trifluoride dipropyl ether complex, boron trifluoride dibutyl ether complex, boron trifluoride t-butyl methyl ether complex, boron trifluoride phosphoric acid complex, boron trifluoride dihydrate, boron trifluoride methanol complex, boron trifluoride ethanol complex, boron trifluoride propanol complex, boron trifluoride isopropanol complex, boron trifluoride phenol complex, boron trifluoride propionic acid complex, boron trifluoride tetrahydrofuran complex, boron trifluoride piperidine complex, boron trifluoride ethylamine complex, boron trifluoride methylamine complex, boron trifluoride triethanolamine complex, any derivative thereof, and any combination thereof, anda chelating agent composition to form a treatment fluid;introducing the treatment fluid into a subterranean formation during a stimulation operation; andhydrolyzing at least a portion of the boron trifluoride complex to form hydrofluoric acid in the subterranean formation. 2. The method of claim 1, wherein the chelating agent composition comprises at least one biodegradable chelating agent selected from the group consisting of glutamic acid diacetic acid, methylglycine diacetic acid, β-alanine diacetic acid, ethylenediaminedisuccinic acid, S,S-ethylenediaminedisuccinic acid, iminodisuccinic acid, hydroxyiminodisuccinic acid, polyamino disuccinic acids, N-bis[2-(1,2-dicarboxyethoxyl)ethyl]glycine, N-bis[2-(1,2-dicarboxyethoxyl)ethyl]aspartic acid, N-bis[2-(1,2-dicarboxyethoxyl)ethyl]methylglycine, N-tris[(1,2-dicarboxyethoxy)ethyl]amine, N-methyliminodiacetic acid, iminodiacetic acid, N-(2-acetamido)iminodiacetic acid, hydroxymethyl-iminodiacetic acid, 2-(2-carboxyethylamino) succinic acid, 2-(2-carboxymethylamino) succinic acid, diethylenetriamine-N,N″-disuccinic acid, triethylenetetramine-N,N′″-disuccinic acid, 1,6-hexamethylenediamine-N,N′-disuccinic acid, tetraethylenepentamine-N,N″″-disuccinic acid, 2-hydroxypropylene-1,3-diamine-N,N′-disuccinic acid, 1,2-propylenediamine-N,N′-disuccinic acid, 1,3-propylenediamine-N,N′-disuccinic acid, cis-cyclohexanediamine-N,N′-disuccinic acid, trans-cyclohexanediamine-N,N′-disuccinic acid, ethylenebis(oxyethylenenitrilo)-N,N′-disuccinic acid, glucoheptanoic acid, cysteic acid-N,N-diacetic acid, cysteic acid-N-monoacetic acid, alanine-N-monoacetic acid, N-(3-hydroxysuccinyl) aspartic acid, N-[2-(3-hydroxysuccinyl)]-L-serine, aspartic acid-N,N-diacetic acid, aspartic acid-N-monoacetic acid, any salt thereof, any derivative thereof, and any combination thereof. 3. The method of claim 1, wherein the chelating agent composition is substantially free of alkali metals and comprises an ammonium, tetraalkylammonium, or tetraalkylphosphonium salt of the chelating agent. 4. The method of claim 1, wherein the treatment fluid has a pH of about 2 or greater. 5. The method of claim 1, wherein the treatment fluid has a pH ranging between about 2 and about 6. 6. The method of claim 1, wherein the subterranean formation has a temperature of at least about 200° F. 7. The method of claim 1, wherein the boron trifluoride complex has a concentration ranging between about 0.5% and about 5% by weight in the treatment fluid. 8. The method of claim 1, wherein the treatment fluid further comprises a hydrofluoric acid-generating compound selected from the group consisting of fluoroboric acid, fluorosulfuric acid, hexafluorophosphoric acid, hexafluoroantimonic acid, difluorophosphoric acid, hexafluorosilicic acid, potassium hydrogen difluoride, sodium hydrogen difluoride, polyvinylammonium fluoride, polyvinylpyridinium fluoride, pyridinium fluoride, imidazolium fluoride, ammonium fluoride, ammonium bifluoride, tetrafluoroborate salts, hexafluoroantimonate salts, hexafluorophosphate salts, bifluoride salts, and any combination thereof. 9. A method comprising: combining an aqueous base fluid,a boron trifluoride complex comprising at least one complex selected from the group consisting of boron trifluoride acetonitrile complex, boron trifluoride acetic acid complex, boron trifluoride dimethyl ether complex, boron trifluoride diethyl ether complex, boron trifluoride dipropyl ether complex, boron trifluoride dibutyl ether complex, boron trifluoride t-butyl methyl ether complex, boron trifluoride phosphoric acid complex, boron trifluoride dihydrate, boron trifluoride methanol complex, boron trifluoride ethanol complex, boron trifluoride propanol complex, boron trifluoride isopropanol complex, boron trifluoride phenol complex, boron trifluoride propionic acid complex, boron trifluoride tetrahydrofuran complex, boron trifluoride piperidine complex, boron trifluoride ethylamine complex, boron trifluoride methylamine complex, boron trifluoride triethanolamine complex, any derivative thereof, and any combination thereof, anda chelating agent composition to form a treatment fluid;introducing the treatment fluid into a subterranean formation having a temperature of at least 200° F.;allowing sufficient time to pass for at least a portion of the boron trifluoride complex to form hydrofluoric acid in the subterranean formation; anddissolving at least a portion of any insoluble silicon-containing compounds present in the subterranean formation with the hydrofluoric acid. 10. The method of claim 9, wherein the chelating agent composition comprises at least one biodegradable chelating agent selected from the group consisting of glutamic acid diacetic acid, methylglycine diacetic acid, β-alanine diacetic acid, ethylenediaminedisuccinic acid, S,S-ethylenediaminedisuccinic acid, iminodisuccinic acid, hydroxyiminodisuccinic acid, polyamino disuccinic acids, N-bis[2-(1,2-dicarboxyethoxyl)ethyl]glycine, N-bis[2-(1,2-dicarboxyethoxyl)ethyl]aspartic acid, N-bis[2-(1,2-dicarboxyethoxyl)ethyl]methylglycine, N-tris[(1,2-dicarboxyethoxy)ethyl]amine, N-methyliminodiacetic acid, iminodiacetic acid, N-(2-acetamido)iminodiacetic acid, hydroxymethyl-iminodiacetic acid, 2-(2-carboxyethylamino) succinic acid, 2-(2-carboxymethylamino) succinic acid, diethylenetriamine-N,N″-disuccinic acid, triethylenetetramine-N,N′″-disuccinic acid, 1,6-hexamethylenediamine-N,N′-disuccinic acid, tetraethylenepentamine-N,N″″-disuccinic acid, 2-hydroxypropylene-1,3-diamine-N,N′-disuccinic acid, 1,2-propylenediamine-N,N′-disuccinic acid, 1,3-propylenediamine-N,N′-disuccinic acid, cis-cyclohexanediamine-N,N′-disuccinic acid, trans-cyclohexanediamine-N,N′-disuccinic acid, ethylenebis(oxyethylenenitrilo)-N,N′-disuccinic acid, glucoheptanoic acid, cysteic acid-N,N-diacetic acid, cysteic acid-N-monoacetic acid, alanine-N-monoacetic acid, N-(3-hydroxysuccinyl) aspartic acid, N-[2-(3-hydroxysuccinyl)]-L-serine, aspartic acid-N,N-diacetic acid, aspartic acid-N-monoacetic acid, any salt thereof, any derivative thereof, and any combination thereof. 11. The method of claim 9, wherein the chelating agent composition is substantially free of alkali metals and comprises an ammonium, tetraalkylammonium, or tetraalkylphosphonium salt of the chelating agent. 12. The method of claim 9, wherein the treatment fluid has a pH of about 2 or greater. 13. A method comprising: combining an aqueous base fluid,a boron trifluoride complex comprising at least one complex selected from the group consisting of boron trifluoride acetonitrile complex, boron trifluoride acetic acid complex, boron trifluoride dimethyl ether complex, boron trifluoride diethyl ether complex, boron trifluoride dipropyl ether complex, boron trifluoride dibutyl ether complex, boron trifluoride t-butyl methyl ether complex, boron trifluoride phosphoric acid complex, boron trifluoride dihydrate, boron trifluoride methanol complex, boron trifluoride ethanol complex, boron trifluoride propanol complex, boron trifluoride isopropanol complex, boron trifluoride phenol complex, boron trifluoride propionic acid complex, boron trifluoride tetrahydrofuran complex, boron trifluoride piperidine complex, boron trifluoride ethylamine complex, boron trifluoride methylamine complex, boron trifluoride triethanolamine complex, any derivative thereof, and any combination thereof, anda chelating agent composition to form a treatment fluid;introducing the treatment fluid into a subterranean formation having a temperature of at least 200° F.;hydrolyzing at least a portion of the boron trifluoride complex to form hydrofluoric acid in the subterranean formation; anddissolving at least a portion of any insoluble silicon-containing compounds present in the subterranean formation with the hydrofluoric acid.
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