One component self-adhesive dental composition, process of production and use thereof
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
A61K-006/083
C09J-133/10
C09J-133/14
C09J-175/16
A61C-013/15
출원번호
US-0360373
(2012-11-30)
등록번호
US-9132069
(2015-09-15)
우선권정보
EP-11191541 (2011-12-01)
국제출원번호
PCT/US2012/067159
(2012-11-30)
국제공개번호
WO2013/082337
(2013-06-06)
발명자
/ 주소
Hecht, Reinhold
Stippschild, Andrea
Hasanaj, Vitore
Raia, Gioacchino
Ludsteck, Manfred
Guggenberger, Rainer
출원인 / 주소
3M Innovative Properties Company
인용정보
피인용 횟수 :
0인용 특허 :
23
초록▼
The invention relates to a one-component self-adhesive composition for dental use comprising radically polymerizable component(s) with an acidic moiety as component A, radically polymerizable component(s) without an acidic moiety as component (B), an oxidizing agent comprising persulfate(s) as compo
The invention relates to a one-component self-adhesive composition for dental use comprising radically polymerizable component(s) with an acidic moiety as component A, radically polymerizable component(s) without an acidic moiety as component (B), an oxidizing agent comprising persulfate(s) as component (C), transition metal component(s) as component (D), photoinitiator system(s) as component (E), optionally non acid-reactive filler(s) as component (F), and optionally additive(s) as component (G).
대표청구항▼
1. A one-component self-adhesive composition for dental use comprising a) radically polymerizable component(s) with an acidic moiety as component A,b) radically polymerizable component(s) without an acidic moiety as component (B),c) an oxidizing agent comprising persulfate(s) as component (C),d) tra
1. A one-component self-adhesive composition for dental use comprising a) radically polymerizable component(s) with an acidic moiety as component A,b) radically polymerizable component(s) without an acidic moiety as component (B),c) an oxidizing agent comprising persulfate(s) as component (C),d) transition metal component(s) as component (D),e) photoinitiator system as component (E),f) optionally non acid-reactive filler(s) as component (F), andg) optionally additive(s) as component (G),the composition not comprising basic filler(s). 2. The composition according to claim 1, not comprising component(s) comprising a barbituric acid moiety, a thiobarbituric acid moiety, a sulfinate moiety, an aryl borate moiety or mixtures thereof. 3. The composition according to claim 1, wherein the oxidizing agent fulfils at least one of the following features: not containing carbon-carbon based moieties,being water-soluble. 4. The composition according to claim 1, wherein the transition metal component(s) is selected from organic and/or inorganic salts from titanium, vanadium, chromium, manganese, cobalt, nickel, copper, zinc, either in hydrated or in dry form and mixtures thereof. 5. The composition according to claim 1, wherein the transition metal component is a copper component being selected from copper acetate, copper chloride, copper benzoate, copper acetylacetonate, copper naphthenate, copper carboxylates, copper procetonate, copper complexes, either in hydrated or in dry form and mixtures thereof. 6. The composition according to claim 1, wherein the photoinitiator system is selected from a) di-component system(s) comprising an amine and an alpha-diketon component,b) three-component system(s) comprising an iodonium salt, a sensitizer and a donor component,c) system(s) comprising an acyl or bisacylphosphine oxide. 7. The composition according to claim 1, wherein the radically polymerizable component with an acidic moiety is selected from components with the formula An-B—Cm (I)with A being an ethylenically unsaturated group,B being a spacer group, selected from (i) linear or branched C1 to C12 alkyl, optionally substituted with other functional groups (ii) C6 to C12 aryl, optionally substituted with other functional groups and (iii) organic group having 4 to 20 carbon atoms bonded to one another by one or more ether, thioether, ester, thioester, thiocarbonyl, amide, urethane, carbonyl and/or sulfonyl linkages, wherein the other functional groups are selected from halogenides and/or OH andC being an acidic group, with m, n=1, 2, 3, 4, 5 or 6,wherein the acidic group comprises one or more carboxylic acid residues, phosphoric acid residues, phosphonic acid residues, sulfinic acid residues, sulphonic acid residues, and mixtures thereof. 8. The composition according to claim 1, wherein the radically polymerizable component without an acidic moiety is selected from mono-, di- or poly-acrylates and methacrylates, bis-acrylates and bis-methacrylates of polyethylene glycols of molecular weight 200-500 g/mol, co-polymerizable mixtures of acrylated monomers, acrylated oligomers, vinyl moieties bearing compounds and mixtures thereof, wherein the radically polymerizable component may be substituted with a hydroxyl group, 1,3-diketo group or both. 9. The composition according to claim 1, wherein component (B) comprises a component (B1) with a hydroxyl group and/or 1,3-diketo group and a component (B2) not having either of these functionalities. 10. The composition according to claim 1 being characterized by at least one of the following features after hardening: Flexural strength determined according to ISO 4049:2000: at least 50 MPa,E-Modulus determined according to ISO 4049:2000: at least 3500 MPa,Adhesion to dentin determined according to wire loop test method: at least 5 MPa,Adhesion to enamel determined according to wire loop test method: at least 7 MPa. 11. The composition according to claim 1 comprising the components in the following amounts: d) radically polymerizable component(s) with an acidic moiety: from about 3 to about 80 wt.-%,e) radically polymerizable component(s) without an acidic moiety: from about 5 to about 65 wt.-%,f) oxidizing agent: from about 0.1 to about 10 wt.-%,g) transition metal component: from about 0.0001 to about 3 wt.-%,h) photoinitiator system: from about 0.1 to about 5 wt.-%,i) filler(s): from 0 to about 90 wt.-%,j) additives: from 0 to about 15 wt.-%,wt.-% with respect to the weight of the whole composition. 12. The composition according to claim 1 for use as anterior or posterior filling, adhesive, cavity liner, flowable, cement, coating composition, root canal filler, root canal sealant, core build-up material or a combination thereof. 13. The composition according to claim 1 being contained in a container. 14. The composition according to claim 1 being a self-adhesive, photo-curable system. 15. Method comprising the steps of a) applying the composition as described in claim 1 to a surface, b) curing the composition by applying radiation, the method not comprising an additional mixing step and/or etching step. 16. The composition according to claim 7, wherein A comprises a (meth)acryl moiety. 17. The composition according to claim 7, wherein the acidic group comprises one or more of —COOH, —CO—O—CO—, —O—P(O)(OH)OH, —C—P(O)(OH)OH, —SO2H, —SO3H, and mixtures thereof.
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이 특허에 인용된 특허 (23)
Schmitt Werner (Starnberg DEX) Jochum Peter (Seefeld DEX) Zahler Wolf-Dietrich (Seefeld-Hechendorf DEX) Hbner Heijo (Wrthsee/Steinebach DEX) Holupirek Manfred (Grafrath DEX) Gasser Oswald (Seefeld DE, (Meth)acrylic acid esters and the use thereof for preparing dental compositions.
Palazzotto Michael C. (St. Paul MN) Ubel ; III F. Andrew (St. Paul MN) Oxman Joel D. (Minneapolis MN) Ali M. Zaki (Woodbury MN), Ternary photoinitiator system for addition polymerization.
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