Cleaning processing device for biological implant
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B08B-007/00
A61L-002/10
A61C-008/00
A61C-019/00
출원번호
US-0823397
(2011-09-05)
등록번호
US-9168570
(2015-10-27)
우선권정보
JP-2010-221828 (2010-09-30)
국제출원번호
PCT/JP2011/070163
(2011-09-05)
§371/§102 date
20130314
(20130314)
국제공개번호
WO2012/043157
(2012-04-05)
발명자
/ 주소
Ogawa, Yoshimasa
출원인 / 주소
USHIO DENKI KABUSHIKI KAISHA
대리인 / 주소
Fitzpatrick, Cella, Harper & Scinto
인용정보
피인용 횟수 :
0인용 특허 :
4
초록▼
Provided is a cleaning processing device that is for a biological implant and that is capable of quickly eliminating ozone generated by ultraviolet-ray radiation after completion of ultraviolet-ray radiation towards the biological implant. The cleaning processing device for a biological implant perf
Provided is a cleaning processing device that is for a biological implant and that is capable of quickly eliminating ozone generated by ultraviolet-ray radiation after completion of ultraviolet-ray radiation towards the biological implant. The cleaning processing device for a biological implant performs cleaning processing of the biological implant by means of radiating ultraviolet rays at the surface of the biological implant and by causing ozone to contact the surface of the biological implant, and the cleaning processing device is characterized by being provided with a housing, an ultraviolet-ray radiating lamp that is disposed within the housing and that radiates ultraviolet rays at the biological implant, an ozone-removing filter disposed within the housing, and a fan that introduces the ambient gas within the housing to the ozone-removing filter, and is further characterized by the fan being driven in response to the end of cleaning processing of the biological implant.
대표청구항▼
1. A cleaning processing device for a biological implant intended to clean the biological implant by radiating ultraviolet rays to a surface of the biological implant and also causing ozone to come into contact with the surface thereof, the device comprising: a housing, the housing including: a proc
1. A cleaning processing device for a biological implant intended to clean the biological implant by radiating ultraviolet rays to a surface of the biological implant and also causing ozone to come into contact with the surface thereof, the device comprising: a housing, the housing including: a processing chamber for cleaning the biological implant,an ozone-removing chamber disposed above the processing chamber, the ozone-removing chamber for removing the ozone from the processing chamber, anda partition wall for partitioning the processing chamber from the ozone-removing chamber, the partition wall being made of metal;a plurality of ultraviolet-ray radiating lamps facing each other, with the biological implant positioned therebetween, disposed in the processing chamber of the housing to radiate the ultraviolet rays to the biological implant;an ozone-removing filter portion disposed in the ozone-removing chamber; anda fan for introducing atmospheric gas present in the processing chamber into the ozone-removing filter portion, the fan being driven in response to a completion of a cleaning process for the biological implant,wherein heat caused by light from the ultraviolet-ray radiating lamps is transferred through the partition wall to the ozone-removing filter portion. 2. The cleaning processing device as set forth in claim 1, wherein the ozone-removing filter portion is disposed on a flow path that is formed by the fan in the ozone-removing chamber, andthe atmospheric gas present in the processing chamber is circulated through the ozone-emoving chamber, by driving the fan. 3. The cleaning processing device as set forth in claim 1, wherein the housing is made of metal, and the heat caused by the light from the ultraviolet-ray radiating lamps is transferred through the housing made of metal to the ozone-removing filter portion. 4. The cleaning processing device as set forth in claim 2, wherein the housing is made of metal, and the heat caused by the light from the ultraviolet-ray radiating lamps is transferred through the housing made of metal to the ozone-removing filter portion. 5. The cleaning processing device as set forth in any one of claims 1, 2, 3, and 4, wherein the ozone-removing filter portion includes a plurality of ozone-removing filters, which are provided on the flow path formed by the fan in such a way as to be located on both an upstream side and a downstream side of the fan, with a closed space defined between the ozone-removing filters. 6. The cleaning processing device as set forth in any one of claims 1, 2, 3, and 4, wherein a reflecting mirror made of metal is disposed in the processing chamber to reflect the light from the ultraviolet-ray radiating lamps, and the heat caused by the light from the ultraviolet-ray radiating lamps is transferred through the reflecting mirror to the ozone-removing filter portion. 7. The cleaning processing device as set forth in claim 6, wherein the ozone-removing filter portion includes a plurality of ozone-removing filters, which are provided on the flow path formed by the fan in such a way as to be located on both an upstream side and a downstream side of the fan, with a closed space defined between the ozone-removing filters.
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