A field emission device is configured as a heat engine, wherein the configuration of the heat engine is variable.
대표청구항▼
1. An apparatus comprising: a cathode;an anode, wherein the anode and cathode are receptive to a first power source to produce an anode electric potential higher than a cathode electric potential;a gate positioned between the anode and the cathode, the gate being receptive to a second power source t
1. An apparatus comprising: a cathode;an anode, wherein the anode and cathode are receptive to a first power source to produce an anode electric potential higher than a cathode electric potential;a gate positioned between the anode and the cathode, the gate being receptive to a second power source to produce a gate electric potential selected to induce electron emission from the cathode;a suppressor positioned between the gate and the anode, the suppressor being receptive to a third power source to produce a suppressor electric potential selected to provide a force on an electron in a direction pointing towards the suppressor in a region between the suppressor and the anode;a measurement device configured to measure a separation corresponding to a pattern and configured to produce a first signal; andwherein the cathode, anode, gate, and suppressor are arranged in the pattern, and wherein the pattern is variable responsive to the first signal. 2. The apparatus of claim 1 wherein the separation includes at least one of a cathode-gate separation, a suppressor-anode separation, a cathode-anode separation, and a gate-suppressor separation. 3. The apparatus of claim 1 wherein the gate has a position relative to the cathode, suppressor, and anode, and wherein the position of the gate is variable responsive to the first signal. 4. The apparatus of claim 1 wherein the suppressor has a position relative to the cathode, gate, and anode, and wherein the position of the suppressor is variable responsive to the first signal. 5. The apparatus of claim 1 wherein the cathode has a position relative to the gate, suppressor, and anode, and wherein the position of the cathode is variable responsive to the first signal. 6. The apparatus of claim 1 wherein the anode has a position relative to the cathode, gate, and suppressor, and wherein the position of the anode is variable responsive to the first signal. 7. The apparatus of claim 1 further comprising: a grid that forms the pattern with the cathode, anode, gate, and suppressor. 8. The apparatus of claim 7 wherein the grid has a position relative to the cathode, gate, suppressor, and anode, and wherein the position of the grid is variable responsive to the first signal. 9. The apparatus of claim 1 wherein at least one of the cathode, gate, suppressor, and anode is operably connected to a MEMS, and wherein the MEMS is responsive to the first signal to vary the pattern. 10. The apparatus of claim 1 further comprising: a second measurement device operably connected to at least one of the cathode, gate, suppressor, and anode, and configured to output a second signal, and wherein the pattern is variable responsive to the second signal. 11. The apparatus of claim 10 wherein the second measurement device is operably connected to the anode, and wherein the second signal includes an output current at the anode. 12. The apparatus of claim 10 wherein the second measurement device is operably connected to the gate, and wherein the second signal includes a gate current. 13. The apparatus of claim 10 wherein the second measurement device is operably connected to the suppressor, and wherein the second signal includes a suppressor current. 14. The apparatus of claim 10 wherein the second measurement device is operably connected to the anode and wherein the second signal includes a temperature of the anode. 15. The apparatus of claim 10 wherein the second measurement device is operably connected to the cathode and wherein the second signal includes a temperature of the cathode. 16. The apparatus of claim 1 wherein the gate electric potential is variable responsive to the first signal, and wherein the pattern is variable responsive to the gate electric potential. 17. The apparatus of claim 1 wherein the suppressor electric potential is variable responsive to the first signal, and wherein the pattern is variable responsive to the suppressor electric potential. 18. The apparatus of claim 1 wherein the anode electric potential is variable responsive to the first signal, and wherein the pattern is variable responsive to the anode electric potential. 19. An apparatus comprising: a cathode;an anode, wherein the anode and cathode are receptive to a first power source to produce an anode electric potential higher than a cathode electric potential;a gate positioned between the anode and the cathode, the gate being receptive to a second power source to produce a gate electric potential selected to induce electron emission from the cathode;a suppressor positioned between the gate and the anode, the suppressor being receptive to a third power source to produce a suppressor electric potential selected to provide a force on an electron in a direction pointing towards the suppressor in a region between the suppressor and the anode; andwherein the cathode, gate, suppressor, and anode are arranged in a pattern, and wherein the pattern is configured to vary as a function of a temperature of at least one region proximate to at least one of the cathode, gate, suppressor, and anode. 20. The apparatus of claim 19 wherein at least one of the cathode, gate, suppressor, and anode includes a negative thermal expansion material that is configured to change shape as a function of the temperature. 21. The apparatus of claim 19 wherein at least one of the cathode, gate, suppressor, and anode includes a positive thermal expansion material that is configured to change shape as a function of the temperature. 22. The apparatus of claim 19 further comprising: at least one spacer that is at least partially supportive of at least one of the gate and suppressor, wherein the at least one spacer has a positive thermal expansion coefficient. 23. The apparatus of claim 22 further comprising: at least one field enhancement feature having a thermal expansion coefficient that is less than the thermal expansion coefficient of the at least one spacer. 24. The apparatus of claim 19 wherein the gate has a position relative to the cathode, suppressor, and anode, and wherein the position of the gate is variable responsive to the first signal. 25. The apparatus of claim 19 wherein the suppressor has a position relative to the cathode, gate, and anode, and wherein the position of the suppressor is variable responsive to the first signal. 26. The apparatus of claim 19 wherein the cathode has a position relative to the gate, suppressor, and anode, and wherein the position of the cathode is variable responsive to the first signal. 27. The apparatus of claim 19 wherein the anode has a position relative to the cathode, gate, and suppressor, and wherein the position of the anode is variable responsive to the first signal.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (48)
Howard Glen E. (Livermore CA) Gesley Mark A. (Oakland CA), Arc suppressor for electron gun.
Blanchet-Fincher Graciela B. (Wilmington DE) Coates Don M. (Santa Fe NM) Devlin David J. (Los Alamos NM) Eaton David F. (Wilmington DE) Silzars Aris K. (Landenburg PA) Valone Steven M. (Santa Fe NM), Diamond fiber field emitters.
Tatsumi, Natsuo; Namba, Akihiko; Nishibayashi, Yoshiki; Imai, Takahiro, Electron emitting device with projection comprising base portion and electron emission portion.
Rumbaugh Robert C. ; Smith Robert T. ; Trujillo Johann ; Xie Chenggang ; Johnson Scott V. ; Moyer Curtis D. ; Rice David M., Field emission display and method for the operation thereof.
Seon,Hyeong Rae; Chang,Cheol Hyeon; Chang,Dong Su; Kim,Dong Wook; Ha,Jae Sang, Field emission display including mesh grid and focusing electrode and its method of manufacture.
Choi, Kyung Moon; Jin, Sungho; Kochanski, Gregory Peter; Zhu, Wei, Field emitting device comprising field-concentrating nanoconductor assembly and method for making the same.
MacLennan Donald A. ; Dymond ; Jr. Lauren E. ; Gitsevich Aleksandr ; Grimm William G. ; Kipling Kent ; Kirkpatrick Douglas A. ; Ola Samuel A. ; Simpson James E. ; Trimble William C. ; Tsai Peter ; Tu, High frequency inductive lamp and power oscillator.
Yamazaki Yuichiro (Edogawa JPX) Miyoshi Motosuke (Minato JPX) Nagai Takamitsu (Shinjuku JPX), Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.