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In some aspects of the invention, a first polysilicon fuse section for forming a cavity is provided in close proximity to a second polysilicon fuse section for adjusting circuit characteristics. By forming a cavity with the first polysilicon fuse section made to be blown, fused polysilicon is contai

In some aspects of the invention, a first polysilicon fuse section for forming a cavity is provided in close proximity to a second polysilicon fuse section for adjusting circuit characteristics. By forming a cavity with the first polysilicon fuse section made to be blown, fused polysilicon is contained in the cavity when the second polysilicon fuse section is blown to make it possible to provide a polysilicon fuse capable of stably maintaining an electrical insulated state. This can provide a polysilicon fuse capable of stably maintaining the electrical insulated state when the fuse is blown, a semiconductor device having the polysilicon fuse and a method of severing the polysilicon fuse.

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1. A polysilicon fuse comprising: a first polysilicon fuse section for forming a cavity, the first polysilicon fuse section having a first narrowed portion with a narrow width and, on each side of the first narrowed portion, having a first electrode portion with a wide width which is connected to th

1. A polysilicon fuse comprising: a first polysilicon fuse section for forming a cavity, the first polysilicon fuse section having a first narrowed portion with a narrow width and, on each side of the first narrowed portion, having a first electrode portion with a wide width which is connected to the first narrowed portion; anda second polysilicon fuse section for adjusting circuit characteristics, the second polysilicon fuse section having a second narrowed portion with a narrow width and, on each side of the second narrowed portion, having a second electrode portion with a wide width which is connected to the second narrowed portion,the first narrowed portion and the second narrowed portion being arranged overlaid with each other, with the first narrowed portion being arranged beneath the second narrowed portion, and with a dialectric layer disposed in between the first narrowed portion and the second narrowed portion. 2. The polysilicon fuse as claimed in claim 1 wherein the first polysilicon fuse section and the second polysilicon fuse section are arranged so that they are orthogonal to each other. 3. The polysilicon fuse as claimed in claim 1 wherein the insulating film has a thickness in the range of 0.1 μm to 0.5 μm. 4. A semiconductor device having the at least one polysilicon fuse as claimed in claim 1, the semiconductor device further comprising: a first trimming pad connected to the at least one polysilicon fuse at the first electrode portion on one side of the first polysilicon fuse section;a second trimming pad connected to the at least one polysilicon fuse at the second electrode portion on one side of the second polysilicon fuse section;a first circuit characteristic adjusting element connected to the at least one polysilicon fuse with one end of the first circuit characteristic adjusting element at the second electrode portion on the one side of the second polysilicon fuse section; anda second circuit characteristic adjusting element connected to the ground with one end of the second circuit characteristic adjusting element,the first electrode portion on the other side of the first polysilicon fuse section and the second electrode portion on the other side of the second polysilicon fuse section being connected to the ground, andthe first circuit characteristic adjusting element and the second circuit characteristic adjusting element being connected in parallel to each other with their respective other ends. 5. The semiconductor device as claimed in claim 4 wherein each of the first circuit characteristic adjusting element and the second circuit characteristic adjusting element is a resistor. 6. A semiconductor device having the at least one polysilicon fuse as claimed in claim 1, the semiconductor device further comprising: a diode arranged with the anode thereof connected to the at least one polysilicon fuse at the first electrode portion on the one side of the first polysilicon fuse section and the cathode thereof connected to the at least one polysilicon fuse at the second electrode portion on the one side of the second polysilicon fuse section:a trimming pad connected to the at least one polysilicon fuse at the first electrode portion on one side of the first polysilicon fuse section to which portion the anode of the diode is connected;a first circuit characteristic adjusting element connected to the at least one polysilicon fuse with one end of the first circuit characteristic adjusting element at the second electrode portion on the one side of the second polysilicon fuse section to which portion the cathode of the diode is connected; anda second circuit characteristic adjusting element connected to the ground with one end of the second circuit characteristic adjusting element,the first electrode portion on the other side of the first polysilicon fuse section and the second electrode portion on the other side of the second polysilicon fuse section being connected to the ground, andthe first circuit characteristic adjusting element and the second circuit characteristic adjusting element being connected in parallel to each other with their respective other ends. 7. The semiconductor device as claimed in claim 6 wherein each of the first circuit characteristic adjusting element and the second circuit characteristic adjusting element is a resistor. 8. A method of severing the polysilicon fuse as claimed in claim 1, the method comprising the steps of: forming a cavity by applying a voltage across both of the first electrode portions of the first polysilicon fuse section to fuse the first narrowed portion; andafter the step of forming the cavity, electrically severing the second polysilicon fuse section by applying a voltage across both of the second electrode portions of the second polysilicon fuse section to fuse the second narrowed portion and make the fused polysilicon break the dielectric layer disposed below the second narrowed portion and above the cavity to scatter into the cavity. 9. The method of severing the polysilicon fuse as claimed in claim 8 further comprising the step of positioning the first narrowed portion under the second narrowed portion before the step of forming the cavity.