초록 ▼

The invention provides a vacuum enclosure which is defined by a wall having inner and outer surfaces, where the inner surface is in contact with the vacuum and the outer surface is in contact with ambient air. The vacuum enclosure is characterized by the presence therein of a getter for undesired ga

The invention provides a vacuum enclosure which is defined by a wall having inner and outer surfaces, where the inner surface is in contact with the vacuum and the outer surface is in contact with ambient air. The vacuum enclosure is characterized by the presence therein of a getter for undesired gaseous contaminants. The getter includes a substrate (either integral with the inner surface or not) and, deposited thereon by vacuum deposition, a thin-layer laminate including at least one layer (α) of substance(s) such as platinum group metals and oxides thereof, and at least one porous hydrophilic layer (β). A corresponding layered structure having utility as a getter is also part of the invention.

대표청구항 ▼

1. A vacuum enclosure defined by a wall having inner and outer surfaces, the inner surface in contact with the vacuum and the outer surface in contact with ambient air, wherein the vacuum enclosure includes therein a getter for at least hydrogen and water vapor, the getter comprising a substrate and

1. A vacuum enclosure defined by a wall having inner and outer surfaces, the inner surface in contact with the vacuum and the outer surface in contact with ambient air, wherein the vacuum enclosure includes therein a getter for at least hydrogen and water vapor, the getter comprising a substrate and deposited thereon, by vacuum deposition, a thin-layer laminate including at least one layer (α) of substance(s) selected from the group consisting of platinum group metals and oxides thereof, and at least one porous hydrophilic layer (β), the porous hydrophilic layer comprising a mixture of at least one active metal with at least one active metal oxide,wherein the at least one layer (α) is deposited on the substrate, and the at least one layer (β) is deposited on the at least one layer (α), wherein the at least one porous hydrophilic layer (β) is in contact with the vacuum, andwherein the vacuum-deposited mixture is formed by evaporating at least one active metal in an inert atmosphere at a pressure of between about 0.1 and 1 Pa, into which oxygen has been introduced at a pressure from about one to two orders of magnitude less than the inert atmosphere pressure. 2. The vacuum enclosure of claim 1, wherein the getter further features: a) wherein when the at least one layer (α) is formed including an oxide(s), the oxide(s) is(are) formed by reactive vacuum deposition of at least one platinum group metal in the presence of oxygen, and when formed not including oxide(s), the at least one layer (α) is formed by non-reactive vacuum deposition of at least one platinum group metal; andb) the at least one layer (β) absorbs IR radiation within a 1-14 micron wavelength range. 3. The vacuum enclosure of claim 1, wherein the getter further includes at least one feature selected from the group consisting of: (i) the substrate is a foil; and(ii) the at least one layer (α) is a platinum group metal layer or layers, and the substrate is a layer of hydrogen-absorbing transition metal(s) selected from the group consisting of Ti, Zr, Ta, V, Nb, Hf, and alloys thereof. 4. A layered structure comprising a thin-layer laminate as a getter for at least hydrogen and water vapor, the thin-layer laminate vacuum-deposited on a substrate and including at least one layer (α) of substance(s) selected from the group consisting of platinum group metals and oxides thereof, and at least one porous hydrophilic layer (β), the layer (β) comprising a mixture of at least one active metal with at least one active metal oxide,wherein the at least one layer (α) is deposited on the substrate, and the at least one layer (β) is deposited on the at least one layer (α), wherein the at least one porous hydrophilic layer (β) absorbs IR radiation within a 1-14 micron wavelength range, andwherein the vacuum-deposited mixture is formed by evaporating at least one active metal in an inert atmosphere at a pressure of between about 0.1 and 1 Pa, into which oxygen has been introduced at a pressure from about one to two orders of magnitude less than the inert atmosphere pressure. 5. The layered structure of claim 4, wherein: a) the at least one layer (α) when formed including an oxide(s), the oxide(s) is(are) formed by reactive vacuum deposition of at least one platinum group metal in the presence of oxygen, and when formed to not include oxide(s), the at least one layer (α) is formed by non-reactive vacuum deposition of at least one platinum group metal; andb) the vacuum-deposited mixture is formed to have a fractal surface by reactive vacuum deposition of at least one active metal in the presence of oxygen under predetermined conditions adapted for formation of the mixture. 6. The layered structure of claim 4, further including at least one feature selected from the group consisting of: (i) the substrate is a foil; and(ii) the at least one layer (α) is a platinum group metal layer or layers, and the substrate is a layer of hydrogen-absorbing transition metal(s) selected from the group consisting of Ti, Zr, Ta, V, Nb, Hf, and alloys thereof. 7. A vacuum enclosure defined by a wall having inner and outer surfaces, the inner surface in contact with the vacuum and the outer surface in contact with ambient air, and wherein the vacuum enclosure includes therein a getter for at least hydrogen and water vapor, the getter comprising a substrate and deposited thereon, by vacuum deposition, a thin-layer laminate including at least one layer of oxide(s) of at least one platinum group metal, and at least one porous hydrophilic layer comprising a vacuum-deposited mixture of at least one active metal with at least one active metal oxide,wherein the at least one layer of oxides(s) of at least one platinum group metal is deposited on the substrate, and wherein the at least one porous hydrophilic layer is deposited on the at least one layer of oxide(s) of at least platinum group metal, and wherein the at least one porous hydrophilic layer is in contact with the vacuum. 8. The vacuum enclosure of claim 7, wherein the getter is a thin-layer laminate comprising a substance integral with the inner surface. 9. The vacuum enclosure of claim 7, wherein the vacuum-deposited oxide(s) formed by reactive vacuum deposition of at least one platinum group metal in the presence of oxygen. 10. The vacuum enclosure of claim 7, wherein the substrate is a foil. 11. A layered structure comprising a thin-layer laminate vacuum-deposited on a substrate, the thin-layer laminate being a getter for at least hydrogen and water vapor,wherein the thin-layer laminate includes at least one layer (α) of substance(s) selected from the group consisting of platinum group metal oxides, and at least one porous hydrophilic layer (β), wherein the at least one layer (α) is deposited on the substrate, and the at least one layer (β) is deposited on the at least one layer (α),wherein the vacuum-deposited mixture is formed by evaporating at least one active metal in an inert atmosphere at a pressure of between about 0.1 and 1 Pa, into which oxygen has been introduced at a pressure from about one to two orders of magnitude less than the inert atmosphere pressure, andwherein the at least one porous hydrophilic layer (β) absorbs IR radiation within a 1-14 micron wavelength range. 12. The layered structure of claim 11, further comprising at least one feature selected from the group consisting of: a) the platinum group metal oxides are vacuum-deposited oxides formed by reactive vacuum deposition of at least one platinum group metal in the presence of oxygen; andb) the layer (β) comprises a mixture of at least one active metal with at least one active metal oxide and the vacuum-deposited mixture is formed to have a fractal surface configuration by reactive vacuum deposition of at least one active metal in the presence of oxygen under predetermined conditions adapted for formation of the mixture. 13. The vacuum enclosure of claim 7, wherein the mixture is vacuum deposited and has a fractal surface configuration. 14. The vacuum enclosure of claim 2, wherein the getter further includes a feature selected from the group consisting of: (i) a vacuum-deposited mixture of at least one active metal with at least one active metal oxide, the mixture having a fractal surface configuration; and(ii) a vacuum-deposited mixture formed by reactive vacuum deposition of at least one active metal in the presence of oxygen under predetermined conditions adapted for the formation of the mixture. 15. The vacuum enclosure of claim 3, wherein, when (ii) applies, the transition metal layer is deposited onto a further substrate. 16. The layered structure of claim 6, wherein the transition metal layer is deposited onto a further substrate. 17. The vacuum enclosure of claim 9, wherein the getter further comprises a feature selected from the group consisting of: (i) a fractal surface configuration on the vacuum-deposited mixture; and(ii) the vacuum-deposited mixture formed by reactive vacuum deposition of at least one active metal in presence of oxygen under predetermined conditions adapted for formation of the mixture. 18. A vacuum enclosure defined by a wall having inner and outer surfaces, wherein the inner surface is in contact with the vacuum and the outer surface is in contact with ambient air, the vacuum enclosure includes therein a getter for at least hydrogen and water vapor, the getter comprising a substrate and deposited thereon, by vacuum-deposition, a thin-layer laminate including at least one layer (α) of substance(s) selected from the group consisting of platinum group metals and oxides thereof, and at least one porous hydrophilic layer (β),wherein said at least one layer (α) is deposited on the substrate and said at least one layer (β) is deposited on the at least one layer (α), wherein the at least one porous hydrophilic layer (β) is in contact with the vacuum, andwherein the vacuum-deposited mixture is formed by evaporating at least one active metal in an inert atmosphere at a pressure of between about 0.1 and 1 Pa, into which oxygen has been introduced at a pressure from about one to two orders of magnitude less than the inert atmosphere pressure. 19. The vacuum enclosure of claim 18, wherein the substrate is integral with the inner surface. 20. The vacuum enclosure of claim 18, wherein the at least one porous hydrophilic layer (β) absorbs IR radiation within a 1-14 micron wavelength range. 21. The vacuum enclosure of claim 7, wherein the at least one porous hydrophilic layer absorbs IR radiation within a 1-14 micron wavelength range.