Methods of fabricating wafer-level flip chip device packages
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01L-021/00
H01L-033/62
H01L-021/78
H01L-033/50
H01L-023/00
H01L-023/544
H01L-021/683
H01L-033/00
출원번호
US-0505894
(2014-10-03)
등록번호
US-9214615
(2015-12-15)
발명자
/ 주소
Tischler, Michael A.
출원인 / 주소
Cooledge Lighting Inc.
대리인 / 주소
Morgan, Lewis & Bockius LLP
인용정보
피인용 횟수 :
0인용 특허 :
104
초록
In accordance with certain embodiments, semiconductor dies are at least partially coated with a conductive adhesive prior to singulation and subsequently bonded to a substrate having electrical traces thereon.
대표청구항▼
1. A composite wafer comprising: a semiconductor substrate comprising a plurality of partially unsingulated chips, each chip comprising (i) a plurality of exposed electrical contact pads and (ii) a non-contact region disposed between the electrical contact pads;a plurality of trenches extending thro
1. A composite wafer comprising: a semiconductor substrate comprising a plurality of partially unsingulated chips, each chip comprising (i) a plurality of exposed electrical contact pads and (ii) a non-contact region disposed between the electrical contact pads;a plurality of trenches extending through only a portion of a thickness of the substrate and partially singulating the chips; andan anisotropic conductive adhesive (ACA) (i) on the semiconductor substrate, (ii) extending as a single unitary layer over the chips and trenches, and (iii) contacting the electrical contact pads and at least a portion of the non-contact region of each chip, a portion of the ACA directly overlying each of the trenches that partially singulate the chips,wherein (i) none of the electrical contact pads comprises a solder bump or a non-solder bump, and (ii) no solder bumps or non-solder bumps are disposed between the electrical contact pads and the ACA. 2. The wafer of claim 1, wherein the ACA comprises an anisotropic conductive film. 3. The wafer of claim 1, wherein each chip comprises a light-emitting diode (LED) die. 4. The wafer of claim 3, wherein each LED die comprises an inorganic LED die. 5. The wafer of claim 4, wherein at least a portion of each LED die comprises a semiconductor material comprising at least one of silicon, GaAs, InAs, AlAs, InP, GaP, AlP, InSb, GaSb, AlSb, GaN, InN, AN, SiC, ZnO, or an alloy or mixture thereof. 6. The wafer of claim 1, wherein each chip comprises a laser. 7. The wafer of claim 1, wherein a thickness of the ACA across the semiconductor substrate is substantially uniform. 8. The wafer of claim 1, wherein, for each partially unsingulated chip, the top surface of each of the plurality of electrical contact pads is absolutely coplanar with or recessed below the surface of the chip surrounding the electrical contact pad. 9. The wafer of claim 1, wherein, for each partially unsingulated chip, the top surface of each of the plurality of electrical contact pads is recessed below the surface of the chip surrounding the electrical contact pad by more than 3 μm. 10. The wafer of claim 1, wherein, for each partially unsingulated chip, each of the plurality of electrical contact pads is in direct physical contact with (i) a semiconductor portion of the wafer thereunder and (ii) the ACA. 11. The wafer of claim 1, wherein, for each chip, the top surface of at least one of the plurality of electrical contact pads extends above the surface of the chip surrounding the electrical contact by 3 μm or less. 12. The wafer of claim 1, wherein, for each chip, each of the plurality of electrical contact pads comprises a metal silicide or metal nitride compound. 13. The wafer of claim 1, wherein, for each chip, each of the plurality of electrical contact pads comprises a metal layer and a second layer comprising a metal silicide or metal nitride compound. 14. The wafer of claim 1, wherein, for each chip, each of the plurality of electrical contact pads comprises at least one of Al, Cr, Ti, Au, Ni, Ag, or Mo. 15. The wafer of claim 1, wherein two of the electrical contact pads of at least one of the chips are non-coplanar. 16. The wafer of claim 1, wherein the ACA is at least partially transparent. 17. The wafer of claim 1, further comprising a protective layer disposed over at least a portion of the ACA. 18. The wafer of claim 1, wherein the ACA is activatable via application of at least one of pressure, heat, or a magnetic field. 19. The wafer of claim 17, further comprising a release film disposed over the protective layer, the release film being configured to prevent adhesion of a surface of the protective layer opposite the ACA. 20. The wafer of claim 1, further comprising a release film disposed over the ACA, the release film being configured to prevent adhesion of a surface of the ACA opposite the substrate. 21. The wafer of claim 1, wherein a surface of the ACA opposite the substrate is exposed for later adhesion.
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