IPC분류정보
| 국가/구분 |
United States(US) Patent
등록
|
| 국제특허분류(IPC7판) |
|
| 출원번호 |
US-0463066
(2014-08-19)
|
| 등록번호 |
US-9244363
(2016-01-26)
|
|
발명자
/ 주소 |
- Novak, W. Thomas
- Hazelton, Andrew J.
- Sogard, Michael
|
| 출원인 / 주소 |
|
| 대리인 / 주소 |
|
| 인용정보 |
피인용 횟수 :
2 인용 특허 :
68 |
초록
▼
An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrat
An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.
대표청구항
▼
1. An immersion lithography apparatus comprising: an optical assembly including an optical element, the optical assembly configured to project a beam onto a substrate through an immersion liquid;a containment member arranged to surround a path of the beam;a stage on which the substrate is held, the
1. An immersion lithography apparatus comprising: an optical assembly including an optical element, the optical assembly configured to project a beam onto a substrate through an immersion liquid;a containment member arranged to surround a path of the beam;a stage on which the substrate is held, the substrate on the stage being moved below a bottom surface of the containment member with the substrate being spaced from the bottom surface of the containment member; andan isolator having an actuator which limits vibrations of the optical assembly,wherein the containment member includes:a nozzle outlet via which water as the immersion liquid is released,a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage,a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel, anda removal channel which is provided radially outward of the recovery channel. 2. The apparatus according to claim 1, wherein the recovery channel encircles the fluid channel. 3. The apparatus according to claim 1, wherein the recovery channel and the fluid channel are concentric. 4. The apparatus according to claim 1, further comprising a removal system that is in liquid communication with the recovery channel and that creates a vacuum in the recovery channel. 5. The apparatus according to claim 1, wherein the removal channel captures the immersion liquid not captured by the recovery channel. 6. The apparatus according to claim 5, wherein the recovery channel, the fluid channel and the removal channel are concentric. 7. The apparatus according to claim 5, further comprising a further removal system that is in liquid communication with the removal channel. 8. The apparatus according to claim 5, wherein the containment member includes a further channel which defines the nozzle outlet, and the further channel is provided radially inward of the fluid channel. 9. The apparatus according to claim 1, wherein the containment member includes a further channel which defines the nozzle outlet, and the further channel is provided radially inward of the fluid channel. 10. The apparatus according to claim 1, wherein the immersion liquid is released via the nozzle outlet to a chamber which is formed and surrounded by the containment member. 11. The apparatus according to claim 10, further comprising a frame support via which the containment member is supported by an apparatus frame. 12. The apparatus according to claim 1, wherein the containment member is arranged such that a chamber is formed and surrounded by the containment member. 13. The apparatus according to claim 12, further comprising a frame support via which the containment member is supported by an apparatus frame. 14. The apparatus according to claim 1, further comprising a frame support via which the containment member is supported by an apparatus frame. 15. The apparatus according to claim 1, wherein the substrate includes a wafer. 16. The apparatus according to claim 1, wherein the fluid channel has a lower end that is arranged below the optical element. 17. A device manufacturing method comprising: preparing a substrate in order to manufacture a micro-device; andexposing the substrate using the apparatus defined in claim 1. 18. An immersion lithography method comprising: projecting a beam onto a substrate through an immersion liquid, the immersion liquid disposed between an optical element of an optical assembly and the substrate, the immersion liquid being contained using a containment member,limiting vibrations of the optical assembly using an isolator which has an actuator,moving the substrate below a bottom surface of the containment member with the substrate being spaced from the bottom surface of the containment member,releasing water as the immersion liquid from a nozzle outlet of the containment member,recovering the immersion liquid via a recovery channel from a gap between the containment member and the substrate,releasing water to the gap between the containment member and the substrate via a fluid channel provided radially inward of the recovery channel, andremoving fluid via a removal channel provided radially outward of the recovery channel. 19. The method according to claim 18, wherein the removal channel captures the immersion liquid not captured by the recovery channel. 20. The method according to claim 19, wherein the containment member includes a further channel which defines the nozzle outlet, and the further channel is provided radially inward of the fluid channel. 21. The method according to claim 18, wherein the containment member includes a further channel which defines the nozzle outlet, and the further channel is provided radially inward of the fluid channel. 22. The method according to claim 18, wherein the immersion liquid is released via the nozzle outlet to a chamber which is formed and surrounded by the containment member. 23. The method according to claim 18, wherein the containment member is arranged such that a chamber is formed and surrounded by the containment member. 24. The method according to claim 18, wherein the containment member is supported by an apparatus frame via a frame support. 25. The method according to claim 18, wherein the substrate includes a wafer. 26. The method according to claim 18, wherein the fluid channel has a lower end which is arranged to surround the space under the optical element. 27. A device manufacturing method comprising: preparing a substrate in order to manufacture a micro-device; andexposing the substrate using the method defined in claim 18.
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