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A system for determining surface topography of a three-dimensional structure is provided. The system can include an illumination unit configured to output a two-dimensional array of light beams each comprising a plurality of wavelengths. An optical assembly can focus the plurality of wavelengths of

A system for determining surface topography of a three-dimensional structure is provided. The system can include an illumination unit configured to output a two-dimensional array of light beams each comprising a plurality of wavelengths. An optical assembly can focus the plurality of wavelengths of each light beam to a plurality of focal lengths so as to simultaneously illuminate the structure over a two-dimensional field of view. A detector and a processor are used to generate data representative of the surface topography of the three-dimensional structure based on the measured characteristics of the light reflected from the structure.

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1. A system for measuring surface topography of a three-dimensional structure, the system comprising: an illumination unit configured to output a two-dimensional array of light beams each comprising a plurality of wavelengths;an optical assembly operatively coupled to the illumination unit and confi

1. A system for measuring surface topography of a three-dimensional structure, the system comprising: an illumination unit configured to output a two-dimensional array of light beams each comprising a plurality of wavelengths;an optical assembly operatively coupled to the illumination unit and configured to focus the plurality of wavelengths of each light beam to a plurality of focal lengths relative to the optical assembly so as to simultaneously illuminate the structure over a two-dimensional field of view;wherein the plurality of focal lengths is fixed relative to the optical assembly during the measuring of the surface topography;a detector configured to measure a characteristic of light reflected from the structure for each of a plurality of locations distributed in two dimensions over the field of view; and,a processor coupled with the detector and configured to generate data representative of the surface topography of the structure based on the measured characteristics of the light reflected from the structure. 2. The system of claim 1, wherein the characteristic comprises an intensity. 3. The system of claim 2, wherein the detector comprises a plurality of sensor elements distributed over a surface area configured to receive the light reflected from the structure over the field of view. 4. The system of claim 3, wherein each sensor element is configured to measure the intensity of at least one wavelength of the light reflected from the structure. 5. The system of claim 4, wherein the plurality of sensor elements comprises a plurality of red sensor elements, a plurality of green sensor elements, and a plurality of blue sensor elements, each of the plurality of red sensor elements being configured to measure the intensity of a red light wavelength, each of the plurality of green sensor elements being configured to measure the intensity of a green light wavelength, and each of the plurality of blue sensor elements being configured to measure the intensity of a blue light wavelength. 6. The system of claim 5, wherein the plurality of sensor elements are arranged in a Bayer pattern or in a plurality of layers. 7. The system of claim 1, wherein the plurality of wavelengths comprises wavelengths from 400 nm to 800 nm. 8. The system of claim 1, wherein the plurality of wavelengths comprises at least three spectral bands, and wherein the at least three spectral bands comprise overlapping wavelengths of light. 9. The system of claim 1, wherein the plurality of wavelengths comprises a continuous spectrum of wavelengths. 10. The system of claim 1, wherein the two-dimensional array of light beams forms a two-dimensional array of spots on the structure over the field of view, and wherein a ratio of pitch to spot size for the two-dimensional array of spots is configured to inhibit cross-talk between the two-dimensional array of spots. 11. The system of claim 1, wherein the optical assembly is configured to focus the light beams of the two-dimensional array to the plurality of focal lengths using at least one optical component with longitudinal chromatic aberration. 12. The system of claim 1, wherein the plurality of focal lengths covers a depth of at least 20 mm. 13. The system of claim 1, wherein the optical assembly is configured to focus the plurality of wavelengths to the plurality of focal lengths to a depth within a range from 10 mm to 30 mm relative to the optical assembly without relative movement of components of the optical assembly and components of the illumination unit. 14. A method for measuring surface topography of a three-dimensional structure, the method comprising: generating a two-dimensional array of light beams each comprising a plurality of wavelengths;focusing the plurality of wavelengths of each light beam to a plurality of focal lengths relative to the structure so as to simultaneously illuminate the structure over a two-dimensional field of view;wherein the plurality of focal lengths is fixed relative to the optical assembly during the measuring of the surface topography;measuring a characteristic of light reflected from the structure for each of a plurality of locations distributed in two dimensions over the field of view; and,generating data representative of the surface topography of the structure based on the measured characteristics of the light reflected from the structure. 15. The method of claim 14, wherein the characteristic comprises an intensity. 16. The method of claim 15, wherein the intensity of the light reflected from the structure is measured using a detector comprising a plurality of sensor elements distributed over a surface area configured to receive the light reflected from the structure over the field of view. 17. The method of claim 16, wherein each sensor element is configured to measure the intensity of at least one wavelength of the light reflected from the structure. 18. The method of claim 17, wherein the plurality of sensor elements comprises a plurality of red sensor elements, a plurality of green sensor elements, and a plurality of blue sensor elements, each of the plurality of red sensor elements being configured to measure the intensity of a red light wavelength, each of the plurality of green sensor elements being configured to measure the intensity of a green light wavelength, and each of the plurality of blue sensor elements being configured to measure the intensity of a blue light wavelength. 19. The method of claim 18, wherein the plurality of sensor elements are arranged in a Bayer pattern or in a plurality of layers. 20. The method of claim 14, wherein the plurality of wavelengths comprises wavelengths from 400 nm to 800 nm. 21. The method of claim 14, wherein the plurality of wavelengths comprises at least three spectral bands, and wherein the at least three spectral bands comprise overlapping wavelengths of light. 22. The method of claim 14, wherein the plurality of wavelengths comprises a continuous spectrum of wavelengths. 23. The method of claim 14, wherein the two-dimensional array of light beams forms a two-dimensional array of spots on the structure over the field of view, and wherein a ratio of pitch to spot size for the two-dimensional array of spots is selected to inhibit cross-talk between the two-dimensional array of spots. 24. The method of claim 14, wherein the light beams of the two-dimensional array are focused to the plurality of focal lengths using at least one optical component with longitudinal chromatic aberration. 25. The method of claim 14, wherein the plurality of focal lengths covers a depth of at least 20 mm. 26. The method of claim 14, wherein the focusing of the plurality of wavelengths to the plurality of focal lengths to a depth within a range from 10 mm to 30 mm is performed without relative movement of components of an optical assembly and components of an illumination unit.