[특허]Methods and apparatus for material processing using dual source cyclonic plasma reactor

CORNING INCORPORATED

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Methods and apparatus for material processing using dual source cyclonic plasma reactor

특허상세정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C03B-019/10 C03B-003/00 H01J-037/32 C03B-003/02 H05H-001/24 H05H-001/46
출원번호	US-0230846 (2014-03-31)
등록번호	US-9284210 (2016-03-15)
발명자 / 주소	Boughton, Daniel Robert
출원인 / 주소	CORNING INCORPORATED
대리인 / 주소	Barron, Jason A.
인용정보	피인용 횟수 : 4 인용 특허 : 45

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Methods and apparatus provide for: feeding glass batch material into a plasma containment vessel; directing one or more sources of plasma gas into an inner volume of the plasma containment vessel in such a way that the plasma gas swirls in a cyclonic fashion within the plasma containment vessel; and applying first and second electromagnetic fields to the plasma gas to facilitate production of a plasma plume within the inner volume of the plasma containment vessel, where the plasma plume is of a generally cylindrical configuration, and is of sufficient th...

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1. An apparatus, comprising: a plasma containment vessel having at least one wall member defining an inner volume having a central axis, an inlet end, and an opposing outlet end;an inlet structure disposed at the inlet end of the plasma containment vessel and including: (i) a material inlet for receiving glass batch material and dispensing the glass batch material proximate to the inlet end of the inner volume of the plasma containment vessel, (ii) at least one gas inlet for receiving one or more sources of plasma gas and dispensing the plasma gas into the inlet end of the inner volume such that the plasma gas is directed tangentially to the central axis, and at least one gas outlet for egress of plasma gas at the outlet end of the inner volume, the at least one gas inlet and at least one gas outlet being disposed such that the plasma gas swirls through the inner volume in cyclonic fashion; andfirst and second ring electrodes disposed annularly about an exterior of the at least one wall member of the plasma containment vessel, wherein: (i) the first ring electrode is disposed annularly about the inlet end and the second ring electrode is disposed annularly about the outlet end, and (ii) the first and second ring electrodes are operable to receive a source of RF power having characteristics sufficient to produce a first electromagnetic field having field lines running between the first and second ring electrodes and generally parallel to the central axis of the plasma containment vessel; andan induction coil disposed along the central axis of the plasma containment vessel, and operable to receive a source of AC power having characteristics sufficient to produce a second electromagnetic field having field lines running through a core of the induction coil, and through the inner volume generally parallel to the central axis of the plasma containment vessel, wherein the first electromagnetic field and the second electromagnetic field cooperate to form a plasma plume within the plasma containment vessel. 2. The apparatus of claim 1, wherein the plasma plume is of a substantially cylindrical shape, and is of sufficient thermal energy to cause the glass batch material to thermally react. 3. The apparatus of claim 1, wherein the RF power is of a characteristic such that the first electromagnetic field exhibits a frequency of at least one of: (i) at least 1 MHz, (ii) at least 3 MHz, (iii) at least 4 MHz, (iv) at least 5 MHz, (v) at least 10 MHz, (vi) at least 15 MHz, (vii) at least 20 MHz, (viii) at least 30 MHz, (ix) at least 40 MHz, and (x) between about 1 to 50 MHz. 4. The apparatus of claim 1, wherein the AC power is of a characteristic such that the second electromagnetic field exhibits a frequency of at least one of: (i) at least 10 kHz, (ii) at least 15 kHz, (iii) at least 20 kHz, (iv) at least 30 kHz, (v) at least 40 kHz, (vi) at least 50 kHz, (vii) at least 100 kHz, (viii) at least 150 kHz, (ix) at least 200 kHz, and (x) between about 10 to 250 kHz. 5. The apparatus of claim 1, wherein the induction coil is disposed within a hermetically sealed chamber located within the inner volume of the plasma containment vessel. 6. The apparatus of claim 1, further comprising a controller operating to control a power level of the AC power, to thereby control an intensity of the second electromagnetic field, and to thereby control a temperature of the plasma plume. 7. The apparatus of claim 1, wherein the plasma plume has a temperature ranging from one of: (i) about 9,000 K to about 18,000 K; (ii) about 11,000 K to about 15,000 K; and (iii) at least about 11,000 K. 8. The apparatus of claim 1, further comprising a controller operating to adjust a pressure and flow rate of the one or more sources of plasma gas in order to control one or more characteristics of cyclonic swirling of the plasma gas through the inner volume, thereby controlling a residence time of the glass batch material within the plasma plume. 9. The apparatus of claim 1, wherein the material inlet is oriented such that the glass batch material is dispensed generally parallel to the central axis of the plasma containment vessel and transverse to the plasma gas entering the inner volume tangentially to the central axis. 10. The apparatus of claim 1, wherein: The inlet structure includes one or more internal channels operating to carry fluid therethrough in order to cool the inlet structure in the presence of the plasma plume;the at least one wall member includes respective internal channels operating to carry fluid therethrough in order to cool the plasma containment vessel in the presence of the plasma plume; andthe induction coil is disposed within an hermetically sealed chamber formed by at least one inner wall member, the inner wall member including respective internal channels operating to carry fluid therethrough in order to cool the hermetically sealed chamber in the presence of the plasma plume. 11. The apparatus of claim 1, wherein the plasma gas includes at least one of argon, air, helium, nitrogen, oxygen, and mixtures thereof. 12. The apparatus of claim 1, wherein the thermally reacted glass batch material exit the plasma containment vessel through the outlet end. 13. A method, comprising: providing a plasma containment vessel having at least one wall member defining an inner volume having a central axis, an inlet end, and an opposing outlet end;providing an inlet structure disposed at the inlet end of the plasma containment vessel and including: (i) a material inlet for receiving glass batch material and dispensing the glass batch material proximate to the inlet end of the inner volume of the plasma containment vessel, (ii) at least one gas inlet for receiving one or more sources of plasma gas and dispensing the plasma gas into the inlet end of the inner volume such that the plasma gas is directed tangentially to the central axis, and at least one gas outlet for egress of plasma gas at the outlet end of the inner volume, the at least one gas inlet and at least one gas outlet being disposed such that the plasma gas swirls through the inner volume in cyclonic fashion; andproviding first and second ring electrodes disposed annularly about an exterior of the at least one wall member of the plasma containment vessel, wherein: (i) the first ring electrode is disposed annularly about the inlet end and the second ring electrode is disposed annularly about the outlet end, and (ii) the first and second ring electrodes are operable to receive a source of RF power having characteristics sufficient to produce a first electromagnetic field having field lines running between the first and second ring electrodes and generally parallel to the central axis of the plasma containment vessel; andproviding an induction coil disposed along the central axis of the plasma containment vessel, and operable to receive a source of AC power having characteristics sufficient to produce a second electromagnetic field having field lines running through a core of the induction coil, and through the inner volume generally parallel to the central axis of the plasma containment vessel. 14. The method of claim 13, further comprising producing the plasma plume in a substantially cylindrical shape, and of sufficient thermal energy to cause the glass batch material to thermally react. 15. The method of claim 14, wherein at least one of: the thermal reaction includes at least partially melting the glass batch material,the thermal reaction includes at least partially melting at least one of the glass batch material and one or more further materials thereby forming coated glass batch material particles, andthe thermal reaction includes at least partially melting the glass batch material to form substantially homogeneous, spheroid-shaped glass intermediate particles. 16. The method of claim 13, wherein the RF power is of a characteristic such that the first electromagnetic field exhibits a frequency of at least one of: (i) at least 1 MHz, (ii) at least 3 MHz, (iii) at least 4 MHz, (iv) at least 5 MHz, (v) at least 10 MHz, (vi) at least 15 MHz, (vii) at least 20 MHz, (viii) at least 30 MHz, (ix) at least 40 MHz, and (x) between about 1 to 50 MHz. 17. The method of claim 13, wherein the AC power is of a characteristic such that the second electromagnetic field exhibits a frequency of at least one of: (i) at least 10 kHz, (ii) at least 15 kHz, (iii) at least 20 kHz, (iv) at least 30 kHz, (v) at least 40 kHz, (vi) at least 50 kHz, (vii) at least 100 kHz, (viii) at least 150 kHz, (ix) at least 200 kHz, and (x) between about 10 to 250 kHz. 18. The method of claim 13, further comprising: controlling a power level of the AC power, to thereby control an intensity of the second electromagnetic field, and to thereby control a temperature of the plasma plume,wherein the plasma plume has a temperature ranging from one of: (i) about 9,000 K to about 18,000 K; (ii) about 11,000 K to about 15,000 K; and (iii) at least about 11,000 K. 19. The method of claim 13, further comprising adjusting a pressure and flow rate of the one or more sources of plasma gas in order to control one or more characteristics of cyclonic swirling of the plasma gas through the inner volume, thereby controlling a residence time of the glass batch material within the plasma plume. 20. The method of claim 13, further comprising dispensing the glass batch material generally parallel to the central axis of the plasma containment vessel and transverse to the plasma gas entering the inner volume tangentially to the central axis. 21. The method of claim 13, wherein a mean particle size of the glass batch material is at least one of: (i) at least about 10 um, (ii) at least about 50 um, (iii) at least about 75 um, (iv) at least about 100 um, (v) at least about 150 um, (vi) at least about 200 um, (vii) at least about 500 um, (viii) at least about 750 um, (ix) at least about 1000 um, and (x) from about 5 to about 1000 um. 22. The method of claim 13, wherein the plasma gas includes at least one of argon, air, helium, nitrogen, oxygen, and mixtures thereof.

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Methods and apparatus for material processing using dual source cyclonic plasma reactor

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Methods and apparatus for material processing using dual source cyclonic plasma reactor

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