[미국특허]
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G03B-027/52
G03F-007/20
출원번호
US-0944487
(2013-07-17)
등록번호
US-9329493
(2016-05-03)
발명자
/ 주소
Binnard, Michael
출원인 / 주소
NIKON CORPORATION
대리인 / 주소
Oliff PLC
인용정보
피인용 횟수 :
0인용 특허 :
160
초록▼
An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A first stage mounts the substrate and is movable relative to the optical element. A second stage is independently movable relative to the first stage and is positionable awa
An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A first stage mounts the substrate and is movable relative to the optical element. A second stage is independently movable relative to the first stage and is positionable away from below the optical element. While the first stage is positioned below the optical element, the second stage is movable relative to the first stage so that the second stage is positioned adjacent to the first stage, and when the second stage is positioned adjacent to the first stage, the adjacent first and second stages are movable to locate the second stage opposed to the optical element in place of the first stage such that the immersion liquid is maintained below the optical element during the movement.
대표청구항▼
1. An immersion exposure apparatus for exposing a substrate with a light beam via an optical element and immersion liquid, the apparatus comprising: a first stage for mounting the substrate and that is movable relative to the optical element; anda second stage that is independently movable relative
1. An immersion exposure apparatus for exposing a substrate with a light beam via an optical element and immersion liquid, the apparatus comprising: a first stage for mounting the substrate and that is movable relative to the optical element; anda second stage that is independently movable relative to the first stage and that is positionable away from below the optical element,wherein while the first stage is positioned below the optical element, the second stage is movable relative to the first stage so that the second stage is positioned adjacent to the first stage, and when the second stage is positioned adjacent to the first stage, the adjacent first and second stages are movable to locate the second stage opposed to the optical element in place of the first stage such that the immersion liquid is maintained below the optical element during the movement. 2. The immersion exposure apparatus according to claim 1, wherein the adjacent first and second stages are movable for a transition from a first state to a second state, the first state being a state in which the immersion liquid is maintained in a space between the optical element and the first stage, the second state being a state in which the immersion liquid is maintained in a space between the optical element and the second stage, such that the immersion liquid is maintained below the optical element during the transition. 3. The immersion exposure apparatus according to claim 2, wherein the first stage and the second stage are arranged to move in unison in the transition. 4. The immersion exposure apparatus according to claim 1, wherein the apparatus is configured such that after the movement, the second stage remains below the optical element while an operation is performed on a substrate mounted on the first stage. 5. The immersion exposure apparatus according to claim 1, wherein the apparatus is configured such that the first stage is movable away from below the optical element while the second stage is positioned below the optical element. 6. The immersion exposure apparatus according to claim 1, wherein the apparatus is configured such that one of the first and second stages is arranged away from below the optical element while the other of the first and second stages is positioned below the optical element. 7. The immersion exposure apparatus according to claim 1, wherein the apparatus is configured such that after the exposure of the substrate, the movement of the adjacent first and second stages relative to the optical element is performed to replace the first stage with the second stage. 8. The immersion exposure apparatus according to claim 1, wherein the apparatus is configured such that the second stage is positionable away from below the optical element during exposure of the substrate mounted on the first stage. 9. The immersion exposure apparatus according to claim 1, wherein the apparatus is configured to move the adjacent first and second stages relative to the optical element so that the immersion liquid is maintained below the optical element by one or both of the adjacent first and second stages. 10. The immersion exposure apparatus according to claim 1, wherein the apparatus is configured such that the adjacent first and second stages are moved relative to the optical element until the second stage is below the optical element. 11. The immersion exposure apparatus according to claim 1, wherein the first stage is a wafer stage and the second stage is a pad stage. 12. A device manufacturing method including a lithography process, wherein in the lithography process, a device pattern is transferred onto a substrate using the immersion exposure apparatus according to claim 1. 13. An immersion exposure method for exposing a substrate with a light beam via an optical element and immersion liquid, the method comprising: positioning a first stage, on which a substrate is mounted, below the optical element;moving a second stage, which is independently movable relative to the first stage and positioned away from below the optical element, relative to the first stage so that the second stage is positioned adjacent to the first stage; andmoving the adjacent first and second stages relative to the optical element so that the second stage is located opposed to the optical element in place of the first stage, the immersion liquid being maintained below the optical element during the movement. 14. The immersion exposure method according to claim 13, wherein the adjacent first and second stages are moved in a transition from a first state to a second state, the first state being a state in which the immersion liquid is maintained in a space between the optical element and the first stage, the second state being a state in which the immersion liquid is maintained in a space between the optical element and the second stage, the immersion liquid being maintained below the optical element during the transition. 15. The immersion exposure method according to claim 14, wherein the first stage and the second stage move in unison in the transition. 16. The immersion exposure method according to claim 13, wherein after the movement, the second stage remains below the optical element while an operation is performed on a substrate mounted on the first stage. 17. The immersion exposure method according to claim 13, wherein the first stage is movable away from below the optical element while the second stage is positioned below the optical element. 18. The immersion exposure method according to claim 13, wherein one of the first and second stages is arranged away from below the optical element while the other of the first and second stages is positioned below the optical element. 19. The immersion exposure method according to claim 13, wherein after the exposure of the substrate, the movement of the adjacent first and second stages relative to the optical element is performed to replace the first stage with the second stage. 20. The immersion exposure method according to claim 13, wherein the second stage is positionable away from below the optical element during exposure of the substrate mounted on the first stage. 21. The immersion exposure method according to claim 13, wherein the adjacent first and second stages are moved relative to the optical element so that the immersion liquid is maintained below the optical element by one or both of the adjacent first and second stages. 22. The immersion exposure method according to claim 13, wherein the adjacent first and second stages are moved relative to the optical element until the second stage is below the optical element. 23. The immersion exposure method according to claim 13, wherein the first stage is a wafer stage and the second stage is a pad stage. 24. A device manufacturing method including a lithography process, wherein in the lithography process, a device pattern is transferred onto a substrate using the immersion exposure method according to claim 13.
Binnard,Michael, Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
Binnard, Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
Binnard,Michael, Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine.
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