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An apparatus for use in semiconductor processing operations to distribute process gases across a semiconductor wafer. The apparatus may include one or more annular baffles arranged in a stack of annular baffle layers within a plenum volume of the apparatus. Each annular baffle may have a mid-diamete

An apparatus for use in semiconductor processing operations to distribute process gases across a semiconductor wafer. The apparatus may include one or more annular baffles arranged in a stack of annular baffle layers within a plenum volume of the apparatus. Each annular baffle may have a mid-diameter substantially equal to and inner diameter or outer diameter of a baffle in the annular baffle layer above it. The annular baffles may be arranged in a cascading fashion.

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1. An apparatus for distributing gas across a semiconductor wafer, the apparatus comprising: a plenum volume at least partially defined by a first surface of the apparatus, a second surface of the apparatus facing the first surface, and one or more circumferential surfaces of the apparatus interpose

1. An apparatus for distributing gas across a semiconductor wafer, the apparatus comprising: a plenum volume at least partially defined by a first surface of the apparatus, a second surface of the apparatus facing the first surface, and one or more circumferential surfaces of the apparatus interposed between the first surface and the second surface;one or more gas inlets into the plenum volume through the first surface;a first annular baffle; anda circular baffle, the circular baffle substantially centered on the one or more gas inlets, substantially parallel to the first surface, and offset from the first surface by a first distance, wherein: the first annular baffle is substantially centered on the one or more gas inlets,the first annular baffle is substantially parallel to the first surface,the first annular baffle is located between the first surface and the second surface,the first annular baffle has an outer edge that is offset from the one or more circumferential surfaces such that a radial gap exists between the first annular baffle and the one or more circumferential surfaces,the first annular baffle is offset from the circular baffle by a second distance, andthe circular baffle is between the first annular baffle and the first surface. 2. The apparatus of claim 1, wherein: the circular baffle has a diameter,the first annular baffle has a mid-diameter, andthe mid-diameter of the first annular baffle is substantially equal to the diameter of the circular baffle. 3. The apparatus of claim 2, further comprising: one or more circumferential surfaces spanning between the first surface and the second surface, wherein:one of the one or more circumferential surfaces has a diameter;the first annular baffle has an outer diameter;the diameter of the circular baffle is substantially half the diameter of the circumferential surface; andthe outer diameter of the first annular baffle is substantially equal to half of the sum of the diameters of the circumferential surface and the circular baffle. 4. The apparatus of claim 2, further comprising: a second annular baffle; anda third annular baffle, wherein: the second annular baffle and the third annular baffle are both substantially centered on the one or more gas inlets, substantially parallel to the first surface, and offset from the first annular baffle by a third distance, wherein: the second annular baffle and the third annular baffle are located between the first annular baffle and the second surface, andthe first annular baffle is between the circular baffle and the second annular baffle and between the circular baffle and the third annular baffle. 5. The apparatus of claim 4, wherein: the circular baffle and the first surface are separated by a gap of approximately 0.3″,the circular baffle and the first annular baffle are separated by a gap of approximately 0.3″,the first annular baffle and the second annular baffle are separated by a gap of approximately 0.3″, andthe first annular baffle and the third annular baffle are separated by a gap of approximately 0.3″. 6. The apparatus of claim 4, wherein the second annular baffle and the third annular baffle are substantially co-planar with one another. 7. The apparatus of claim 4, wherein: the first annular baffle has an inner diameter and an outer diameter,the second annular baffle has a mid-diameter,the third annular baffle has a mid-diameter,the mid-diameter of the second annular baffle is substantially equal to the inner diameter of the first annular baffle, andthe mid-diameter of the third annular baffle is substantially equal to the outer diameter of the first annular baffle. 8. The apparatus of claim 4, wherein: the first annular baffle has an inner diameter and an outer diameter,the second annular baffle has a mid-diameter,the third annular baffle has a mid-diameter,the mid-diameter of the second annular baffle is within 10% of the inner diameter of the first annular baffle, andthe mid-diameter of the third annular baffle is within 10% of the outer diameter of the first annular baffle. 9. The apparatus of claim 1, wherein: the circular baffle has a diameter,the first annular baffle has a mid-diameter, andthe mid-diameter of the first annular baffle is within 10% of the diameter of the circular baffle. 10. The apparatus of claim 1, wherein the second surface is defined by a first side of a faceplate with a pattern of through-holes fluidly connecting the plenum volume with a second side of the faceplate opposite the first side. 11. The apparatus of claim 1, wherein the first annular baffle is formed by a plurality of arc-shaped baffle segments that form an annular shape when arranged in a circle. 12. The apparatus of claim 11, further comprising a plurality of walls, each wall substantially perpendicular to the first surface and interposed between adjoining arc-shaped baffle segments of the first annular baffle. 13. The apparatus of claim 12, wherein each wall has at least one ledge that is configured to support adjoining edges of the arc-shaped baffle segments. 14. The apparatus of claim 12, further comprising one or more circumferential surfaces spanning between the first surface and the second surface, wherein each wall is a substantially radial wall substantially extending from the one or more circumferential surfaces towards the one or more gas inlets and spanning at least between the second surface and the first annular baffle. 15. The apparatus of claim 1, further comprising: one or more annular baffle layers, wherein: the first annular baffle forms a first annular baffle layer of the one or more annular baffle layers,the annular baffle layers are spaced apart from one another in a direction substantially normal to the annular baffle layers,each annular baffle layer includes one or more annular baffles,each annular baffle is substantially centered on the one or more gas inlets,each annular baffle layer has twice as many annular baffles in it than the proximate annular baffle layer between that annular baffle layer and the first surface,each annular baffle has a mid-diameter, an outer diameter, and an inner diameter, and,for each annular baffle layer other than the first annular baffle layer, the mid-diameter of each annular baffle in that annular baffle layer is substantially equal to a different one of the inner diameter or diameters and outer diameter or diameters of the annular baffle or annular baffles in the proximate annular baffle layer between that annular baffle layer and the first surface. 16. The apparatus of claim 15, wherein each of the annular baffle layers is spaced apart from any proximate annular baffle layers by at least 0.05″. 17. The apparatus of claim 15, wherein one or more of the annular baffles is formed from a plurality of arc-shaped baffle segments arranged in a substantially annular shape, and the apparatus further comprises a plurality of walls: positioned between adjoining arc-shaped baffle segments of the annular baffles, andconfigured to support the arc-shaped baffle segments within the plenum volume. 18. The apparatus of claim 1, further comprising: one or more annular baffle layers, wherein: the first annular baffle forms a first annular baffle layer of the one or more annular baffle layers,the annular baffle layers are spaced apart from one another in a direction substantially normal to the annular baffle layers,each annular baffle layer includes one or more annular baffles,each annular baffle is substantially centered on the one or more gas inlets,each annular baffle layer has twice as many annular baffles in it than the proximate annular baffle layer between that annular baffle layer and the first surface,each annular baffle has a mid-diameter, an outer diameter, and an inner diameter, and,for each annular baffle layer other than the first annular baffle layer, the mid-diameter of each annular baffle in that annular baffle layer is within 10% of the different one of the inner diameter or diameters and the outer diameter or diameters of the annular baffle or annular baffles in the proximate annular baffle layer between that annular baffle layer and the first surface. 19. A semiconductor processing station, the semiconductor processing station including the apparatus of claim 1. 20. A semiconductor processing tool, the semiconductor processing tool including the semiconductor processing station of claim 19. 21. The semiconductor processing tool of claim 20, wherein the semiconductor processing tool includes a stepper. 22. An apparatus for distributing gas across a semiconductor wafer, the apparatus comprising: a plenum volume at least partially defined by a first surface of the apparatus, a second surface of the apparatus facing the first surface, and one or more circumferential surfaces of the apparatus interposed between the first surface and the second surface;one or more gas inlets into the plenum volume through the first surface;a first annular baffle; anda backplate, wherein: the first annular baffle is substantially centered on the one or more gas inlets,the first annular baffle is substantially parallel to the first surface,the first annular baffle is located between the first surface and the second surface,the first annular baffle has an outer edge that is offset from the one or more circumferential surfaces such that a radial gap exists between the first annular baffle and the one or more circumferential surfaces, andthe backplate provides the first surface and the one or more gas inlets are arranged to distribute gas onto the first annular baffle. 23. The apparatus of claim 22, further comprising: a second annular baffle; anda third annular baffle, wherein: the second annular baffle and the third annular baffle are both substantially centered on the one or more gas inlets, substantially parallel to the first surface, and offset from the first annular baffle by a third distance, wherein: the second annular baffle and the third annular baffle are located between the first annular baffle and the second surface, andthe first annular baffle is between the first surface and the second annular baffle and between the first surface and the third annular baffle. 24. The apparatus of claim 23, wherein the second annular baffle and the third annular baffle are substantially co-planar with one another. 25. The apparatus of claim 23, wherein: the first annular baffle has an inner diameter and an outer diameter,the second annular baffle has a mid-diameter,the third annular baffle has a mid-diameter,the mid-diameter of the second annular baffle is substantially equal to the inner diameter of the first annular baffle, andthe mid-diameter of the third annular baffle is substantially equal to the outer diameter of the first annular baffle. 26. The apparatus of claim 23, wherein: the first annular baffle has an inner diameter and an outer diameter,the second annular baffle has a mid-diameter,the third annular baffle has a mid-diameter,the mid-diameter of the second annular baffle is within 10% of the inner diameter of the first annular baffle, andthe mid-diameter of the third annular baffle is within 10% of the outer diameter of the first annular baffle. 27. The apparatus of claim 22, wherein the second surface is defined by a first side of a faceplate with a pattern of through-holes fluidly connecting the plenum volume with a second side of the faceplate opposite the first side. 28. The apparatus of claim 22, wherein the first annular baffle is formed by a plurality of arc-shaped baffle segments that form an annular shape when arranged in a circle. 29. The apparatus of claim 28, further comprising a plurality of walls, each wall substantially perpendicular to the first surface and interposed between adjoining arc-shaped baffle segments of the first annular baffle. 30. The apparatus of claim 29, wherein each wall has at least one ledge that is configured to support adjoining edges of the arc-shaped baffle segments. 31. The apparatus of claim 29, further comprising one or more circumferential surfaces spanning between the first surface and the second surface, wherein each wall is a substantially radial wall substantially extending from the one or more circumferential surfaces towards the one or more gas inlets and spanning at least between the second surface and the first annular baffle. 32. The apparatus of claim 22, further comprising: one or more annular baffle layers, wherein: the first annular baffle forms a first annular baffle layer of the one or more annular baffle layers,the annular baffle layers are spaced apart from one another in a direction substantially normal to the annular baffle layers,each annular baffle layer includes one or more annular baffles,each annular baffle is substantially centered on the one or more gas inlets,each annular baffle layer has twice as many annular baffles in it than the proximate annular baffle layer between that annular baffle layer and the first surface,each annular baffle has a mid-diameter, an outer diameter, and an inner diameter, and,for each annular baffle layer other than the first annular baffle layer, the mid-diameter of each annular baffle in that annular baffle layer is substantially equal to a different one of the inner diameter or diameters and outer diameter or diameters of the annular baffle or annular baffles in the proximate annular baffle layer between that annular baffle layer and the first surface. 33. The apparatus of claim 32, wherein each of the annular baffle layers is spaced apart from any proximate annular baffle layers by at least 0.05″. 34. The apparatus of claim 32, wherein one or more of the annular baffles is formed from a plurality of arc-shaped baffle segments arranged in a substantially annular shape, and the apparatus further comprises a plurality of walls: positioned between adjoining arc-shaped baffle segments of the annular baffles, andconfigured to support the arc-shaped baffle segments within the plenum volume. 35. The apparatus of claim 22, further comprising: one or more annular baffle layers, wherein: the first annular baffle forms a first annular baffle layer of the one or more annular baffle layers,the annular baffle layers are spaced apart from one another in a direction substantially normal to the annular baffle layers,each annular baffle layer includes one or more annular baffles,each annular baffle is substantially centered on the one or more gas inlets,each annular baffle layer has twice as many annular baffles in it than the proximate annular baffle layer between that annular baffle layer and the first surface,each annular baffle has a mid-diameter, an outer diameter, and an inner diameter, andfor each annular baffle layer other than the first annular baffle layer, the mid-diameter of each annular baffle in that annular baffle layer is within 10% of the different one of the inner diameter or diameters and the outer diameter or diameters of the annular baffle or annular baffles in the proximate annular baffle layer between that annular baffle layer and the first surface.