초록 ▼

A cleaning apparatus is provided that includes a first nozzle configured to direct a cleaning jet towards a contaminated surface at a pressure sufficient to remove contaminants from the surface. At least one second nozzle is configured to direct a rinsing jet towards the contaminated surface to remo

A cleaning apparatus is provided that includes a first nozzle configured to direct a cleaning jet towards a contaminated surface at a pressure sufficient to remove contaminants from the surface. At least one second nozzle is configured to direct a rinsing jet towards the contaminated surface to remove cleaning fluid therefrom, wherein the rinsing jet is directed at a pressure sufficient to isolate the cleaning jet from an ambient environment.

대표청구항 ▼

1. A cleaning apparatus comprising: a guide piece;a cleaning fluid source;a rinsing fluid source;a first nozzle coupled to said guide piece and coupled in flow communication with said cleaning fluid source, said first nozzle configured to direct a cleaning jet towards a contaminated surface at a pre

1. A cleaning apparatus comprising: a guide piece;a cleaning fluid source;a rinsing fluid source;a first nozzle coupled to said guide piece and coupled in flow communication with said cleaning fluid source, said first nozzle configured to direct a cleaning jet towards a contaminated surface at a pressure sufficient to remove contaminants from the contaminated surface; anda plurality of second nozzles coupled to said guide piece and coupled in flow communication with said rinsing fluid source, said plurality of second nozzles configured to direct a rinsing jet towards the contaminated surface to remove cleaning fluid therefrom, said plurality of second nozzles positioned circumferentially about said first nozzle, wherein the rinsing jet is directed at a pressure sufficient to isolate the cleaning jet from an ambient environment, and wherein said first nozzle and said plurality of second nozzles are oriented on said guide piece such that the cleaning jet and the rinsing jet at least partially overlap before impinging against the contaminated surface. 2. The cleaning apparatus in accordance with claim 1, wherein said plurality of second nozzles is configured to direct the rinsing jet at a pressure that is one of equal to or greater than the cleaning jet pressure. 3. The cleaning apparatus in accordance with claim 1, wherein said first nozzle is configured to direct the cleaning jet that comprises dry steam and at least one cleaning chemical. 4. The cleaning apparatus in accordance with claim 3, wherein said first nozzle is configured to direct the cleaning jet that comprises at least 40% dry steam by weight. 5. The cleaning apparatus in accordance with claim 1, wherein said plurality of second nozzles is configured to direct the rinsing jet that comprises at least one of wet steam and a combination of wet steam and at least one solvent. 6. The cleaning apparatus in accordance with claim 5, wherein said plurality of second nozzles is configured to direct the rinsing jet that comprises at least 85% wet steam by weight. 7. The cleaning apparatus in accordance with claim 1, wherein said first nozzle and said plurality of second nozzles are configured to direct the cleaning jet and the rinsing jet towards the contaminated surface simultaneously. 8. A cleaning system comprising: a housing comprising a cleaning fluid source and a rinsing fluid source housed therein; anda cleaning head coupled to said housing, said cleaning head comprising: a guide piece;a first nozzle coupled to said guide piece, said first nozzle configured to direct a cleaning jet towards a contaminated surface at a pressure sufficient to remove contaminants from the contaminated surface; anda plurality of second nozzles coupled to said guide piece, said plurality of second nozzles configured to direct a rinsing jet towards the contaminated surface to remove cleaning fluid therefrom, said plurality of second nozzles positioned circumferentially about said first nozzle, wherein the rinsing jet is directed at a pressure sufficient to isolate the cleaning jet from an ambient environment, and wherein said first nozzle and said plurality of second nozzles are oriented on said guide piece such that the cleaning jet and the rinsing jet at least partially overlap before impinging against the contaminated surface. 9. The cleaning system in accordance with claim 8, wherein said a plurality of second nozzles is configured to direct the rinsing jet at a pressure that is one of equal to or greater than the cleaning jet pressure. 10. The cleaning system in accordance with claim 8, further comprising at least one hose that couples said cleaning head in flow communication with said housing. 11. The cleaning system in accordance with claim 8, wherein said cleaning fluid source comprises a steam generation unit and a cleaning fluid injection unit, and wherein said rinsing fluid source comprises the steam generation unit and a rinsing fluid injection unit.