초록 ▼

A glass sheet has an electrically conductive film having a sheet resistance in the range of 9.5 to 14.0 ohms/square; an emissivity in the range of 0.14 to 0.17 and an absorption coefficient of greater than 1.5×103 cm−1 in the wavelength range of 400-1100 nanometers, and a surface roughness of less t

A glass sheet has an electrically conductive film having a sheet resistance in the range of 9.5 to 14.0 ohms/square; an emissivity in the range of 0.14 to 0.17 and an absorption coefficient of greater than 1.5×103 cm−1 in the wavelength range of 400-1100 nanometers, and a surface roughness of less than 15 nanometers Root Means Square. A glass sheet of another embodiment of the invention has an electrically conductive film having a phosphorous-fluorine doped tin oxide pyrolytically deposited film on the surface of the glass sheet, wherein the ratio of phosphorous precursor to tin precursor is in the range of greater than 0-0.4. The coated glass sheets of the invention can be used in the manufacture of multi sheet insulating units, OLEDs and solar cells.

대표청구항 ▼

1. A coated glass sheet comprising: a glass substrate having a surface;a pyrolytic chemical vapor deposited fluorine doped tin oxide film over the surface of the glass substrate, the pyrolytic chemical vapor deposited fluorine doped tin oxide film comprising a sheet resistance in the range of 9.5 to

1. A coated glass sheet comprising: a glass substrate having a surface;a pyrolytic chemical vapor deposited fluorine doped tin oxide film over the surface of the glass substrate, the pyrolytic chemical vapor deposited fluorine doped tin oxide film comprising a sheet resistance in the range of 9.5 to 14.0 ohms/square; an emissivity in the range of 0.14 to 0.17 and an absorption coefficient of greater than 1.5×103 cm−1 in the wavelength range of 400-1100 nanometers, and a Surface height root mean square of less than 15 nanometers, wherein the properties are determined at a substrate thickness of 3.2 millimeters, and the pyrolytic chemical vapor deposited fluorine doped tin oxide film has a thickness of 500-540 nanometers and a fluorine to tin oxide atomic ratio of 0.006-0.010,wherein the pyrolytic chemical vapor deposited fluorine doped tin oxide film has a first surface and an opposite second surface, the first surface facing the glass substrate and the second surface facing away from the glass substrate, the second surface of the pyrolytic chemical vapor deposited fluorine doped tin oxide film comprises a crystalline surface, wherein orientation of the crystals of the pyrolytic chemical vapor deposited fluorine doped tin oxide film is (200) followed by (211) and are measured by Θ/2Θ (theta/2theta) x-ray diffraction, wherein the crystal orientation of (200) followed by (211) provides the Surface height root mean square of less than 15 nanometers and the sheet resistance in the range of 9.5 to 14.0 ohms/square, anda color suppression layer comprising a gradient layer of mixed metal oxides between the pyrolytic chemical vapor deposited fluorine doped tin oxide film and the substrate. 2. The coated glass according to claim 1 wherein the surface of the pyrolytic chemical vapor deposited fluorine doped tin oxide film has a coefficient of friction of less than 1.2. 3. The coated glass according to claim 1 wherein the substrate having the pyrolytic chemical vapor deposited fluorine doped tin oxide film is an anode of an organic light emitting diode device hereinafter referred to as an “OLED”, the OLED comprising an emissive layer and one or more light emitting layers between the anode and a cathode. 4. The coated glass according to claim 1 wherein the substrate having the pyrolytic chemical vapor deposited fluorine doped tin oxide film is an electrode for a solar cell device, the solar cell comprising a photovoltaic layer between the first electrode and a second electrode. 5. The coated glass according to claim 1 wherein the surface of the pyrolytic chemical vapor deposited fluorine doped tin oxide film has a coefficient of friction of less than 1.2.