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[미국특허] Method and apparatus for verifying two dimensional mark quality 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06F-019/00
  • G06K-005/00
출원번호 US-0270370 (2011-10-11)
등록번호 US-9465962 (2016-10-11)
발명자 / 주소
  • Nadabar, Sateesha
  • Gopalakrishnan, Venkat K.
  • Gerst, III, Carl W.
출원인 / 주소
  • COGNEX CORPORATION
인용정보 피인용 횟수 : 0  인용 특허 : 159

초록

A method and system for applying a two dimensional mark on a first surface of a component and assessing mark quality, the method comprising the steps of positioning a component with a first surface at a first station, applying a two dimensional mark to the first surface at the first station wherein

대표청구항

1. A system for applying a two dimensional mark on a first surface of a first component and assessing a quality of the two dimensional mark, the system comprising: a two dimensional mark applier positioned proximate a first space for applying the two dimensional mark to the first surface of the firs

이 특허에 인용된 특허 (159) 인용/피인용 타임라인 분석

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