초록

A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

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1. A pellicle module constructed and arranged for an EUV reticle, the pellicle module comprising: a pellicle frame, configured and arranged to hold a pellicle at a fixed distance from the EUV reticle; andwherein the pellicle comprises a layer of graphene. 2. The pellicle according to claim 1, wherei

1. A pellicle module constructed and arranged for an EUV reticle, the pellicle module comprising: a pellicle frame, configured and arranged to hold a pellicle at a fixed distance from the EUV reticle; andwherein the pellicle comprises a layer of graphene. 2. The pellicle according to claim 1, wherein the layer of graphene is formed from a single atomic layer of carbon. 3. The pellicle according to claim 1, wherein the pellicle comprises a plurality of graphene layers. 4. The pellicle according to claim 1, wherein the pellicle comprises graphene flakes. 5. The pellicle according to claim 1, wherein the pellicle comprises a grid to support the graphene. 6. The pellicle according to claim 1, wherein the pellicle does not comprise a grid. 7. The pellicle according to claim 1, wherein the pellicle is doped. 8. The pellicle according to claim 1, wherein the pellicle comprises a support member configured to be removable from a lithographic apparatus and/or the reticle. 9. The pellicle according claim 1, wherein the pellicle comprises alternating layers of graphene and supporting material. 10. The pellicle according to claim 1, wherein the graphene is configured to function as an anti-diffusion barrier. 11. The pellicle according to claim 1, wherein the graphene comprises graphene derivatives. 12. The pellicle according to claim 11, wherein the graphene derivatives are selected from the group consisting of: graphane, graphene fluoride, graphene bromide, graphene chloride and graphene iodide. 13. A lithographic apparatus comprising: a radiation source configured to produce a radiation beam and a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern to form a patterned radiation beam; wherein the support is provided with a pellicle comprising a layer of graphene.