초록 ▼

Certain example embodiments of this invention relate to insulating glass (IG) units including three substantially parallel spaced apart glass substrates, wherein at least two of the surfaces include low-emissivity (low-E) coatings and at least some of the non-low E coated surfaces have antireflectiv

Certain example embodiments of this invention relate to insulating glass (IG) units including three substantially parallel spaced apart glass substrates, wherein at least two of the surfaces include low-emissivity (low-E) coatings and at least some of the non-low E coated surfaces have antireflective (AR) coatings disposed thereon. In certain example embodiments, low-E coatings are provided on the second and fifth surfaces of the IG unit, and each internal surface of the IG unit that does not support a low-E coating does support an AR coating. Additional AR coatings may be provided on one or both of the outermost surfaces in certain example embodiments. In some cases, the center substrate need not be heat treated because of the reduced absorption enabled by providing the low-E coatings on the two outermost substrates, as well as the reduced heat accumulation in the center lite itself and in the two adjacent spacers.

대표청구항 ▼

1. An insulating glass (IG) unit, comprising: first, second, and third substantially parallel spaced apart glass substrates, the first substrate being an outermost substrate and the third substrate being an innermost substrate;wherein the second glass substrate is not thermally tempered, but the fir

1. An insulating glass (IG) unit, comprising: first, second, and third substantially parallel spaced apart glass substrates, the first substrate being an outermost substrate and the third substrate being an innermost substrate;wherein the second glass substrate is not thermally tempered, but the first and third glass substrates are thermally tempered;a first spacer system disposed around peripheral edges of the first and second substrates, a first cavity being defined between the first and second substrates;a second spacer system disposed around peripheral edges of the second and third substrates, a second cavity being defined between the second and third substrates;first and second low-emissivity (low-E) coatings disposed on interior surfaces of the first and third substrates respectively such that the first and second low-E coatings face one another, the first and second low-E coatings being heat treatable and having a delta E* value of less than 2.5; andfirst and second antireflective coatings disposed on opposing major surfaces of the second substrate,wherein each said low-E coating comprises, in order moving away from the substrate on which it is disposed: a layer comprising titanium oxide,a layer comprising zinc oxide,an infrared reflecting layer comprising silver,a layer comprising a metal, oxide, or sub-oxide of Ni and/or Cr,a layer comprising tin oxide, anda layer comprising silicon nitride, andwherein the IG unit has a visible transmission of at least about 70%, a U-value of less than or equal to about 0.80, and a g-value of at least about 60. 2. The IG unit of claim 1, wherein the first and/or second cavity(ies) include(s) Ar, Kr, or SF6 gas. 3. The IG unit of claim 1, wherein each said substrate is 2-6 mm thick. 4. The IG unit of claim 1, wherein the first and second substrates are spaced apart from one another by 10-18 mm, and wherein the second and third substrates are spaced apart from one another by 10-18 mm. 5. The IG unit of claim 1, further comprising a third AR coating disposed on an outermost surface of the first substrate. 6. The IG unit of claim 5, further comprising a fourth AR coating disposed on an outermost surface of the third substrate. 7. The IG unit of claim 1, wherein the normal emissivity of the IG unit is between about 6.0 and 8.5. 8. The IG unit of claim 1, wherein the first and second low-E coatings have a delta E* value of less than 2. 9. The IG unit of claim 1, wherein each said low-E coating further comprises a layer comprising silicon nitride between the substrate on which it is disposed and the layer comprising titanium oxide. 10. The IG unit of claim 9, wherein each said low-E coating further comprises, as its outermost layer, a layer comprising zirconium oxide. 11. The IG unit of claim 10, wherein each layer comprising zirconium oxide is 10-80 angstroms thick. 12. The IG unit of claim 1, wherein each of the first and second antireflective coatings is a four-layer sputter-deposited coating. 13. The IG unit of claim 12, wherein: each of the first and second antireflective coatings comprises, in order moving away from the second substrate, a stress adjusting layer, a medium index of refraction layer, a high index of refraction layer, and a low index of refraction layer;each of the stress adjusting layer, the medium index of refraction layer, and the low index of refraction layer comprise an oxide of silicon; andthe stress adjusting layer in each of the first and second antireflective coatings has an index of refraction that substantially matches the second glass substrate and has a composition and thickness sufficient to ensure, for the respective antireflective coating, a net stress that is compressive. 14. The IG unit of claim 13, wherein the medium index of refraction layer comprises silicon oxynitride. 15. An insulating glass (IG) unit, comprising; first, second, and third substantially parallel spaced apart glass substrates, the first substrate being an outermost substrate and the third substrate being an innermost substrate;wherein the second glass substrate is not thermally tempered, but the first and third glass substrates are thermally tempered;first and second low-emissivity (low-E) coatings disposed on interior surfaces of the first and third substrates respectively such that the first and second low-E coatings face one another, each said low-E coating including at least one Ag-based infrared (IR) reflecting layer sandwiched between one or more dielectric layers, the first and second low-E coatings being heat treatable and having a delta E* value of less than 2.5; andfirst and second antireflective coatings disposed on opposing major surfaces of the second substrate,wherein the IG unit has a visible transmission of at least about 70%, a U-value of less than or equal to about 0.80, and a g-value of at least about 60. 16. The IG unit of claim 13, wherein each said substrate is 2-6 mm thick. 17. The IG unit of claim 15, wherein the first and second substrates are spaced apart from one another by 10-18 mm, and wherein the second and third substrates are spaced apart from one another by 10-18 mm. 18. The IG unit of claim 15, further comprising a third AR coating disposed on an outermost surface of the first substrate. 19. The IG unit of claim 15, further comprising a fourth AR coating disposed on an outermost surface of the third substrate. 20. The IG unit of claim 15, wherein the normal emissivity of the IG unit is between about 6.0 and 8.5. 21. The IG unit of claim 15, wherein the first and second low-E coatings have a delta E* value of less than 2. 22. The IG unit of claim 15, wherein each said low-E coating comprises, in order moving away from the substrate on which it is disposed: a first layer comprising titanium oxide,a first layer comprising zinc oxide,an infrared reflecting layer comprising silver,a layer comprising Ni and/or Cr,a layer comprising tin oxide, anda layer comprising silicon nitride. 23. The IG unit of claim 22, wherein each said low-E coating further comprises a second layer comprising titanium oxide and a second layer comprising zinc oxide on the second layer comprising titanium oxide, the second layer comprising titanium oxide and the second layer comprising zinc oxide being located between the first layer comprising zinc oxide and the infrared reflecting layer in the respective low-E coating. 24. The IG unit of claim 22, wherein the infrared reflecting layer comprising silver in each said low-E coating 65-100 angstroms thick. 25. The IG unit of claim 23, wherein each said low-E coating further comprises a layer comprising silicon nitride between the substrate on which it is disposed and the first layer comprising titanium oxide. 26. The IG unit of claim 25, wherein each said low-E coating further comprises, as its outermost layer, a layer comprising zirconium oxide. 27. The IG unit of claim 26, wherein each layer comprising zirconium oxide is 10-80 angstroms thick. 28. The IG unit of claim 23, wherein each of the first and second antireflective coatings is a four-layer sputter-deposited coating. 29. The IG unit of claim 28, wherein: each of the first and second antireflective coatings comprises, in order moving away from the second substrate, a stress adjusting layer, a medium index of refraction layer, a high index of refraction layer, and a low index of refraction layer;each of the stress adjusting layer, the medium index of refraction layer, and the low index of refraction layer comprise an oxide of silicon; andthe stress adjusting layer in each of the first and second antireflective coatings has an index of refraction that substantially matches the second glass substrate and has a composition and thickness sufficient to ensure, for the respective antireflective coating, a net stress that is compressive. 30. The IG unit of claim 29, wherein the medium index of refraction layer comprises silicon oxynitride. 31. The IG unit of claim 15, further comprising a fourth substrate, wherein the first substrate is laminated to the fourth substrate via a polymer-based interlayer.