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[미국특허] Cell phone having a monolithically integrated multi-sensor device on a semiconductor substrate and method therefor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B81B-007/02
  • H01L-027/14
  • H01L-027/22
  • H01L-027/16
  • H05K-007/02
  • H01L-041/113
출원번호 US-0207433 (2014-03-12)
등록번호 US-9580302 (2017-02-28)
발명자 / 주소
  • Gogoi, Bishnu Prasanna
출원인 / 주소
  • VERSANA MICRO INC.
인용정보 피인용 횟수 : 0  인용 특허 : 41

초록

A cell phone is provided having multiple sensors configured to detect and measure different parameters of interest. The cell phone includes at least one monolithic integrated multi-sensor (MIMS) device. The MIMS device comprises at least two sensors of different types formed on a common semiconducto

대표청구항

1. A cell phone where the cell phone is configured to couple to a wireless network, where the cell phone comprises: a first integrated circuit comprising: a first sensor configured to measure a first parameter;a second sensor configured to measure a second parameter; anda third sensor configured to

이 특허에 인용된 특허 (41) 인용/피인용 타임라인 분석

  1. Savolainen, Tapio; Koivumaa, Veikko Matti; Miettinen, Michael; Ahlström, Mikko Tuomas; Martikka, Mikko; Kemetter, Markus; Mattila, Ville Juhana; Lindman, Erik, Calibration method and apparatus for a mobile device.
  2. Liu, Lianjun; Karlin, Lisa H.; Magnus, Alan J., Electrical coupling of wafer structures.
  3. Diamond, Brett M.; Laermer, Franz; Doller, Andrew J.; Daley, Michael J.; Stetson, Phillip Sean; Muza, John M., Epitaxial silicon CMOS-MEMS microphones and method for manufacturing.
  4. Fukuda, Hiroshi; Hanaoka, Yuko; Fujimori, Tsukasa, Inertial sensor and manufacturing method of the same.
  5. Huang, Kegang; Lim, Martin; Nasiri, Steven S., Integrated MEMS devices with controlled pressure environments by means of enclosed volumes.
  6. Faris, Sadeg M., MEMS and method of manufacturing MEMS.
  7. Liu, Lianjun; Miller, Melvy F., MEMS capacitive device and method of forming same.
  8. Zoellin, Jochen; Ehrenpfordt, Ricardo; Scholz, Ulrike, MEMS component having a diaphragm structure.
  9. Schlarmann, Mark E.; Lin, Yizhen, MEMS device assembly and method of packaging same.
  10. Liu, Lianjun; Mitchell, Douglas G., MEMS microphone with cavity and method therefor.
  11. Lin, Yizhen; Park, Woo Tae; Schlarmann, Mark E.; Desai, Hemant D., MEMS sensor device with multi-stimulus sensing.
  12. Sachs, David; Shi, Jianbo; Nasiri, Steven S.; Moturi, Kishore, Method and apparatus for producing a sharp image from a handheld device containing a gyroscope.
  13. Rudhard, Joachim; Mueller, Thorsten, Method for capping a MEMS wafer and MEMS wafer.
  14. Gunturu, Veera M.; Kamaraju, Shivcharan V.; Karlin, Lisa H., Method for forming a capped micro-electro-mechanical system (MEMS) device.
  15. Kramer, Torsten; Knese, Kathrin; Benzel, Hubert; Kraft, Karl-Heinz; Armbruster, Simon, Method for manufacturing capped MEMS components.
  16. Hayes, Scott M.; Wright, Jason R., Method for packaging an electronic device assembly having a capped device interconnect.
  17. Gogoi, Bishnu P.; Roop, Raymond M.; Desai, Hemant D., Method of forming a seal for a semiconductor device.
  18. Perruchot, Francois; Liu, Lianjun; Pacheco, Sergio; Defay, Emmanuel; Rey, Patrice, Method of forming an electromechanical transducer device.
  19. Nasiri, Steven S.; Flannery, Jr., Anthony Francis, Method of making an X-Y axis dual-mass tuning fork gyroscope with vertically integrated electronics and wafer-scale hermetic packaging.
  20. Hooper, Stephen R.; Daniels, Dwight L.; MacDonald, James D.; McDonald, William G.; Xia, Chunlin C., Methods for fabricating sensor device package using a sealing structure.
  21. Ramiah, Chandrasekaram; Mitchell, Douglas G.; Petras, Michael F.; Sanders, Paul W., Methods for forming through-substrate conductor filled vias, and electronic assemblies formed using such methods.
  22. Merassi, Angelo; Zerbini, Sarah; Lasalandra, Ernesto; Vigna, Benedetto, Microelectromechanical inertial sensor, in particular for free-fall detection applications.
  23. Cohn,Michael B.; Kung,Joseph T., Microelectromechanical systems using thermocompression bonding.
  24. Haronian Dan,ILX ; MacDonald Noel C., Microelectromechanics-based frequency signature sensor.
  25. Lo, Chiung C.; Seeger, Joseph; Lim, Martin, Micromachined magnetic field sensors.
  26. Wu,Guanghua; Mirza,Amir Raza, Micromechanical device with thinned cantilever structure and related methods.
  27. Nasiri, Steven S.; Sachs, David, Motion sensing and processing on mobile devices.
  28. Nasiri,Steven S.; Seeger,Joseph, Multiple axis accelerometer.
  29. Gogoi,Bishnu P., Multiple microelectromechanical (MEM) devices formed on a single substrate and sealed at different pressures and method therefor.
  30. Combi,Chantal; Baldo,Lorenzo; Faralli,Dino; Villa,Flavio Francesco, Process for manufacturing a triaxial piezoresistive accelerometer and relative pressure-monitoring device.
  31. Ishigami,Atsushi; Sakai,Kouji; Meshii,Ryosuke, Sensor device.
  32. Ploechinger, Heinz, Sensors based on density differences in fluids and method for operating and for manufacturing said sensors to detect movement, acceleration, position, fluid-properties.
  33. Nunan, Thomas Kieran; Brosnihan, Timothy J., Single crystal silicon sensor with additional layer and method of producing the same.
  34. Pressel, Klaus; Beer, Gottfried, Stacked semiconductor chips.
  35. Bruel Michel,FRX, Structure having cavities and process for producing such a structure.
  36. Appleby, Michael P.; Randolph, William T.; Klinger, Jill E., Systems for large area micro mechanical systems.
  37. Gogoi, Bishnu Prasanna; Yazdi, Navid, Three-axis inertial sensor and method of forming.
  38. Nasiri,Steven S.; Flannery, Jr.,Anthony Francis, Vertical integration of a MEMS structure with electronics in a hermetically sealed cavity.
  39. Lin, Yizhen; Miller, Todd F.; Park, Woo Tae, Vertically integrated MEMS acceleration transducer.
  40. Miller, Todd F.; Lin, Yizhen; Monk, David J.; Park, Woo Tae, Vertically integrated MEMS sensor device with multi-stimulus sensing.
  41. Yu, Lianzhong, Vibrating beam accelerometer two-wafer fabrication process.

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