[특허]Radial counterflow shear electrolysis

McCutchen Co.

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특허 상세정보

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Radial counterflow shear electrolysis

특허상세정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C25B-001/00 C25B-001/02 C25B-001/13 C25B-001/24 C25B-009/12 C25D-017/00 C25D-017/10 C25D-011/02
출원번호	US-0459153 (2014-08-13)
등록번호	US-9611556 (2017-04-04)
발명자 / 주소	McCutchen, Wilmot H. McCutchen, David J.
출원인 / 주소	McCutchen Co.
대리인 / 주소	Marger Johnson
인용정보	피인용 횟수 : 0 인용 특허 : 121

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Coaxial disk armatures, counter-rotating through an axial magnetic field, act as electrolysis electrodes and high shear centrifugal impellers for an axial feed. The feed can be carbon dioxide, water, methane, or other substances requiring electrolysis. Carbon dioxide and water can be processed into syngas and ozone continuously, enabling carbon and oxygen recycling at power plants. Within the space between the counter-rotating disk electrodes, a shear layer comprising a fractal tree network of radial vortices provides sink flow conduits for light fractions, such as syngas, radially inward while the heavy fractions, such as ozone and elemental carbon flow radially outward in boundary layers against the disks and beyond the disk periphery, where they are recovered as valuable products, such as carbon nanotubes.

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1. A steady, flow-through method of shear electrolysis, comprising: receiving axially injected gas feed into a workspace defined between counter-rotating, coaxial, oppositely-charged, approximately disk-shaped impeller/electrodes;advecting the gas feed radially outward through the workspace while simultaneously shearing the gas feed between the impeller/electrodes to form a shear gas feed layer in the workspace;generating gaseous turbulence in the shear gas feed layer;causing mechanical stress from the turbulence on molecular bonds of the gas feed in the shear gas feed layer;causing electrical stress on the molecular bonds of the gas feed in the shear gas feed layer from the counter-rotation of the oppositely-charged, disk-shaped impeller/electrodes;causing gaseous light fraction products to separate from the shear gas feed layer radially inward toward an axis of rotation of the impeller/electrodes resulting from at least one of the mechanical and electrical stress applied to the shear gas feed layer;axially extracting the gaseous separated light fraction products from the workspace;causing heavy fraction products to separate from the shear gas feed layer toward a periphery of the workspace resulting from at least one of the mechanical and electrical stress applied to the shear gas feed layer; andextracting the separated heavy fraction products from the periphery of the workspace. 2. The method of claim 1, wherein the gas feed includes carbon dioxide and the light fraction products include carbon monoxide and hydrogen. 3. The method of claim 1, wherein the gas feed includes water vapor, the light fraction products include hydrogen, and the heavy fraction products include oxygen. 4. The method of claim 1, wherein the heavy fraction product includes ozone. 5. The method of claim 1, wherein the heavy fraction products include nanostructures of at least one of carbon, boron nitride, gold, metal dichalcogenides (MX2 (M=Mo, W, Nb, Ta, Hf, Ti, Zr, Re; X=S, Se)), metal oxides, and metal dihalides. 6. The method of claim 1, wherein the gas feed includes a carbonaceous gas. 7. The method of claim 1, wherein the gas feed includes at least one of hydrogen sulfide (H2S), ammonia (NH4), mercaptans, and chlorofluorocarbons (CFCs). 8. The method of claim 1, wherein a workspace-facing surface of both impeller/electrodes is rippled, and wherein generating the gaseous turbulence in the shear gas feed layer is caused by the rippled surfaces of the impeller/electrodes. 9. The method of claim 1, further comprising: injecting the gaseous separated light fraction products as a second gas feed into a second workspace defined between second counter-rotating, coaxial, oppositely-charged, approximately disk-shaped impeller/electrodes;advecting the second gas feed radially outward through the second workspace while simultaneously shearing the second gas feed between the second impeller/electrodes to form a second shear gas feed layer in the second workspace;generating secondary gaseous turbulence in the second shear gas feed layer;causing secondary mechanical stress from the secondary gaseous turbulence on molecular bonds of the second gas feed in the second shear gas feed layer;causing secondary electrical stress on the molecular bonds of the second gas feed in the second shear gas feed layer from the counter-rotation of the second oppositely-charged, disk-shaped impeller/electrodes;causing secondary gaseous light fraction products to separate from the second shear gas feed layer radially inward toward a second axis of rotation of the second impeller/electrodes resulting from at least one of the mechanical and electrical stress applied to the second shear gas feed layer;axially extracting the secondary gaseous separated light fraction products from the second workspace;causing secondary heavy fraction products to separate from the second shear gas feed layer toward a periphery of the second workspace resulting from at least one of the mechanical and electrical stress applied to the second shear gas feed layer; andextracting the separated secondary heavy fraction products from the periphery of the second workspace. 10. A method of forming carbon nanostructures, comprising: receiving axially injected carbon dioxide gas feed into a workspace defined between counter-rotating, coaxial, oppositely-charged, approximately disk-shaped impeller/electrodes, the workspace decreasing in separation extending toward a pinched periphery of the impeller/electrodes;advecting the carbon dioxide gas feed radially outward through the workspace toward the periphery of the impeller/electrodes while simultaneously counter-rotating the impeller/electrodes through a magnetic field;causing the carbon dioxide gas feed to shear between the impeller/electrodes from the counter-rotation of the impeller/electrodes;forming a shear layer of carbon dioxide gas feed in the workspace caused by the carbon dioxide gas feed shearing;generating gaseous turbulence of the carbon dioxide gas feed in the shear layer;causing separation of the carbon dioxide gas feed in the shear layer into gaseous light fraction products and heavy fraction products;causing the separated gaseous light fraction products to move radially inward toward an axis of rotation of the impeller/electrodes;causing the separated heavy fraction products to move toward the pinched periphery of the workspace;axially extracting the gaseous light fraction products from the workspace;forming carbon nanostructures from the heavy fraction products in the shear layer within the workspace in a direction toward the pinched periphery between the impeller/electrodes. 11. A method of continuous shear electrolysis of a gas feed, comprising the simultaneous steps of: (a) axially injecting the gas feed into a workspace between counter-rotating coaxial oppositely charged approximately disk shaped impeller/electrodes;(b) advecting the gas feed radially outward through the workspace while simultaneously shearing the feed between the impeller/electrodes to form a shear layer in the workspace;(c) advecting gaseous light fraction products of electrolysis radially inward toward the axis of rotation of the impeller/electrodes through cores of radial vortices in the shear layer;(d) axially extracting the gaseous light fraction products of electrolysis from the workspace; and(e) peripherally extracting heavy fraction products of electrolysis from the workspace. 12. The method of claim 11, wherein the gas feed is a mixture of carbon dioxide and water, and the gaseous light fraction products of electrolysis include carbon monoxide and hydrogen. 13. The method of claim 11, wherein the gas feed is water vapor, the gaseous light fraction product of electrolysis is hydrogen, and the heavy fraction product of electrolysis is oxygen. 14. The method of claim 11, wherein the heavy fraction product of electrolysis includes ozone. 15. The method of claim 11, wherein the heavy fraction products of electrolysis include nanostructures of materials selected from the group consisting of carbon, boron nitride, gold, metal dichalcogenides (MX2 (M=Mo, W, Nb, Ta, Hf, Ti, Zr, Re; X=S, Se)), metal oxides, and metal dihalides. 16. The method of claim 11, wherein the gas feed comprises carbonaceous compounds selected from the group consisting of carbon monoxide (CO), methane (CH4), alkanes, carbon dioxide (CO2), and volatile organic compounds (VOCs). 17. The method of claim 11, wherein the gas feed comprises compounds selected from the group consisting of hydrogen sulfide (H2S), ammonia (NH4), mercaptans, and chlorofluorocarbons (CFCs). 18. The method of claim 11, wherein the disk impeller/electrodes have a rippled surface comprising peaks and valleys, the counter-rotation of the disk impeller/electrodes causing the peaks on an upper impeller/electrode to periodically oppose peaks on a lower impeller/electrode thereby causing a pulsed electrical discharge from the opposed peaks, the pulsed electrical discharge causing electrolysis in the feed fluid in the workspace.

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Radial counterflow shear electrolysis

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