[미국특허]
Environmental system including vacuum scavenge for an immersion lithography apparatus
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G03B-027/52
G03B-027/42
G03F-007/20
출원번호
US-0955909
(2015-12-01)
등록번호
US-9658537
(2017-05-23)
발명자
/ 주소
Hazelton, Andrew J.
Sogard, Michael
출원인 / 주소
NIKON CORPORATION
대리인 / 주소
Oliff PLC
인용정보
피인용 횟수 :
0인용 특허 :
64
초록▼
A liquid immersion lithography apparatus includes an optical assembly having a last optical element, a first outlet facing downward, via which an immersion liquid is released, a first inlet via which the immersion liquid is drawn, and a containment member arranged to surround a last portion of the o
A liquid immersion lithography apparatus includes an optical assembly having a last optical element, a first outlet facing downward, via which an immersion liquid is released, a first inlet via which the immersion liquid is drawn, and a containment member arranged to surround a last portion of the optical assembly. The containment member has (i) a second inlet facing downward, which is arranged radially-outwardly from the first outlet with respect to a space under the last optical element and via which fluid is removed from a gap formed under the containment member, and (ii) a second outlet facing downward, via which gas is supplied to the gap formed under the containment member, the second outlet being arranged radially-outwardly from the second inlet with respect to the space.
대표청구항▼
1. A liquid immersion lithography apparatus comprising: an optical assembly having a last optical element;a first outlet facing downward, via which an immersion liquid is released;a first inlet via which the immersion liquid is drawn; anda containment member arranged to surround a last portion of th
1. A liquid immersion lithography apparatus comprising: an optical assembly having a last optical element;a first outlet facing downward, via which an immersion liquid is released;a first inlet via which the immersion liquid is drawn; anda containment member arranged to surround a last portion of the optical assembly, whereinthe containment member has (i) a second inlet facing downward, which is arranged radially-outwardly from the first outlet with respect to a space under the last optical element and via which fluid is removed from a gap formed under the containment member, and (ii) a second outlet facing downward, via which gas is supplied to the gap formed under the containment member, the second outlet being arranged radially-outwardly from the second inlet with respect to the space. 2. The apparatus according to claim 1, wherein the first inlet is arranged above the second inlet. 3. The apparatus according to claim 2, wherein the first inlet is arranged above the second outlet. 4. The apparatus according to claim 1, wherein the first inlet is arranged above a lower portion of the containment member. 5. The apparatus according to claim 4, wherein the second inlet is arranged at the lower portion of the containment member. 6. The apparatus according to claim 5, wherein the second outlet is arranged at the lower portion of the containment member. 7. The apparatus according to claim 1, further comprising a third inlet arranged radially-outwardly from the second inlet with respect to the space. 8. The apparatus according to claim 7, wherein the third inlet is arranged radially-outwardly from the second outlet with respect to the space. 9. The apparatus according to claim 7, wherein the third inlet is provided at a lower portion the containment member to remove fluid from the gap formed under the lower portion of the containment member. 10. The apparatus according to claim 2, further comprising a third inlet arranged radially-outwardly from the second inlet with respect to the space. 11. The apparatus according to claim 10, wherein the third inlet is arranged radially-outwardly from the second outlet with respect to the space. 12. The apparatus according to claim 10, wherein the third inlet is provided at a lower portion the containment member to remove fluid from the gap formed under the lower portion of the containment member. 13. The apparatus according to claim 1, wherein during exposure of a substrate located under the optical assembly and the containment member, a distance between the containment member and the substrate is smaller than a distance between the last optical element and the substrate. 14. The apparatus according to claim 13, wherein the containment member has an inner portion which is arranged such that the inner portion surrounds the space under the last optical element, the inner portion extending upwardly from a lower portion and the inner portion coming into contact with the liquid in the space under the last optical element. 15. The apparatus according to claim 1, further comprising: a support with which the containment member is supported by a frame. 16. The apparatus according to claim 15, wherein the frame supports the optical assembly. 17. The apparatus according to claim 15, wherein the support includes an actuator by which the containment member is moved. 18. The apparatus according to claim 17, wherein the support includes a measurement system that monitors a position of the containment member. 19. The apparatus according to claim 18, wherein the containment member is moved by the actuator based on information obtained by the measurement system. 20. The apparatus according to claim 1, further comprising a stage on which a substrate is held, wherein the stage has a stage surface which is arranged such that a surface of the held substrate and the stage surface are in a same plane. 21. A device manufacturing method comprising: exposing a substrate using the lithography apparatus according to claim 1; anddeveloping the exposed substrate. 22. A liquid immersion lithography method comprising: surrounding a last portion of an optical assembly, which has a last optical element, with a containment member;releasing an immersion liquid from a first outlet facing downward;drawing the immersion liquid through a first inlet;removing fluid from a gap formed under the containment member through a second inlet of the containment member, the second inlet facing downward and arranged radially-outwardly from the first outlet with respect to a space under the last optical element; andsupplying gas to the gap formed under the containment member through a second outlet of the containment member, the second outlet facing downward and being arranged radially-outwardly from the second inlet with respect to the space. 23. The apparatus according to claim 1, wherein the first outlet is arranged above the second inlet. 24. The apparatus according to claim 1, wherein the first outlet is arranged above the second outlet.
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