초록 ▼

A broil baffle for an oven may be provided. The oven may include a broil burner configured to distribute heat. The baffle may be positioned such that the broil burner distributes heat toward the baffle. The baffle may include a plurality of dimples configured to disperse infrared radiation from the

A broil baffle for an oven may be provided. The oven may include a broil burner configured to distribute heat. The baffle may be positioned such that the broil burner distributes heat toward the baffle. The baffle may include a plurality of dimples configured to disperse infrared radiation from the distributed heat in multiple directions away from the baffle toward a broiling surface of the oven.

대표청구항 ▼

1. A broil baffle for an oven, the oven comprising a ceiling, a broil burner configured to distribute heat, and a broiling surface, the broil baffle being positioned, when in use, such that the broil burner distributes heat toward the broil baffle, the broil baffle comprising: a first side facing th

1. A broil baffle for an oven, the oven comprising a ceiling, a broil burner configured to distribute heat, and a broiling surface, the broil baffle being positioned, when in use, such that the broil burner distributes heat toward the broil baffle, the broil baffle comprising: a first side facing the ceiling;a second side opposite the first side and facing the broiling surface; anda plurality of dimples, each comprising a depression in the first side and a protruding closed peak on the second side in a location corresponding to the location of the depression, said plurality of dimples being configured to disperse infrared radiation from the distributed heat in multiple directions away from the broil baffle toward the broiling surface. 2. The broil baffle of claim 1, wherein the protruding peaks of said dimples extend away from the ceiling toward the broiling surface. 3. The broil baffle of claim 1, wherein the dimples comprise a plurality of first dimples and a plurality of second dimples, the first dimples having a location on the broil baffle that is closer to the broil burner than a location of the second dimples, the second dimples having a size that is greater than a size of the first dimples. 4. The broil baffle of claim 3, wherein the broil baffle, at the location of the first dimples, is slanted toward the broil burner. 5. The broil baffle of claim 3, wherein the broil baffle, at the location of the second dimples, occupies a plane that is substantially parallel to the broil burner. 6. The broil baffle of claim 1, wherein the broil baffle is disposed above the broil burner. 7. The broil baffle of claim 1, wherein the dimples are configured such that ripples are created in a flame emitted by the broil burner to disperse the infrared radiation in multiple directions away from the broil baffle toward the broiling surface. 8. An oven, comprising: a ceiling a broiling surface configured to support food for broiling;a broil burner configured to distribute heat; anda baffle positioned such that the broil burner distributes heat toward the baffle, the baffle comprising:a first side facing the ceiling;a second side opposite the first side and facing the broiling surface; anda plurality of dimples, each comprising a depression in the first side and a protruding closed peak on the second side in a location corresponding to the location of the depression, said plurality of dimples being configured to disperse infrared radiation from the distributed heat in multiple directions away from the baffle toward the broiling surface to broil the food. 9. The oven of claim 8, further comprising: the ceiling disposed above the broiling surface, the broil burner, and the baffle, whereinthe protruding peaks of said dimples extend away from the ceiling toward the broiling surface. 10. The oven of claim 8, wherein the dimples comprise a plurality of first dimples and a plurality of second dimples, the first dimples having a location on the baffle that is closer to the broil burner than a location of the second dimples, the second dimples having a size that is greater than a size of the first dimples. 11. The oven of claim 10, wherein the baffle, at the location of the first dimples, is slanted toward the broil burner. 12. The oven of claim 10, wherein the baffle, at the location of the second dimples, occupies a plane that is substantially parallel to the broil burner. 13. The oven of claim 8, wherein the dimples are configured such that ripples are created in a flame emitted by the broil burner to disperse the infrared radiation in multiple directions away from the baffle toward the broiling surface.