High energy beam diffraction material treatment system
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G21K-001/06
G21K-001/00
G01T-003/00
G21K-001/093
A61N-005/10
A61N-005/06
출원번호
US-0167737
(2016-05-27)
등록번호
US-9711252
(2017-07-18)
발명자
/ 주소
Corning, Michelle
출원인 / 주소
Corning, Michelle
대리인 / 주소
Invention To Patent Services
인용정보
피인용 횟수 :
1인용 특허 :
19
초록▼
A coherent beam treatment system produces a first and second energy beam that are coherent at a treatment location. An energy beam includes a neutron beam, a proton beam, an electron beam, acoustic waves, a laser and x-ray. An energy beam may be defined by a wave, such as a sinusoidal wave having a
A coherent beam treatment system produces a first and second energy beam that are coherent at a treatment location. An energy beam includes a neutron beam, a proton beam, an electron beam, acoustic waves, a laser and x-ray. An energy beam may be defined by a wave, such as a sinusoidal wave having a frequency and amplitude. A control system may produce a first and second beam that have coherence at a treatment location. Coherence is a location where two beams have matching wave profiles. A beam may be defined by a simple sinusoidal equation wherein the frequency and amplitude are constant as a function of time. A beam may be defined by a complex wave equation, wherein the frequency or amplitude change as a function of time. A control system may modulate one or more of the beam equations to change a location of coherence.
대표청구항▼
1. A material treatment system comprising: a) a first energy beam having a first frequency and a first direction;b) a second energy beam having a second frequency and a second direction;c) a control system comprising a beam regulator configured to adjust the frequency of said first beam to create a
1. A material treatment system comprising: a) a first energy beam having a first frequency and a first direction;b) a second energy beam having a second frequency and a second direction;c) a control system comprising a beam regulator configured to adjust the frequency of said first beam to create a first and second beam coherence at a treatment location. 2. The material treatment system of claim 1, wherein the first frequency is substantially different than the second frequency at the treatment location. 3. The material treatment system of claim 1, wherein the first frequency is at least twice the second frequency at the treatment location. 4. The material treatment system of claim 1, wherein the first beam has a first amplitude at the treatment location and the second beam has a second amplitude at the treatment location and wherein the first amplitude and second amplitude are substantially different at the treatment location. 5. The material treatment system of claim 1, where the first beam is a complex wave having a first frequency that is defined by a complex equation, wherein the first frequency changes as a function of time. 6. The material treatment system of claim 5, wherein the control system utilizes a Fourier transform to control said first beam emitted by the beam regulator; wherein said first frequency changes as a function of time. 7. The material treatment system of claim 5, where the second beam is a complex wave having a second frequency that is defined by a complex equation, wherein said second frequency changes as a function of time. 8. The material treatment system of claim 1, where the first beam is a complex wave having a first amplitude that is defined by a complex equation, wherein said first amplitude changes as a function of time. 9. The material treatment system of claim 8, where the second beam is a complex wave having a second amplitude that is defined by a complex equation, wherein said second amplitude changes as a function of time. 10. The material treatment system of claim 1, where the first beam is a complex wave having a first amplitude and a first frequency that are defined by a complex equation, wherein said first amplitude and first frequency change as a function of time. 11. The material treatment system of claim 10, where the second beam is a complex wave having a second amplitude and a second frequency that are defined by a complex equation, wherein said second amplitude and second frequency change as a function of time. 12. The material treatment system of claim 11, wherein the control system includes a first material parameter input for a first material, and wherein the control system utilizes said material parameter input to control the first frequency of the first beam for transmission through said first material and controls the second frequency of the second beam for transmission though a second material type, and wherein the first and second materials are different. 13. The material treatment system of claim 1, wherein the first and second frequencies are adjusted by the control system to adjust a position of coherence; wherein a treatment location having a size is treated over substantially said size by adjustment of said position of coherence. 14. The material treatment system of claim 1, wherein the first energy beam and the second energy beams are proton beams. 15. The material treatment system of claim 1, wherein the first energy beam and the second energy beams are neutron beams. 16. The material treatment system of claim 1, wherein the first energy beam and the second energy beams are X-ray. 17. The material treatment system of claim 1, wherein the first energy beam and the second energy beams are lasers. 18. The material treatment system of claim 1, wherein the first energy beam and the second energy beams electron beams. 19. The material treatment system of claim 1, wherein the first energy beam and the second energy beams acoustic beams. 20. The material treatment system of claim 1, comprising: a) a first energy beam source configured to produce an input beam;b) a beam splitter configured to received said first energy beam and split said first energy beam into said first beam and said second beam. 21. The material treatment system of claim 20, wherein the beam slitter comprises a prism. 22. The material treatment system of claim 21, further comprising at least one mirror configured to direct one of the first beam or second beams to a treatment location. 23. The material treatment system of claim 20, wherein a beam regulator is configured to receive said first beam from the beam splitter and regulate a frequency of said first beam. 24. The material treatment system of claim 1, comprising: a) a first energy beam source configured to produce said first energy beam;b) a second energy beam source configured to produce said second energy beam. 25. The material treatment system of claim 24, wherein the first energy beam source and the second energy beam source are stationary. 26. The material treatment system of claim 24, wherein at least one of the first or second energy beam sources is configured to move to change a location of coherence. 27. The material treatment system of claim 1, wherein the one of said first and second energy beams is a neutron beam and wherein the material treatment system comprises a plurality of magnetic coils that extend around said neutron beam. 28. The material treatment system of claim 1, wherein the first and second energy beams are neutron beams, and wherein the material treatment system comprises a plurality of magnetic coils that extend around said first energy beam and a plurality of magnetic coils that extend around said second energy beam. 29. A method of treating material comprising the steps of: a) providing a material treatment system comprising: i) a first energy beam having a first frequency and a first direction;ii) a second energy beam having a second frequency and a second direction;iii) a beam regulator configured to control the frequency of the first energy beam;b) directing said first and second energy beams at a treatment location;c) adjust the frequency of said first beam to create first and second beam coherence at a treatment location; wherein the frequency of the first and second beam are substantially different. 30. The method of treating material of claim 29, wherein the beam regulator comprising a control system that utilizes a Fourier transform equation to produce first and second beam coherence at a treatment location. 31. The method of treating material of claim 29, wherein the material is tissue. 32. The method of treating material of claim 29, wherein the material is a tumor.
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