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The low pressure plasma system includes a treatment chamber which is pumped out in a first process step by means of a pump. In a second process step a gas supply valve is opened in order to achieve a defined gas composition in the treatment chamber at low pressure. In a third process step a plasma g

The low pressure plasma system includes a treatment chamber which is pumped out in a first process step by means of a pump. In a second process step a gas supply valve is opened in order to achieve a defined gas composition in the treatment chamber at low pressure. In a third process step a plasma generator is switched on in order to ignite a plasma in the treatment chamber. In a fourth process step a flushing valve can be opened in order to flush the treatment chamber. In a fifth process step the treatment chamber can be ventilated by way of a ventilation valve. The sequential switching element can be a rotary switch and include a zero switching position where the low pressure plasma system is off. The sequential switching element renders possible a simple embodiment of the low pressure plasma system and its intuitive operation.

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1. A low pressure plasma system comprises: a treatment chamber that can be at least in part evacuated, a gas supply valve, a plasma generator and a controller;wherein the controller comprises a vacuum electric circuit, a gas supply electric circuit and a plasma electric circuit;wherein the vacuum el

1. A low pressure plasma system comprises: a treatment chamber that can be at least in part evacuated, a gas supply valve, a plasma generator and a controller;wherein the controller comprises a vacuum electric circuit, a gas supply electric circuit and a plasma electric circuit;wherein the vacuum electric circuit controls a pump which can be connected to the low pressure plasma system and/or a pump valve of the low pressure plasma system;wherein the gas supply electric circuit controls the gas supply valve;wherein the plasma electric circuit controls the plasma generator;wherein the controller comprises a sequential switching element having switching positions that follow one another for setting process steps that follow one another;wherein the sequential switching element is embodied so as in each switching position to interrupt and to close respectively the vacuum electric circuit, the gas supply electric circuit and the plasma electric circuit by a plurality of switches that are electrically isolated from one another;wherein the sequential switching element comprises a first switching position in which the vacuum electric circuit is closed but the gas supply electric circuit and the plasma electric circuit are interrupted;wherein the sequential switching element comprises a second switching position in which the vacuum electric circuit and the gas supply electric circuit are closed but the plasma electric circuit is interrupted;wherein the sequential switching element comprises a third switching position in which the vacuum electric circuit, the gas supply electric circuit and the plasma electric circuit are closed;wherein the sequential switching element comprises in each case the plurality of switches for controlling the vacuum electric circuit the gas flow electric circuit and the plasma electric circuit, and the plurality of switches can be opened or closed one after the other; andwherein the sequential switching element is embodied so as in each switching position to close the plurality of switches of the sequential switching element, said plurality of switches being electrically isolated from one another. 2. The low pressure plasma system of claim 1, wherein the controller comprises a flushing process electric circuit having a flushing valve, wherein the sequential switching element is embodied so as to interrupt and to close the flushing process electric circuit, wherein the sequential switching element comprises a fourth switching position in which the vacuum electric circuit and the flushing process electric circuit are closed but the gas supply electric circuit and the plasma electric circuit are interrupted, wherein the flushing process electric circuit is interrupted in the first, second and third switching positions. 3. The low pressure plasma system of claim 1, wherein the controller comprises a ventilation process electric circuit having a ventilation valve, wherein the sequential switching element is embodied so as to interrupt and to close the ventilation process electric circuit, wherein the sequential switching element comprises a fifth switching position in which the ventilation process electric circuit is closed but the vacuum electric circuit, the gas supply electric circuit and the plasma electric circuit are interrupted, wherein the ventilation process electric circuit is interrupted in the first, second and third switching positions. 4. The low pressure plasma system of claim 1, wherein the controller comprises a pressure measuring electric circuit having a pressure measuring device, wherein the sequential switching element is embodied so as to interrupt and to close the pressure measuring electric circuit, wherein the pressure measuring electric circuit is closed in the first, second and third switching positions. 5. The low pressure plasma system of claim 4, wherein the pressure measuring device is embodied for the purpose of transmitting a first enable signal to the gas supply valve to enable the same and/or to the plasma generator to enable the same. 6. The low pressure plasma system of claim 1, wherein the controller comprises a timer electric circuit having a timer, wherein the sequential switching element is embodied so as to interrupt and to close the timer electric circuit, wherein the timer electric circuit is closed in the third switching position. 7. The low pressure plasma system of claim 6, wherein the timer is embodied for the purpose of transmitting a second enable signal to the plasma generator to enable the same. 8. The low pressure plasma system of claim 1, wherein the controller comprises a heating system electric circuit having a heating system, wherein the sequential switching element is embodied so as to interrupt and to close the heating system electric circuit, wherein the heating system electric circuit is closed in the third switching position. 9. The low pressure plasma system of claim 8, wherein the controller comprises a temperature measuring electric circuit having a temperature measuring element, wherein the sequential switching element is embodied so as to interrupt and to close the temperature measuring electric circuit, wherein the temperature measuring electric circuit is closed in the third switching position. 10. The low pressure plasma system of claim 1, wherein the controller comprises a power supply unit electric circuit having a power supply unit, wherein the sequential switching element is embodied so as to interrupt and to close the power supply unit electric circuit, wherein the power supply unit electric circuit is closed in the first, second and third switching positions. 11. The low pressure plasma system of claim 1, wherein the controller comprises a pump electric circuit having a pump power supply unit, wherein the sequential switching element is embodied so as to interrupt and to close the pump electric circuit, wherein the pump electric circuit is closed in the first, second and third switching positions. 12. The low pressure plasma system of claim 1, wherein the controller comprises a safety electric circuit having a safety switch being a door switch of the treatment chamber, wherein the sequential switching element is embodied so as to interrupt and to close the safety electric circuit, wherein the safety electric circuit is closed in the first, second and third switching positions. 13. The low pressure plasma system of claim 1, wherein the vacuum electric circuit, the gas supply electric circuit and/or the plasma electric circuit comprises a lamp being a light emitting diode for illustrating the respective process step. 14. The low pressure plasma system of claim 1, wherein the sequential switching element comprises a zero switching position in which all the electric circuits of the controller are interrupted. 15. The low pressure plasma system of claim 1, wherein the sequential switching element is embodied in the form of a rotary switch.