Refractory object, glass overflow forming block, and process of forming and using the refractory object
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C04B-035/10
C04B-035/101
C03B-017/06
C04B-035/111
C04B-035/117
C04B-035/443
C04B-035/626
출원번호
US-0873427
(2015-10-02)
등록번호
US-9796630
(2017-10-24)
발명자
/ 주소
Citti, Olivier
Kazmierczak, Andrea L.
출원인 / 주소
SAINT-GOBAIN CERAMICS & PLASTICS, INC.
대리인 / 주소
Abel Law Group, LLP
인용정보
피인용 횟수 :
0인용 특허 :
38
초록▼
A refractory object can include at least 10 wt % Al2O3. Further, the refractory object may contain less than approximately 6 wt % SiO2 or may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the Al2O3 in the refract
A refractory object can include at least 10 wt % Al2O3. Further, the refractory object may contain less than approximately 6 wt % SiO2 or may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the Al2O3 in the refractory object can be provided as reactive Al2O3. In another embodiment, the refractory object may have a density of at least approximately 3.55 g/cc, a corrosion rate of no greater than approximately 2.69 mm/year, or any combination of the foregoing. In a particular embodiment, the refractory object can be used to form an Al—Si—Mg glass sheet. In an embodiment, the refractory object may be formed by a process using a compound of Ti, Mg, Ta, Nb, or any combination thereof.
대표청구항▼
1. A refractory object used in forming a glass object, the refractory object comprising: at least 95 wt % Al2O3;less than 0.009 wt % of SiO2;less than 1.5 wt % TiO2;a dopant including at least 0.5 wt % Nb2O5;a porosity no greater than 9.0 vol %; anda corrosion rate no greater than 2.69 mm/year at an
1. A refractory object used in forming a glass object, the refractory object comprising: at least 95 wt % Al2O3;less than 0.009 wt % of SiO2;less than 1.5 wt % TiO2;a dopant including at least 0.5 wt % Nb2O5;a porosity no greater than 9.0 vol %; anda corrosion rate no greater than 2.69 mm/year at an operating temperature of 1150° C. and a molten glass velocity of 27 cm/min. 2. The refractory object according to claim 1, wherein the glass object is in a form of a glass sheet. 3. The refractory object according to claim 2, wherein the glass sheet has a thickness of at least 20 μm. 4. The refractory object according to claim 2, wherein the glass sheet has a thickness no greater than 5 mm. 5. The refractory object according to claim 4, wherein the glass sheet has a width of at least 0.2 m. 6. The refractory object according to claim 2, wherein the glass object includes an alkali glass. 7. The refractory object according to claim 1, wherein the refractory object has a density of at least 3.55 g/cc. 8. The refractory object of claim 1, wherein a content of the dopant is no greater than 5 wt %. 9. The refractory object of claim 1, wherein at least 1% of the Al2O3 in the refractory object is provided as reactive Al2O3. 10. The refractory object of claim 1, wherein no greater than 99% of the Al2O3 in the refractory object is provided as reactive Al2O3. 11. The refractory object of claim 1, wherein the corrosion rate is no greater than 1.6 mm/year at an operating temperature of 1150° C. and a molten glass velocity of 27 cm/min. 12. The refractory object of claim 1, wherein the porosity is at least 0.05 vol %. 13. The refractory object of claim 1, wherein the refractory object has a porosity no greater than 9.0 vol %. 14. The refractory object of claim 1, wherein the refractory object has a length of at least 0.5 m. 15. A refractory object used in forming a glass object, the refractory object comprising: at least 95 wt % Al2O3;less than 0.05 wt % of SiO2;less than 1.5 wt % TiO2;at least 0.2 wt % of an oxide of Ta;a density of no greater than 3.9 g/cc. 16. The refractory object of claim 15, wherein the refractory object has a porosity no greater than 9.0 vol %. 17. The refractory object of claim 15, wherein at least 1% of the Al2O3 in the refractory object is provided as reactive Al2O3. 18. The refractory object of claim 15, wherein no greater than 99% of the Al2O3 in the refractory object is provided as reactive Al2O3.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (38)
Virkar Anil Vasudeo ; Jue Jan-Fong ; Fung Kuan-Zong, Alkali-metal-.beta.- and .beta."-alumina and gallate polycrystalline ceramics and fabrication by a vapor phase method.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.