Chamber pressure control apparatus for chemical vapor deposition systems
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
F17D-001/02
C23C-016/44
F17C-001/00
F17C-013/00
C23C-016/455
C23C-016/52
F16L-055/027
출원번호
US-0393341
(2016-12-29)
등록번호
US-9857028
(2018-01-02)
발명자
/ 주소
Carlson, David K.
출원인 / 주소
APPLIED MATERIALS, INC.
대리인 / 주소
Patterson + Sheridan LLP
인용정보
피인용 횟수 :
0인용 특허 :
4
초록▼
In one embodiment, a pressure control assembly includes a cylindrical hollow body having an opening to receive a ballast gas, a first and second flange, and a first and second cone. The first flange is coupled to a first end of the body, and a second flange is coupled to an opposing end of the body.
In one embodiment, a pressure control assembly includes a cylindrical hollow body having an opening to receive a ballast gas, a first and second flange, and a first and second cone. The first flange is coupled to a first end of the body, and a second flange is coupled to an opposing end of the body. The first cone is coupled to the first flange, and the second cone is coupled to the second flange. A method for controlling pressure in a chamber includes measuring a pressure of the chamber and a pressure of an exhaust system coupled to the chamber. The method includes dynamically adjusting the pressure in the exhaust system in order to adjust the pressure in the chamber, by creating a first pressure drop that is greater than a second pressure drop in the exhaust system.
대표청구항▼
1. A processing chamber, comprising: a chamber body with an exhaust port formed therein; andan exhaust system coupled to the exhaust port, wherein the exhaust system comprises a pressure control assembly, wherein the pressure control assembly comprises: a body having a first flange and a second flan
1. A processing chamber, comprising: a chamber body with an exhaust port formed therein; andan exhaust system coupled to the exhaust port, wherein the exhaust system comprises a pressure control assembly, wherein the pressure control assembly comprises: a body having a first flange and a second flange opposite the first flange;a first cone disposed within the body and coupled to the first flange, wherein the first cone has a first opening at the first flange and a second opening opposite the first opening; anda second cone disposed within the body and coupled to the second flange, wherein the second cone has a first opening facing the second opening of the first cone and a second opening at the second flange, wherein the first opening of the second cone is larger than the second opening of the second cone, wherein the second opening of the first cone is smaller than the second opening of the second cone. 2. The processing chamber of claim 1, further comprising: an exhaust line connecting the processing chamber and the pressure control assembly, wherein the exhaust line is fluidly connected to an isolation valve at a location upstream of the pressure control assembly. 3. The processing chamber of claim 2, further comprising: a first pressure detection device fluidly coupled to the exhaust line to determine a first pressure in the exhaust line. 4. The processing chamber of claim 3, wherein the exhaust system further comprises: an abatement system fluidly coupled to the pressure control assembly through the exhaust line at a location downstream of the pressure control assembly. 5. The processing chamber of claim 4, further comprising: a second pressure detection device fluidly coupled to the exhaust line at a location downstream of the pressure control assembly to determine a second pressure in the exhaust line. 6. The processing chamber of claim 1, further comprising a bellows welded to an outer surface of the body. 7. The processing chamber of claim 1, wherein the first opening of the first cone is larger than the second opening of the first cone. 8. A processing chamber, comprising: a chamber body with an exhaust port formed therein; andan exhaust system coupled to the exhaust port, wherein the exhaust system comprises a pressure control assembly, wherein the pressure control assembly comprises: a cylindrical hollow body having an opening to receive a ballast gas.a first flange coupled to a first end of the body;a second flange coupled to an opposing second end of the body;a first cone coupled to the first flange at the first end, wherein the first cone has a first opening and a second opening, and wherein the first opening of the first cone is at the first flange; anda second cone coupled to the second flange at the second end, wherein the second cone has a first opening and a second opening, and wherein the first opening of the second cone faces the second opening of the first cone, and wherein the second opening of the second cone is at the second flange, wherein the first opening of the second cone is larger than the second opening of the second cone. 9. The processing chamber of claim 8, wherein the second opening of the first cone is smaller than the second opening of the second cone. 10. The processing chamber of claim 8, wherein the opening of the body receives the ballast gas in the body at an angle of between 20 degrees and 40 degrees. 11. The processing chamber of claim 8, wherein a length of the first cone is greater than a length of the second cone. 12. The processing chamber of claim 8, further comprising a bellows welded to an outer surface of the cylindrical hollow body. 13. The processing chamber of claim 12, wherein the first and second cones, and the bellows, are fabricated from stainless steel. 14. The processing chamber of claim 8, wherein each of the first and second flanges has a diameter between 1 inch and 3 inches. 15. A method for controlling pressure in a processing chamber, comprising: measuring a pressure of the processing chamber;measuring a pressure of an exhaust system coupled to the processing chamber; anddynamically adjusting the pressure in the exhaust system in order to adjust the pressure in the processing chamber, wherein dynamically adjusting the pressure in the exhaust system comprises: creating a first pressure drop in the exhaust system, wherein the first pressure drop is created by a first cone having first opening and a second opening; andcreating a second pressure drop in the exhaust system, wherein the second pressure drop is created by a second cone having a first opening and a second opening, wherein the first opening of the second cone is larger than the second opening of the second cone, wherein the first pressure drop is greater than the second pressure drop. 16. The method of claim 15, wherein dynamically adjusting the pressure in the exhaust system further comprises injecting a ballast gas in the exhaust system to create a vortex of the ballast gas. 17. The method of claim 16, wherein the first and second pressure drops are created by the vortex of ballast gas. 18. The method of claim 16, wherein the vortex of ballast gas encapsulates byproducts in the exhaust system. 19. The method of claim 18, wherein the vortex of ballast gas suppresses polymerization of the encapsulated byproducts. 20. The method of claim 16, wherein the ballast gas is nitrogen or argon.
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이 특허에 인용된 특허 (4)
Carlson, David K., Chamber pressure control apparatus for chemical vapor deposition systems.
Deaton Paul L. (Sunnyvale CA) Riley Norma (Pleasanton CA) Rinnovatore James V. (Nazareth PA), Particulate reduction baffle with wafer catcher for chemical-vapor-deposition apparatus.
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