Refractory object and process of forming a glass sheet using the refractory object
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C04B-035/101
C03B-017/06
C04B-035/111
C04B-035/117
C04B-035/626
출원번호
US-0984539
(2015-12-30)
등록번호
US-9902653
(2018-02-27)
발명자
/ 주소
Citti, Olivier
Fourcade, Julien P.
Kazmierczak, Andrea L.
출원인 / 주소
SAINT-GOBAIN CERAMICS & PLASTICS, INC.
대리인 / 주소
Abel Law Group, LLP
인용정보
피인용 횟수 :
0인용 특허 :
37
초록▼
A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory obje
A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10−6 h−1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10−5 h−1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.
대표청구항▼
1. A refractory object comprising: Al2O3 at a content in a range of 10 wt % Al2O3 to 94 wt % Al2O3;SiO2 at a content of at least 1.1 wt % and no greater than 4 wt % SiO2;Y2O3 at a content of at least 3 wt % and no greater than 8 wt % Y2O3. 2. The refractory object as recited in claim 1, wherein the
1. A refractory object comprising: Al2O3 at a content in a range of 10 wt % Al2O3 to 94 wt % Al2O3;SiO2 at a content of at least 1.1 wt % and no greater than 4 wt % SiO2;Y2O3 at a content of at least 3 wt % and no greater than 8 wt % Y2O3. 2. The refractory object as recited in claim 1, wherein the refractory object includes no greater than 1 wt % of an alkali metal oxide. 3. The refractory object as recited in claim 1, wherein the refractory object comprises no greater than 0.3 wt % ZrO2. 4. The refractory object as recited in claim 1, wherein the refractory object comprises at least 70 wt % Al2O3. 5. The refractory object as recited in claim 1, wherein a fracture toughness of the refractory object is at least 2.1 MPa-m1/2. 6. The refractory object as recited in claim 1, wherein the refractory object further comprises a silica phase. 7. The refractory object as recited in claim 6, wherein a melting point of the silica phase is at least 1300° C. 8. The refractory object as recited in claim 7, wherein the melting point of the silica phase is at least a sintering temperature used in forming the refractory object. 9. The refractory object as recited in claim 1, wherein the refractory object includes a peripheral region disposed between an edge of the refractory object and the body portion and outside of the body portion. 10. The refractory object as recited in claim 1, wherein the SiO2 is provided as amorphous SiO2, crystalline SiO2, or a combination thereof. 11. The refractory object as recited in claim 1, wherein the apparent porosity of the refractory object is no greater than 0.8 vol %. 12. The refractory object as recited in claim 1, wherein the percentage of theoretical density of the refractory object is at least 91%. 13. The refractory object of recited claim 1, wherein the creep rate of the refractory object is no greater than 5.0×10−5 h−1. 14. The refractory object as recited in claim 1, comprising grains having an average size of at least 10 micrometers. 15. The refractory object as recited in claim 1, comprising grains having an average size no greater than 500 micrometers.
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이 특허에 인용된 특허 (37)
Virkar Anil Vasudeo ; Jue Jan-Fong ; Fung Kuan-Zong, Alkali-metal-.beta.- and .beta."-alumina and gallate polycrystalline ceramics and fabrication by a vapor phase method.
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