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Flow control system, method, and apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F16K-031/02
  • G01F-001/36
  • F16K-037/00
  • F16K-047/08
  • F16K-027/00
  • G01F-001/88
  • G01F-015/00
  • G05D-007/06
출원번호 US-0087130 (2016-03-31)
등록번호 US-9958302 (2018-05-01)
발명자 / 주소
  • Mudd, Daniel T.
  • Mudd, Patti J.
출원인 / 주소
  • RENO TECHNOLOGIES, INC.
대리인 / 주소
    The Belles Group, P.C.
인용정보 피인용 횟수 : 0  인용 특허 : 172

초록

In one embodiment, a control apparatus for delivery of a process gas includes an inlet conduit; a valve operably coupled to the inlet conduit and alterable between an open condition and a closed condition, the valve having a first conductance and being downstream of the inlet conduit; a characterize

대표청구항

1. A control apparatus for delivery of a process gas, comprising: a substrate block comprising an inlet conduit and an outlet conduit;a valve operably coupled to the substrate block, the valve comprising a valve body, a valve seat, and a poppet assembly, the valve fluidly coupled to the inlet condui

이 특허에 인용된 특허 (172)

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