초록 ▼

A lithographic apparatus includes a substrate table capable of holding a substrate, a projection system that projects a patterned beam of radiation onto the substrate held by the substrate table, and a sensor table that is not capable of holding a substrate but that includes a sensor capable of sens

A lithographic apparatus includes a substrate table capable of holding a substrate, a projection system that projects a patterned beam of radiation onto the substrate held by the substrate table, and a sensor table that is not capable of holding a substrate but that includes a sensor capable of sensing a property of the patterned beam of radiation. In addition, a first positioning system is connected to the substrate table and displaces the substrate table into and out of a path of the patterned beam of radiation, and a second positioning system is capable of positioning the sensor table into the path of the patterned beam of radiation when the substrate table is displaced out of the path of the patterned beam of radiation.

대표청구항 ▼

1. An exposure apparatus for exposing a substrate with an illumination light via a projection optical system and via a liquid, the exposure apparatus comprising: a measurement system configured to direct a measurement beam onto the substrate to obtain positional information of the substrate, the mea

1. An exposure apparatus for exposing a substrate with an illumination light via a projection optical system and via a liquid, the exposure apparatus comprising: a measurement system configured to direct a measurement beam onto the substrate to obtain positional information of the substrate, the measurement system being located in a second area that is different from a first area in which the projection optical system is located;a base member arranged below the projection optical system and below the measurement system;a first stage arranged to be supported by levitation on the base member, the first stage having a first upper surface and a first holder, the first upper surface being arranged to be in contact with a liquid immersion region formed with the liquid below the projection optical system, the first holder being provided in a first hole formed on the first upper surface such that the substrate can be held in the first hole by the first holder;a second stage that is separate from the first stage and that is movable relative to the first stage at least toward and away from the first stage, the second stage arranged to be supported by levitation on the base member, the second stage having a second upper surface and a second holder, the second upper surface being arranged to be in contact with the liquid immersion region formed with the liquid below the projection optical system, the second holder being provided in a second hole formed on the second upper surface such that the substrate can be held in the second hole by the second holder;a drive system having an electromagnetic motor that is configured to drive the first and second stages such that each of the first and second stages levitated on the base member can be moved from the second area to the first area and from the first area to the second area; anda controller coupled to the drive system and configured to control the drive system such that, while one stage of the first and second stages is arranged facing the projection optical system, another stage of the first and second stages approaches the one stage, and such that the first and second stages in an approached state are moved relative to the projection optical system in a predetermined direction orthogonal to an optical axis of the projection optical system so that the another stage is arranged facing the projection optical system in place of the one stage while the liquid immersion region is substantially maintained below the projection optical system. 2. The exposure apparatus according to claim 1, wherein, when the exposure process for the substrate occurs, the first stage or the second stage is driven such that the liquid immersion region is located at a local area of the substrate and such that the substrate is moved relative to the liquid immersion region. 3. The exposure apparatus according to claim 2, wherein the exposure process for the substrate is performed via the liquid, and a mark detection process for the substrate is performed by use of the measurement system not via the liquid. 4. The exposure apparatus according to claim 3, wherein the first and second stages in the approached state are moved relative to the projection optical system such that the liquid immersion region is transferred from the one stage to the another stage while the liquid immersion region is maintained below the projection optical system by use of at least one of the first and second stages in the approached state. 5. The exposure apparatus according to claim 4, wherein the liquid immersion region is maintained below the projection optical system by use of both the first and second stages temporarily while the first and second stages in the approached state are moved relative to the projection optical system. 6. The exposure apparatus according to claim 3, wherein the another stage of the first and second stages is moved relative to the one stage when the liquid immersion region is maintained below the projection optical system by use of the one stage such that the another stage approaches the one stage in the predetermined direction. 7. The exposure apparatus according to claim 6, wherein the relative movement is executed such that the approach between the first and second stages is conducted also in a direction intersecting the predetermined direction. 8. The exposure apparatus according to claim 6, wherein the relative movement is executed such that, while the approach between the first and second stages is conducted in the predetermined direction, a positional relationship therebetween in a direction intersecting the predetermined direction is adjusted. 9. The exposure apparatus according to claim 6, wherein the relative movement is executed until a proximity state or a contact state of the first and second stages occurs so that (a) the liquid immersion region can be substantially maintained below the projection optical system or (b) a leak of liquid from a gap between the first and second stages can be prevented or suppressed, andthe first and second stages in the approached state are moved relative to the projection optical system in the predetermined direction while the proximity or contact state is substantially maintained. 10. The exposure apparatus according to claim 6, wherein the first and second stages, in the approached state and in a state where the first and second upper surfaces thereof are arranged in juxtaposition with each other, are moved relative to the projection optical system in the predetermined direction such that a boundary or a gap between the first and second upper surfaces passes through a position below the liquid immersion region. 11. The exposure apparatus according to claim 3, wherein the first and second stages are driven such that, for each of the first and second stages, the exposure process for the substrate via the projection optical system and via the liquid of the liquid immersion region is performed in the first area, and at least one of (a) the detection process for the substrate by use of the measurement system and (b) an exchange process of the substrate is performed in the second area. 12. The exposure apparatus according to claim 11, wherein different operations are performed in parallel between the first stage and the second stage both before and after the movement of the first and second stages relative to the projection optical system such that (a) the one stage of the first and second stages is moved in one area of the first and second areas and (b) the another stage is moved in another area of the first and second areas. 13. The exposure apparatus according to claim 3, wherein different operations between the first and second stages can be performed when the one stage is moved in the first area and the another stage is moved in the second area, andprior to the movement of the first and second stages relative to the first and second stages, the another stage is moved from the second area to the first area. 14. The exposure apparatus according to claim 13, wherein the detection process for the substrate held on the another stage by use of the measurement system is performed in parallel with the exposure for the substrate held on the one stage, andafter the detection process for the substrate, the another stage is moved from the second area to the first area. 15. The exposure apparatus according to claim 14, wherein, after the one stage is arranged to be able to be away from below the projection optical system through the movement of the first and second stages relative to the projection optical system, the one stage is moved from the first area to the second area, and the exposure process for the substrate held on the another stage, which is arranged to face the projection optical system, is performed. 16. The exposure apparatus according to claim 15, wherein the exchange process of the substrate held on the one stage is performed in the second area in parallel with the exposure process for the substrate held on the another stage. 17. The exposure apparatus according to claim 3, wherein the exposure process for the substrate held on the first stage and the exposure process for the substrate held on the second stage are alternately performed, and the movement of the first and second stages relative to the projection optical system is executed between the exposure processes. 18. The exposure apparatus according to claim 3, wherein the exposure process of a plurality of substrates is performed by alternatively using the first and second stages, and the liquid immersion region is maintained below the projection optical system in the exposure process of the plurality of substrates. 19. The exposure apparatus according to claim 3, further comprising: a suppressive member provided in at least one of the first and second stages and configured to suppress a liquid leakage of the liquid immersion region via a gap between the first and second stages in the approached state and in the movement relative to the projection optical system, while in the approached state. 20. The exposure apparatus according to claim 19, wherein the suppressive member has at least one of a sealing member and a liquid repellent coating. 21. The exposure apparatus according to claim 19, wherein the suppressive member has a cover member arranged such that at least a part of the cover member is positioned at a gap between the first and second stages in an approached state, andthe first and second stages in the approached state are moved relative to the projection optical system such that the liquid immersion region is transferred from the one stage to the another stage via the cover member while the liquid immersion region is maintained below the projection optical system. 22. The exposure apparatus according to claim 21, wherein the cover member is arranged such that a surface thereof is substantially coplanar with the first and second upper surfaces of the first and second stages in the approached state. 23. The exposure apparatus according to claim 21, wherein the cover member is arranged protruding outward past at least the first or second upper surface of the one stage. 24. The exposure apparatus according to claim 21, wherein the cover member is provided at each of the first and second stages,the cover member at the first stage is used in the movement of the first and second stages in an approached state, the movement being for the replacement of the one stage with the another stage, arranged facing the projection optical system, andthe cover member at the second stage is used in the movement of the first and second stages in the approached state, the movement being for the replacement of the another stage with the one stage, arranged facing the projection optical system. 25. The exposure apparatus according to claim 1, wherein the first and second stages are each configured to hold the substrate with the first and second holders in the first and second holes such that a gap is formed between the first and second upper surfaces thereof and a surface of the substrate, and such that the first and second upper surfaces thereof and the surface of the substrate are substantially coplanar with each other, and such that the first and second upper surfaces thereof maintain at least a part of the liquid immersion region, which is arranged outside the surface of the substrate held by the first and second holders in the first and second holes. 26. The exposure apparatus according to claim 25, wherein each of the first and second stages has a reference provided on the first and second upper surfaces thereof, and is arranged to move such that a measurement using the reference is executed via the projection optical system and via liquid of the liquid immersion region. 27. The exposure apparatus according to claim 26, wherein each of the first and second stages is configured to move such that the reference is detected by the measurement system. 28. The exposure apparatus according to claim 26, wherein the first and second stages each have a reference member arranged in first and second openings respectively on the first and second upper surfaces, which is different from the first and second holes, the reference being formed on a surface of the reference member. 29. The exposure apparatus according to claim 28, wherein, in each of the first and second stages, the reference member is provided such that the surface thereof on which the reference is provided and the first or second upper surface of the first or second stage are substantially coplanar. 30. The exposure apparatus according to claim 26, wherein each of the first and second stages is configured such that the reference is moved to a position below the liquid immersion region so that the movement of the approached first and second stages is followed by irradiation of the illumination light onto the reference via the projection optical system and via the liquid of the liquid immersion region, and such that the measurement using the reference is followed by the exposure of the substrate. 31. The exposure apparatus according to claim 25, wherein, while a scanning exposure of the substrate is performed, the substrate is moved in a direction that intersects the predetermined direction in which the approached first and second stages move. 32. The exposure apparatus according to claim 25, wherein the measurement system is arranged apart from the projection optical system in a direction that intersects the predetermined direction in which the approached first and second stages move. 33. The exposure apparatus according to claim 25, wherein the first area and the second area are arranged at different positions in a direction that intersects with the predetermined direction in which the approached first and second stages move. 34. The exposure apparatus according to claim 25, wherein the measurement system is arranged apart from the projection optical system in the predetermined direction in which the approached first and second stages move. 35. The exposure apparatus according to claim 25, wherein the first area and the second area are arranged at different positions in the predetermined direction in which the approached first and second stages move. 36. The exposure apparatus according to claim 25, wherein the first stage and the second stage are moved from the first area to the second area along different routes from each other. 37. The exposure apparatus according to claim 25, wherein the first stage and the second stage are moved from the second area to the first area along different routes from each other. 38. The exposure apparatus according to claim 25, wherein, for each of the first and second stages, a moving route from the first area to the second area is reverse with respect to a moving route from the second area to the first area. 39. The exposure apparatus according to claim 25, wherein, for each of the first and second stages, a moving route from the first area to the second area is substantially the same as a moving route from the second area to the first area. 40. The exposure apparatus according to claim 25, wherein the first and second stages are arranged such that opposed end portions of the approached first and second stages in the movement for a replacement of the first stage with the second stage as for facing the projection optical system are the same as opposed end portions of the approached first and second stages in the movement for a replacement of the second stage with the first stage as for facing the projection optical system. 41. The exposure apparatus according to claim 25, wherein, in the predetermined direction, a moving direction of the approached first and second stages for a replacement of the first stage with the second stage as for facing the projection optical system is reverse with respect to a moving direction of the approached first and second stages for a replacement of the second stage with the first stage as for facing the projection optical system. 42. The exposure apparatus according to claim 25, wherein the first stage and the second stage are moved from the second area to the first area along the same route as each other. 43. The exposure apparatus according to claim 25, wherein the first stage and the second stage are moved from the first area to the second area along the same route as each other. 44. The exposure apparatus according to claim 25, wherein, for each of the first and second stages, a moving route from the first area to the second area is different from a moving route from the second area to the first area. 45. The exposure apparatus according to claim 25, wherein, for each of the first and second stages, a moving route from the first area to the second area is substantially the same as a moving route from the second area to the first area. 46. The exposure apparatus according to claim 25, wherein the first and second stages are arranged such that opposed end portions of the approached first and second stages in the movement for a replacement of the first stage with the second stage as for facing the projection optical system are different from opposed end portions of the approached first and second stages in the movement for a replacement of the second stage with the first stage as for facing the projection optical system. 47. The exposure apparatus according to claim 25, wherein, in the predetermined direction, a moving direction of the approached first and second stages for a replacement of the first stage with the second stage as for facing the projection optical system is the same as a moving direction of the approached first and second stages for a replacement of the second stage with the first stage as for facing the projection optical system. 48. The exposure apparatus according to claim 25, further comprising a local liquid immersion system that has a nozzle unit, which is arranged to surround an optical member, which is arranged to be in contact with the liquid, of the projection optical system, and that is configured to form the liquid immersion region with the liquid supplied via the nozzle unit, and to recover the liquid from the liquid immersion region via the nozzle unit. 49. The exposure apparatus according to claim 48, wherein, at least during an exposure operation for the substrate, the local liquid immersion system executes a liquid supply to the liquid immersion region and a liquid recovery from the liquid immersion region in parallel. 50. A device fabricating method comprising: exposing a substrate by use of the exposure apparatus according to claim 1; anddeveloping the exposed substrate. 51. An exposure method of exposing a substrate with an illumination light via a projection optical system and via a liquid, the method comprising: supporting first and second stages by levitation on a base member, the base member being arranged below the projection optical system and below a measurement system, the measurement system being configured to direct a measurement beam onto the substrate to obtain positional information of the substrate, the measurement system being located in a second area that is different from a first area in which the projection optical system is located, the first stage having a first upper surface and a first holder, the first upper surface being arranged to be in contact with a liquid immersion region formed with the liquid below the projection optical system, the first holder being provided in a first hole formed on the first upper surface such that the substrate can be held in the first hole by the first holder, the second stage being separate from the first stage and being movable relative to the first stage at least toward and away from the first stage, the second stage having a second upper surface and a second holder, the second upper surface being arranged to be in contact with the liquid immersion region formed with the liquid below the projection optical system, the second holder being provided in a second hole formed on the second upper surface such that the substrate can be held in the second hole by the second holder;driving the first and second stages with an electromagnetic motor such that each of the first and second stages levitated on the base member can be moved from the second area to the first area and from the first area to the second area;arranging one stage of the first and second stages to face the projection optical system;executing a relative movement between the first and second stages such that another stage of the first and second stages approaches the one stage, while the one stage is arranged facing the projection optical system; andmoving the first and second stages, in an approached state, relative to the projection optical system in a predetermined direction orthogonal to an optical axis of the projection optical system so that the another stage is arranged facing the projection optical system in place of the one stage while the liquid immersion region is substantially maintained below the projection optical system. 52. The exposure method according to claim 51, wherein, when the exposure process for the substrate occurs, the first stage or the second stage is driven such that the liquid immersion region is located at a local area of the substrate and such that substrate is moved relative to the liquid immersion region. 53. The exposure method according to claim 52, wherein the exposure process for the substrate is performed via the liquid, and a mark detection process for the substrate is performed by use of the measurement system not via the liquid. 54. The exposure method according to claim 53, wherein the first and second stages in the approached state are moved relative to the projection optical system such that the liquid immersion region is transferred from the one stage to the another stage while the liquid immersion region is maintained below the projection optical system by use of at least one of the first and second stages in the approached state. 55. The exposure method according to claim 54, wherein the liquid immersion region is maintained below the projection optical system by use of both the first and second stages temporarily while the first and second stages in the approached state are moved relative to the projection optical system. 56. The exposure method according to claim 53, wherein the another stage of the first and second stages is moved relative to the one stage when the liquid immersion region is maintained below the projection optical system by use of the one stage such that the another stage approaches the one stage in the predetermined direction. 57. The exposure method according to claim 56, wherein the relative movement is executed such that the approach between the first and second stages is conducted also in a direction intersecting the predetermined direction. 58. The exposure method according to claim 56, wherein the relative movement is executed such that, while the approach between the first and second stages is conducted in the predetermined direction, a positional relationship therebetween in a direction intersecting the predetermined direction is adjusted. 59. The exposure method according to claim 56, wherein the relative movement is executed until a proximity state or a contact state of the first and second stages occurs so that (a) the liquid immersion region can be substantially maintained below the projection optical system or (b) a leak of liquid from a gap between the first and second stages can be prevented or suppressed, andthe first and second stages in an approached state are moved relative to the projection optical system in the predetermined direction while the proximity or contact state is substantially maintained. 60. The exposure method according to claim 56, wherein the first and second stages, in the approached state and in a state where the first and second upper surfaces thereof are arranged in juxtaposition with each other, are moved relative to the projection optical system in the predetermined direction such that a boundary or a gap between the first and second upper surfaces passes through a position below the liquid immersion region. 61. The exposure method according to claim 53, wherein the first and second stages are driven such that, for each of the first and second stages, the exposure process for the substrate via the projection optical system and via the liquid of the liquid immersion region is performed in the first area, and at least one of (a) the detection process for the substrate by use of the measurement system and (b) an exchange process of the substrate is performed in the second area. 62. The exposure method according to claim 61, wherein different operations are performed in parallel between the first stage and the second stage both before and after the movement of the first and second stages relative to the projection optical system such that (a) the one stage of the first and second stages is moved in one area of the first and second areas and (b) the another stage is moved in another area of the first and second areas. 63. The exposure method according to claim 53, wherein different operations between the first and second stages are performed when the one stage is moved in the first area and the another stage is moved in the second area, andprior to the movement of the first and second stages relative to the first and second stages, the another stage is moved from the second area to the first area. 64. The exposure method according to claim 63, wherein the detection process for the substrate held on the another stage by use of the measurement system is performed in parallel with the exposure for the substrate held on the one stage, andafter the detection process for the substrate, the another stage is moved from the second area to the first area. 65. The exposure method according to claim 64, wherein, after the one stage is arranged to be able to be away from below the projection optical system through the movement of the first and second stages relative to the projection optical system, the one stage is moved from the first area to the second area, and the exposure process for the substrate held on the another stage, which is arranged to face the projection optical system, is performed. 66. The exposure method according to claim 65, wherein the exchange process of the substrate held on the one stage is performed in the second area in parallel with the exposure process for the substrate held on the another stage. 67. The exposure method according to claim 53, wherein the exposure process for the substrate held on the first stage and the exposure process for the substrate held on the second stage are alternately performed, and the movement of the first and second stages relative to the projection optical system is executed between the exposure processes. 68. The exposure method according to claim 53, wherein the exposure process of a plurality of substrates is performed by alternatively using the first and second stages, and the liquid immersion region is maintained below the projection optical system in the exposure process of the plurality of substrates. 69. The exposure method according to claim 53, wherein a liquid leakage of the liquid immersion region via a gap between the first and second stages in the approached state and the movement relative to the projection optical system, while in the approached state, is suppressed by a suppressive member that is provided in at least one of the first and second stages. 70. The exposure method according to claim 69, wherein the suppressive member has at least one of a sealing member and a liquid repellent coating. 71. The exposure method according to claim 69, wherein the suppressive member has a cover member arranged such that at least a part of the cover member is positioned at a gap between the first and second stages in the approached state, andthe first and second stages in an approached state are moved relative to the projection optical system such that the liquid immersion region is transferred from the one stage to the another stage via the cover member while the liquid immersion region is maintained below the projection optical system. 72. The exposure method according to claim 71, wherein the cover member is arranged such that a surface thereof is substantially coplanar with the first and second upper surfaces of the first and second stages in an approached state. 73. The exposure method according to claim 71, wherein the cover member is arranged protruding outward past at least the first or second upper surface of the one stage. 74. The exposure method according to claim 71, wherein the cover member is provided at each of the first and second stages,the cover member at the first stage is used in the movement of the first and second stages in the approached state, the movement being for the replacement of the one stage with the another stage, arranged facing the projection optical system, andthe cover member at the second stage is used in the movement of the first and second stages in an approached state, the movement being for the replacement of the another stage with the one stage, arranged facing the projection optical system. 75. The exposure method according to claim 51, wherein the first and second stages are each configured to hold the substrate with the first and second holders in the first and second holes such that a gap is formed between the first and second upper surfaces thereof and a surface of the substrate, and such that the first and second upper surfaces thereof and the surface of the substrate are substantially coplanar with each other, and such that the first and second upper surfaces thereof maintain at least a part of the liquid immersion region, which is arranged outside the surface of the substrate held by the first and second holders in the first and second holes. 76. The exposure method according to claim 75, wherein each of the first and second stages has a reference provided on the first and second upper surfaces thereof, and is arranged to move such that a measurement using the reference is executed via the projection optical system and via the liquid of the liquid immersion region. 77. The exposure method according to claim 76, wherein each of the first and second stages is configured to move such that the reference is detected by the measurement system. 78. The exposure method according to claim 76, wherein the first and second stages each have a reference member arranged in first and second openings respectively on the first and second upper surfaces, which is different from the first and second holes, the reference being formed on a surface of the reference member. 79. The exposure method according to claim 78, wherein, in each of the first and second stages, the reference member is provided such that the surface thereof on which the reference is provided and the first and second upper surfaces of the first or second stage are substantially coplanar. 80. The exposure method according to claim 76, wherein each of the first and second stages is configured such that the reference is moved to a position below the liquid immersion region so that the movement of the approached first and second stages is followed by irradiation of the illumination light onto the reference via the projection optical system and via the liquid of the liquid immersion region, and such that the measurement using the reference is followed by the exposure of the substrate. 81. The exposure method according to claim 75, wherein, while a scanning exposure of the substrate is performed, the substrate is moved in a direction that intersects the predetermined direction in which the approached first and second stages move. 82. The exposure method according to claim 75, wherein the measurement system is arranged apart from the projection optical system in a direction that intersects the predetermined direction in which the approached first and second stages move. 83. The exposure method according to claim 75, wherein the first area and the second area are arranged at different positions in a direction that intersects with the predetermined direction in which the approached first and second stages move. 84. The exposure method according to claim 75, wherein the measurement system is arranged apart from the projection optical system in the predetermined direction in which the approached first and second stages move. 85. The exposure method according to claim 75, wherein the first area and the second area are arranged at different positions in the predetermined direction in which the approached first and second stages move. 86. The exposure method according to claim 75, wherein the first stage and the second stage are moved from the first area to the second area along different routes from each other. 87. The exposure method according to claim 75, wherein the first stage and the second stage are moved from the second area to the first area along different routes from each other. 88. The exposure method according to claim 75, wherein, for each of the first and second stages, a moving route from the first area to the second area is reverse with respect to a moving route from the second area to the first area. 89. The exposure method according to claim 75, wherein, for each of the first and second stages, a moving route from the first area to the second area is substantially the same as a moving route from the second area to the first area. 90. The exposure method according to claim 75, wherein the first and second stages are arranged such that opposed end portions of the approached first and second stages in the movement for a replacement of the first stage with the second stage as for facing the projection optical system are the same as opposed end portions of the approached first and second stages in the movement for a replacement of the second stage with the first stage as for facing the projection optical system. 91. The exposure method according to claim 75, wherein, in the predetermined direction, a moving direction of the approached first and second stages for a replacement of the first stage with the second stage as for facing the projection optical system is reverse with respect to a moving direction of the approached first and second stages for a replacement of the second stage with the first stage as for facing the projection optical system. 92. The exposure method according to claim 75, wherein the first stage and the second stage are moved from the second area to the first area along the same route as each other. 93. The exposure method according to claim 75, wherein the first stage and the second stage are moved from the first area to the second area along the same route as each other. 94. The exposure method according to claim 75, wherein, for each of the first and second stages, a moving route from the first area to the second area is different from a moving route from the second area to the first area. 95. The exposure method according to claim 75, wherein, for each of the first and second stages, a moving route from the first area to the second area is substantially the same as a moving route from the second area to the first area. 96. The exposure method according to claim 75, wherein the first and second stages are arranged such that opposed end portions of the approached first and second stages in the movement for a replacement of the first stage with the second stage as for facing the projection optical system are different from opposed end portions of the approached first and second stages in the movement for a replacement of the second stage with the first stage as for facing the projection optical system. 97. The exposure method according to claim 75, wherein, in the predetermined direction, a moving direction of the approached first and second stages for a replacement of the first stage with the second stage as for facing the projection optical system is the same as a moving direction of the approached first and second stages for a replacement of the second stage with the first stage as for facing the projection optical system. 98. The exposure method according to claim 75, wherein the liquid immersion region is formed with the liquid supplied via a nozzle unit, which is arranged to surround an optical member, which is arranged to be in contact with the liquid, of the projection optical system, and the liquid is recovered from the liquid immersion region via the nozzle unit. 99. The exposure method according to claim 98, wherein, at least during an exposure operation for the substrate, a liquid supply to the liquid immersion region and a liquid recovery from the liquid immersion region are executed in parallel. 100. A device fabricating method comprising: exposing a substrate by use of the exposure method according to claim 51; anddeveloping the exposed substrate. 101. A manufacturing method of an exposure apparatus that is configured to expose a substrate with an illumination light via a projection optical system and via a liquid, the method comprising: providing a measurement system configured to direct a measurement beam onto the substrate to obtain positional information of the substrate, the measurement system being located in a second area that is different from a first area in which the projection optical system is located;arranging a base member below the projection optical system and below the measurement system;arranging a first stage to be supported by levitation on the base member, the first stage having a first upper surface and a first holder, the first upper surface being arranged to be in contact with a liquid immersion region formed with the liquid below the projection optical system, the first holder being provided in a first hole formed on the first upper surface such that the substrate can be held in the first hole by the first holder;arranging a second stage to be supported by levitation on the base member, the second stage being separate from the first stage and being movable relative to the first stage at least toward and away from the first stage, the second stage having a second upper surface and a second holder, the second upper surface being arranged to be in contact with the liquid immersion region formed with the liquid below the projection optical system, the second holder being provided in a second hole formed on the second upper surface such that the substrate can be held in the second hole by the second holder;providing a drive system having an electromagnetic motor that is configured to drive the first and second stages such that each of the first and second stages levitated on the base member can be moved from the second area to the first area and from the first area to the second area; andcoupling a controller, which is configured to control the drive system, to the drive system such that, while one stage of the first and second stages is arranged facing the projection optical system, another stage of the first and second stages approaches the one stage, and such that the first and second stages in an approached state are moved relative to the projection optical system in a predetermined direction orthogonal to an optical axis of the projection optical system so that the another stage is arranged facing the projection optical system in place of the one stage while the liquid immersion region is substantially maintained below the projection optical system.