The invention pertains to the field of technical textiles, and more particularly to the field of textiles used as a carrier, in particular as a carrier for active compounds or compounds to be activated. The invention thus relates to a glass, quartz, or metal pile fabric, as well as to a catalytic fa
The invention pertains to the field of technical textiles, and more particularly to the field of textiles used as a carrier, in particular as a carrier for active compounds or compounds to be activated. The invention thus relates to a glass, quartz, or metal pile fabric, as well as to a catalytic fabric. The invention also relates to a method for manufacturing said fabric.
대표청구항▼
1. A photocatalytic fabric forming a contact surface for treatment of a surrounding medium, wherein the medium is air, said photocatalytic fabric comprising a pile fabric consisting of: a weft and at least one ground warp of twisted glass yarns, of size ranging from 5 to 2000 tex; anda pile warp of
1. A photocatalytic fabric forming a contact surface for treatment of a surrounding medium, wherein the medium is air, said photocatalytic fabric comprising a pile fabric consisting of: a weft and at least one ground warp of twisted glass yarns, of size ranging from 5 to 2000 tex; anda pile warp of pile height between 2 and 8 mm, the yarns of which are twisted yarns made of glass, of size ranging from 5 to 2000 tex;wherein the photocatalytic pile fabric comprises at least one photocatalyst,wherein the pile fabric is a carrier for the photocatalyst and wherein the photocatalyst is deposited on the pile fabric;wherein the photocatalyst is deposited by spraying the photocatalyst onto the pile fabric, or by dipping the pile fabric into a solution of photocatalyst; andwherein the pile density of the pile fabric is between 60 and 120 pile yarns per cm2. 2. The photocatalytic fabric according to claim 1 wherein the catalyst comprises titanium, tungsten or zinc or mixtures thereof. 3. The photocatalytic fabric according to claim 1 wherein the catalyst comprises titanium dioxide (TiO2) or zinc oxide (ZnO) or mixtures thereof. 4. The photocatalytic fabric according to claim 1 comprising a weft, a ground warp and a pile warp, or comprising a weft, two ground warps and a pile warp. 5. The photocatalytic fabric according to claim 1 which is a cut-pile or warp velvet or cut-pile warp velvet. 6. The photocatalytic fabric according to claim 1 wherein the weft and ground warp yarns or the pile yarns are cable yarns. 7. The photocatalytic fabric according to claim 1 wherein the weft and ground warp yarns or pile yarns are glass yarns comprised of silica, purified silica, or quartz. 8. The photocatalytic fabric according to claim 1 wherein the weft and ground warp yarns or pile yarns have a size ranging from 10 to 500 tex. 9. A method for manufacturing a photocatalytic pile fabric, said photocatalytic pile fabric forming a contact surface for treatment of a surrounding medium, wherein the medium is air, said method comprising manufacturing a pile fabric comprising the following: at least one warping to prepare at least one ground warp of twisted glass yarns, of size ranging from 5 to 2000 tex;warping to prepare a pile warp having a pile height between 2 and 8 mm in glass and a size ranging from 5 to 2000 tex;weaving the ground and pile warps with a weft of twisted glass yarns of size ranging from 5 to 2000 tex; andcutting the pile warp yarns;so that the manufactured pile fabric consists of a weft and at least one ground warp of twisted glass yarns, of size ranging from 5 to 2000 tex; and of a pile warp of pile height between 2 and 8 mm, the yarns of which are twisted yarns made of glass, of size ranging from 5 to 2000 tex; andsaid method further comprising a step of depositing a photocatalyst on the pile fabric for forming the photocatalytic pile fabric for treatment of a surrounding medium, wherein the medium is air,wherein the photocatalyst is deposited by spraying the photocatalyst onto the pile fabric, or by dipping the pile fabric into a solution of photocatalyst, andwherein the pile density of the pile fabric is between 60 and 120 pile yarns per cm2. 10. The method according to claim 9, wherein there are sufficient warpings to prepare either: (a) one ground warp of twisted glass yarns, of size ranging from 5 to 2000 tex; or(b) two ground warps of twisted glass yarns, of size ranging from 5 to 2000 tex. 11. The method according to claim 9 wherein the tension of the ground warps is between 5 and 30 g/yarn or the tension of the pile warp is between 5 and 30 g/yarn. 12. The method according to claim 9 wherein the weaving speed is between 70 rounds/min and 300 rounds/min.
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이 특허에 인용된 특허 (8)
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