[특허]Linear anode layer slit ion source

Linear anode layer slit ion source 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	H01J-027/14 H01J-027/10 H01J-027/02 H01J-037/08
출원번호	US-0897232 (2014-06-12)
등록번호	US-10134557 (2018-11-20)
국제출원번호	PCT/US2014/042187 (2014-06-12)
국제공개번호	WO2014/201292 (2014-12-18)
발명자 / 주소	Madocks, John E.
출원인 / 주소	General Plasma, Inc.
대리인 / 주소	Grossman Tucker Perreault & Pfleger PLLC
인용정보	피인용 횟수 : 0 인용 특허 : 34

초록 ▼

A linear anode layer ion source is provided that includes a top pole having a linear ion emitting slit. An anode under the top pole has a slit aligned with the top pole ion emitting slit. At least one magnet creates a magnetic field that passes through the anode slit. Wherein the width of the anode slit is 3 mm or less. A process of generating an accelerated ion beam is also provided that includes flowing a gas into proximity to said anode. By energizing a power supply electron flow is induced to the anode and the gas is ionized. Accelerating the ions from the anode through the linear ion emitting slit generates an accelerated ion beam by a process superior to that using a racetrack-shaped slit.

대표청구항 ▼

1. A system, comprising: a linear anode layer ion source, the linear anode layer ion source comprising: a top pole having a top pole ion emitting slit;an anode under said top pole, said anode having an anode slit aligned with the top pole ion emitting slit;at least one magnet to create a magnetic field comprising magnetic field lines that pass through said anode slit;wherein: the anode slit has a first end and a second end, a width less than 3 mm, and a length from the first end to the second end that is greater than or equal to 50 mm; andin operation, an ion flow flows from the top pole ion emitting slit. 2. The system of claim 1, wherein: said linear anode layer ion source further comprises a bottom pole;said bottom pole is positioned under said anode; andthe magnetic field lines pass between said bottom pole and said top pole, and through said anode slit. 3. The system of claim 1, wherein said top pole ion emitting slit has a width that is less than or equal to 6 mm. 4. The system of claim 1 wherein said anode slit has a length that is greater than or equal to 300 mm. 5. The system of claim 1, wherein said top pole ion emitting slit is round or annular. 6. The system of claim 1, wherein the magnetic field lines within the top pole ion emitting slit and are in axial alignment with the ion flow. 7. The system of claim 1, wherein said anode slit is narrower than said top pole ion emitting slit. 8. The system of claim 1, wherein said anode slit is concentric with said top pole ion emitting slit. 9. The system of claim 1, wherein said anode slit is concentric with said top pole ion emitting slit. 10. The system of claim 2 wherein the bottom pole is farther away from the anode slit than the top pole. 11. The system of claim 3, wherein within the top pole ion emitting slit, the magnetic field lines are in axial alignment with the ion flow. 12. The system of claim 4, wherein within the top pole ion emitting slit, the magnetic field lines are in axial alignment with the ion flow. 13. The system of any claim 5 wherein within the top pole ion emitting slit, said magnetic field lines are in axial alignment with the ion flow. 14. A process for generating an accelerated ion beam comprising: flowing a gas into proximity of an anode slit of a linear anode layer ion source, the linear anode layer ion source comprising: a top pole having a top pole ion emitting slit;an anode comprising said anode slit, wherein: said anode is under said top pole with the anode slit aligned with the top pole ion emitting slit;said anode slit has a first end and a second end, a width less than 3 mm, and a length from the first end to the second end that is greater than or equal to 50 mm; andat least one magnet to generate a magnetic field comprising field lines that pass through said linear anode slit;energizing a power supply to induce electron flow to said anode and ionize the gas to form ions; andaccelerating the ions from said anode through the top pole ion emitting slit to generate an ion flow from said top pole ion emitting slit. 15. The process of claim 14, wherein said linear anode layer ion source further comprises a bottom pole under said anode, and the method further comprises trapping electrons in a closed drift confinement between said top pole and said bottom pole. 16. The method of claim 14, wherein said linear anode slit is narrower than said top pole ion emitting slit. 17. The method of claim 15, wherein within the top pole ion emitting slit, magnetic field lines of the magnetic field are in axial alignment with said ion flow.

이 특허에 인용된 특허 (34)

Semenkin Alexander V.,RUX ; Garkusha Valerii I.,RUX ; Tverdokhlebov Sergey O.,RUX ; Lyapina Nadezhda A.,RUX, Accelerator with closed electron drift.
상세보기
Magee Charles W. (West Windsor Township ; Mercer County NJ) Hewitt Lori R. (Lawrence Township ; Mercer County NJ), Apparatus and method for producing ions.
상세보기
John E. Brandenburg ; John F. Kline ; Joshua H. Resnick, Apparatus and methods for generating persistent ionization plasmas.
상세보기
Blanchard Bruno (Saint Martin le Vinoux FRX) Juliet Pierre (Grenoble FRX), Apparatus and particularly duoplasmatron usable for ionizing a gas and process for using said apparatus.
상세보기
Madocks,John E., Beam plasma source.
상세보기
Rudolph Hugo Petrmichl, Cold cathode ion beam deposition apparatus with segregated gas flow.
상세보기
Williamson Weldon S. (Malibu CA), Compact penning-discharge plasma source.
상세보기
Madocks,John E., Dual plasma beam sources and method.
상세보기
Halpern Bret (Bethany CT), Electron jet vapor deposition system.
상세보기
Zhurin,Viacheslav V., Hall-current ion source for ion beams of low and high energy for technological applications.
상세보기
Kellogg, Sean; Wells, Andrew B.; McGinn, James B.; Parker, N. William; Utlaut, Mark W., High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped.
상세보기
Graupera, Anthony; Otis, Charles, Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions.
상세보기
Brown Ian G. (1088 Woodside Rd. Berkeley CA 94708) Galvin James (2 Commodore #276 Emeryville CA 94608), Ion beam generating apparatus.
상세보기
Chalupka Alfred (Vienna ATX) Lammer Gertraud (Vienna ATX) Stengl Gerhard (Wernberg ATX) Wolf Peter (Vienna ATX) Fegerl Johannes (Vienna ATX), Ion source.
상세보기
Sainty, Wayne G, Ion source.
상세보기
Ryding, Geoffrey; Arnold, Drew; Park, William H.; Horner, Ronald, Ion source and a method of generating an ion beam using an ion source.
상세보기
Yamashita, Takatoshi; Ikejiri, Tadashi, Ion source and ion implantation apparatus.
상세보기
Norling,Jonas Ove; Bergstr철m,Jan Olof, Ion source apparatus and method.
상세보기
Liu, Peng; Zhou, Duan-Liang; Chen, Pi-Jin; Hu, Zhao-Fu; Guo, Cai-Lin; Du, Bing-Chu; Fan, Shou-Shan, Ion source having secondary electron enhancing electrode.
상세보기
Yamashita, Takatoshi; Ikejiri, Tadashi; Kuzawa, Keiko; Fujiwara, Hideyuki, Ion source, ion implantation apparatus, and ion implantation method.
상세보기
Price, Ray, Low voltage closed drift anode layer ion source.
상세보기
Keller, John; Smith, Noel; Boswell, Roderick; Scipioni, Lawrence; Charles, Christine; Sutherland, Orson, Magnetically enhanced, inductively coupled plasma source for a focused ion beam system.
상세보기
Maishev Yuri,RUX ; Ritter James ; Velikov Leonid, Method for combined treatment of an object with an ion beam and a magnetron plasma with a combined magnetron-plasma and ion-beam source.
상세보기
Graupera, Anthony; Kellogg, Sean; Utlaut, Mark W.; Parker, N. William, Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source.
상세보기
Sakudo Noriyuki (Ohme JPX) Tokiguchi Katsumi (Hachioji JPX) Koike Hidemi (Tokorozawa JPX) Kanomata Ichiro (Fuchu JPX), Microwave plasma ion source.
상세보기
Maishev Yuri,RUX ; Ritter James ; Terentiev Yuri,RUX ; Velikov Leonid ; Shkolnik Alexander, Multiple-beam ion-beam assembly.
상세보기
Hershcovitch, Ady; Prelec, Krsto, Negative ion source with hollow cathode discharge plasma.
상세보기
Minakov,Valeriy Ivanovich, Plasma electron-emitting source.
상세보기
Crowley, Daniel Theodore; Morse, Patrick Lawrence; Meredith, Jr., William A.; German, John Robert; Neal, Michelle Lynn, Plasma enhanced chemical vapor deposition (PECVD) source.
상세보기
Keller, John; Smith, Noel; Boswell, Roderick; Scipioni, Lawrence; Charles, Christine; Sutherland, Orson, Plasma source for a focused ion beam system.
상세보기
Mizumura Michinobu (Yokohama JPX) Hamamura Yuuichi (Yokohama JPX) Azuma Junzou (Yokohama JPX) Shimase Akira (Yokosuka JPX) Kamimura Takashi (Yokosuka JPX) Itoh Fumikazu (Fujisawa JPX) Umemura Kaoru (, Process method and apparatus using focused ion beam generating means.
상세보기
Mizumura Michinobu,JPX ; Hamamura Yuuichi,JPX ; Azuma Junzou,JPX ; Shimase Akira,JPX ; Kamimura Takashi,JPX ; Itoh Fumikazu,JPX ; Umemura Kaoru,JPX ; Kawanami Yoshimi,JPX ; Madokoro Yuuichi,JPX, Processing method and apparatus using focused ion beam generating means.
상세보기
Madocks, John E.; Morse, Patrick Lawrence; Ngo, Phong, Rotary magnetron magnet bar and apparatus containing the same for high target utilization.
상세보기
Maishev Yuri,RUX ; Ritter James ; Velikuv Leonid, Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ionization gap.
상세보기

IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표IPC 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 공고번호, 공고일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표출원인, 출원인국적, 출원인주소, 발명자, 발명자E, 발명자코드, 발명자주소, 발명자 우편번호, 발명자국적, 대표IPC, IPC코드, 요약, 미국특허분류, 대리인주소, 대리인코드, 대리인(한글), 대리인(영문), 국제공개일자, 국제공개번호, 국제출원일자, 국제출원번호, 우선권, 우선권주장일, 우선권국가, 우선권출원번호, 원출원일자, 원출원번호, 지정국, Citing Patents, Cited Patents
저장형식	Text(ASCII format) Excel format PIAS분석(.xls)
메일정보	받는사람 (필수) @ 보내는사람 (선택) @ 제목 내용 KISTI 검색결과 이메일 서비스
안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

연합인증

Linear anode layer slit ion source 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

이 특허에 인용된 특허 (34)

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

이 특허와 함께 이용한 콘텐츠

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

연합인증

Linear anode layer slit ion source 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

전체(0) 논문(0) 특허(0) 보고서(0)

전체(0) 논문(0) 특허(0) 보고서(0)

이 특허에 인용된 특허 (34)

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

이 특허와 함께 이용한 콘텐츠

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트