A method for autocatalytic plating of nanoparticles on a carbon nanomaterial, the method including: providing a nanomaterial in a solution including an oxidizing agent, the solution being maintained within a first temperature range and stirring the solution for a first predetermined time period; hea
A method for autocatalytic plating of nanoparticles on a carbon nanomaterial, the method including: providing a nanomaterial in a solution including an oxidizing agent, the solution being maintained within a first temperature range and stirring the solution for a first predetermined time period; heating the solution to reach a second temperature range, higher than the first temperature range, and stirring the solution for a second predetermined time period, shorter than the first time period, while maintaining the solution within the second temperature range; filtering and rinsing the nanomaterial; dispersing the nanomaterial in an aqueous solution including a sensitizing agent; immersing the nanomaterial in a mixture including seed particles adhering to the nanomaterial; collecting the nanomaterial; plating the nanomaterial by immersing in a plating solution including an aqueous metal source and a first aqueous reducing agent such that a metallic layer is grown on the nanomaterial from the seed particles.
대표청구항▼
1. Method for autocatalytic plating of a carbon nanomaterial, said method comprising the steps of: providing a carbon nanomaterial in an oxidizing solution comprising at least two oxidizing agents, said oxidizing solution being maintained within a first temperature range, and stirring said oxidizing
1. Method for autocatalytic plating of a carbon nanomaterial, said method comprising the steps of: providing a carbon nanomaterial in an oxidizing solution comprising at least two oxidizing agents, said oxidizing solution being maintained within a first temperature range, and stirring said oxidizing solution for a first predetermined time period;heating said oxidizing solution to reach a second temperature range, higher than said first temperature range, and stirring said oxidizing solution for a second predetermined time period, shorter than said first time period, while maintaining said oxidizing solution within said second temperature range;removing said nanomaterial from said oxidizing solution;dispersing said nanomaterial in an aqueous sensitizing solution comprising a sensitizing agent;removing said nanomaterial from said sensitizing solution;immersing said nanomaterial in a seed mixture comprising seed particles adhering to said nanomaterial;removing said nanomaterial from said seed mixture;plating said nanomaterial by immersing said nanomaterial in a plating solution comprising an aqueous metal source and a first aqueous reducing agent such that a metallic layer is grown on said nanomaterial from said seed particles;removing said nanomaterial from said plating solution;dispersing said nanomaterial in an aqueous reducing agent solution comprising a second reducing agent to be reduced by the second reducing agent; andheating said aqueous reducing agent solution to reach a third temperature range and performing ultrasonic treatment of said aqueous reducing agent heated solution for a third predetermined time period while maintaining said aqueous reducing agent solution within said third temperature range,wherein said oxidizing agents comprise potassium permanganate and sulfuric acid;wherein said first temperature range is −10 to 10 C and said first time period is 1 to 8 h, said second temperature range is 30 to 50 C and said second time period is 10 to 60 min. 2. The method according to claim 1, wherein said oxidizing agents further comprise at least one of, nitric acid, potassium dichromate and sodium nitride. 3. The method according to claim 1, wherein said sensitizing agent comprises formaldehyde, polyvinylpyrrolidone or tin (II) chloride. 4. The method according to claim 1, wherein said step of removing said nanomaterial from said oxidizing solution comprises filtering said nanomaterial and rinsing in de-ionized water until a pH-value of the rinse is approximately 7. 5. The method according to claim 1, wherein said seed particles comprises palladium. 6. The method according to claim 1, wherein said first reducing agent comprises cobalt sulfate, ferrous chloride, formaldehyde, polyvinylpyrrolidone, ammonia water, ethylenediamine, ethylenediaminetetraacetic acid or benzotriazole. 7. The method according to claim 1, wherein said step of plating comprises removing dissolved oxygen in said solution by ultrasonic wave such that oxidation of said first reducing agent is avoided. 8. The method according to claim 1, wherein said step of plating is performed in a closed vessel with nitrogen gas passing through said plating solution. 9. The method according to claim 1, wherein said aqueous metal source comprises palladium, silver, gold or nickel. 10. The method according to claim 1, wherein said aqueous metal source comprises a metal ion source, ammonia water, ammonium sulfate, ethylenediamine and ethylenediaminetetraacetic acid, wherein the metal ion source is selected from the group comprising silver nitride, palladium chlorate, gold chloride, and nickel chloride. 11. The method according to claim 1, wherein said third temperature range is 60-100° C. and said third time period is at least one hour. 12. The method according to claim 1, wherein said carbon nanomaterial is carbon nanotubes, carbon nanofibres or graphene. 13. The method according to claim 1, wherein said step of plating is performed for a period of 0.5 h to 24 h. 14. The method according to claim 1, wherein said second reducing agent is selected from the group consisting of: potassium hydroxide, sodium borohydride, pyrogallol, L-ascorbic acid and hydrazine monohydrate.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (2)
Smalley, Richard E.; Colbert, Daniel T.; Dai, Hongjie; Liu, Jie; Rinzler, Andrew G.; Hafner, Jason H.; Smith, Ken; Guo, Ting; Nikolaev, Pavel; Thess, Andreas, Carbon fibers formed from single-wall carbon nanotubes.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.